iTeh StandardsiTeh Standards
EURUSD
Your shopping cart is empty.
ASTM

ASTM E1635-06(2019)

(Practice)

Standard Practice for Reporting Imaging Data in Secondary Ion Mass Spectrometry (SIMS)

Standard Practice for Reporting Imaging Data in Secondary Ion Mass Spectrometry (SIMS)

SIGNIFICANCE AND USE
5.1 This practice is to be used for reporting the experimental and data reduction procedures to be described with the publication of the data.
SCOPE
1.1 This practice lists the minimum information necessary to describe the instrumental, experimental, and data reduction procedures used in acquiring and reporting images generated by secondary ion mass spectrometry (SIMS).  
1.2 The values stated in SI units are to be regarded as standard. No other units of measurement are included in this standard.  
1.3 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety, health, and environmental practices and determine the applicability of regulatory limitations prior to use.  
1.4 This international standard was developed in accordance with internationally recognized principles on standardization established in the Decision on Principles for the Development of International Standards, Guides and Recommendations issued by the World Trade Organization Technical Barriers to Trade (TBT) Committee.

General Information

Status
Published
Publication Date
31-Oct-2019
ICS
71.040.50 - Physicochemical methods of analysis
Technical Committee
E42 - Surface Analysis
Drafting Committee
E42.06 - SIMS
Current Stage
Ref Project

Relations

Replaces
ASTM E1635-06(2011) - Standard Practice for Reporting Imaging Data in Secondary Ion Mass Spectrometry (SIMS)
Effective Date
01-Nov-2019
Refers
ASTM E1504-11(2019) - Standard Practice for Reporting Mass Spectral Data in Secondary Ion Mass Spectrometry (SIMS)
Effective Date
01-Nov-2019
Refers
ASTM E1504-11 - Standard Practice for Reporting Mass Spectral Data in Secondary Ion Mass Spectrometry (SIMS)
Effective Date
01-Nov-2011
Refers
ASTM E1504-06 - Standard Practice for Reporting Mass Spectral Data in Secondary Ion Mass Spectrometry (SIMS)
Effective Date
01-Nov-2006
Refers
ASTM E673-03 - Standard Terminology Relating to Surface Analysis (Withdrawn 2012)
Effective Date
01-Dec-2003
Refers
ASTM E673-02a - Standard Terminology Relating to Surface Analysis
Effective Date
10-Dec-2002
Refers
ASTM E673-98E1 - Standard Terminology Relating to Surface Analysis
Effective Date
10-Nov-2001
Refers
ASTM E673-01 - Standard Terminology Relating to Surface Analysis
Effective Date
10-Nov-2001
Refers
ASTM E1504-92(2001) - Standard Practice for Reporting Mass Spectral Data in Secondary Ion Mass Spectrometry (SIMS)
Effective Date
15-Nov-1992
Refers
ASTM E1504-92(1996) - Standard Practice for Reporting Mass Spectral Data in Secondary Ion Mass Spectrometry (SIMS)
Effective Date
15-Nov-1992
Referred By
ASTM F2847-17 - Standard Practice for Reporting and Assessment of Residues on Single-Use Implants and Single-Use Sterile Instruments
Effective Date
01-Nov-2019

Buy Standard

ASTM E1635-06(2019) - Standard Practice for Reporting Imaging Data in Secondary Ion Mass Spectrometry (SIMS)ASTM E1635-06(2019) - Standard Practice for Reporting Imaging Data in Secondary Ion Mass Spectrometry (SIMS)
PreviousNext
Standard
ASTM E1635-06(2019) - Standard Practice for Reporting Imaging Data in Secondary Ion Mass Spectrometry (SIMS)
English language
3 pages
sale 15% off
Preview
sale 15% off
Preview

Standards Content (Sample)


This international standard was developed in accordance with internationally recognized principles on standardization established in the Decision on Principles for the
Development of International Standards, Guides and Recommendations issued by the World Trade Organization Technical Barriers to Trade (TBT) Committee.
Designation: E1635 − 06 (Reapproved 2019)
Standard Practice for
Reporting Imaging Data in Secondary Ion Mass
Spectrometry (SIMS)
This standard is issued under the fixed designation E1635; the number immediately following the designation indicates the year of
original adoption or, in the case of revision, the year of last revision. A number in parentheses indicates the year of last reapproval. A
superscript epsilon (´) indicates an editorial change since the last revision or reapproval.
1. Scope 4. Summary of Practice
1.1 This practice lists the minimum information necessary 4.1 Experimental conditions and reporting procedures that
to describe the instrumental, experimental, and data reduction affect SIMS imaging data are presented in order to standardize
procedures used in acquiring and reporting images generated the reporting of such data and to facilitate comparisons with
by secondary ion mass spectrometry (SIMS). other laboratories and analytical techniques.
1.2 The values stated in SI units are to be regarded as
5. Significance and Use
standard. No other units of measurement are included in this
5.1 This practice is to be used for reporting the experimental
standard.
and data reduction procedures to be described with the publi-
1.3 This standard does not purport to address all of the
cation of the data.
safety concerns, if any, associated with its use. It is the
responsibility of the user of this standard to establish appro-
6. Information to be Reported
priate safety, health, and environmental practices and deter-
6.1 Standard information to be reported may be found in
mine the applicability of regulatory limitations prior to use.
Practice E1504. This information pertains to the type of SIMS
1.4 This international standard was developed in accor-
instrumentation used, the mounting of the specimen, and the
dance with internationally recognized principles on standard-
experimental conditions. For imaging SIMS analysis, addi-
ization established in the Decision on Principles for the
tional information is required on the acquisition and display
Development of International Standards, Guides and Recom-
parameters for each image. The information reported will
mendations issued by the World Trade Organization Technical
depend primarily on the type of SIMS instrumentation used.
Barriers to Trade (TBT) Committee.
Two distinct instrumental configurations are used for ion
imaging: the ion microscope and the ion microprobe.
2. Referenced Documents
6.2 Experimental Conditions for Acquisition of Ion Micro-
2.1 ASTM Standards:
scope Images—For stigmatic ion imaging, the mass spectrom-
E673 Terminology Relating to SurfaceAnalysis (Withdrawn
eter ion optics project a mass resolved secondary ion image
2012)
that preserves the lateral relationship between ions sputtered
E1504 Practice for Reporting Mass Spectral Data in Second-
from the sample onto the plane of an imaging detector.
ary Ion Mass Spectrometry (SIMS)
Whenever stigmatic ion images are recorded the configuration
of the secondary ion optics should be reported, including the
3. Terminology
use and settings of contrast apertures, energy resolving slits,
3.1 Definitions—For definitions of terms used in this guide,
mass resolution, and so forth. All information regarding the
refer to Terminology E673.
condition of the mass spectrometer that influences the spatial
resolution of the image should be reported.
6.2.1 Camera Based Systems—Camera-based systems im-
This practice is under the jurisdiction of ASTM Committee E42 on Surface age photons that are produced from the impact of ions onto an
Analysis and is the direct responsibility of Subcommittee E42.06 on SIMS.
appropriate conversion device. In many cases, the secondary
Current edition approved Nov. 1, 2019. Published November 2019. Originally
ion image is visualized via ion-to-electron conversion at a
approved in 1994. Last previous edition approved in 2011 as E1635 – 06 (2011).
micro-channel plate placed in front of a fluorescent screen.
DOI: 10.1520/E1635-06R19.
For referenced ASTM standards, visit the ASTM website, www.astm.org, or
Theimageresolution(typically0.5 µmto1µm)dependsonthe
contact ASTM Customer Service at service@astm.org. For Annual Book of ASTM
configuration of the ion optics and the energy and angular
Standards volume information, refer to the standard’s Document Summary page on
the ASTM website.
The last approved version of this historical standard is referenced on
www.astm.org. Lapareur, M., Rev. Tech. Thomson-CSF, Vol 12, No. 1, 1980, p. 225.
Copyright © ASTM International, 100 Barr Harbor Drive, PO Box C700, West Conshohocken, PA 19428-2959. United States
E1635 − 06 (2019)
distribution of the sputtered ions. The ion image is recorded netic sector instruments, and modulated primary beams are
from the fluorescent screen by a variety of camera systems, used with time-of-flight SIMS instruments. Experimental pa-
including but not limited to vidicon cameras, intensified rameters to be reported are similar to those used for camera-
cameras such as the SITcamera, charge-coupled device (CCD) basedsystems.Inaddition,theapproximateprimarybeamsize,
cameras and slow-scan scientific grade CCD cameras. The the method by which it was determined, the scan frequency (or
design of the micro-channel plate assembly and camera system dwell time per pixel), the intrapixel sequence of the scan
used will define the sensitivity and dynamic range of the (interlaced, random, flyback, and so forth), the type of second-
acquired images. Minimum parameters to be specified in ary ion detector, and the degree of electronic gating used shall
addition to that stated in Practice E1504 should include the also be reported. For time-of-flight (TOF) analysis, details of
integration time for each mass, number of pixels in the image, the pulsing should be described (that is, pulse width, repetition
field-of-view,
...

Questions, Comments and Discussion

Ask us and Technical Secretary will try to provide an answer. You can facilitate discussion about the standard in here.

This May Also Interest You

ASTM
ASTM E2735-14(2020)(Guide)
Standard Guide for Selection of Calibrations Needed for X-ray Photoelectron Spectroscopy (XPS) Experiments

SIGNIFICANCE AND USE
4.1 The purpose of this guide is assist users and analysts in selecting the standardization procedures relevant to a defined XPS experiment. These experiments may be based, for example, upon material failure analysis, the determination of surface chemistry of a solid, or the composition profile of a thin film or coating. A series of options will be summarized giving the standards that are related to specific information requirements. ISO 15470 and ISO 10810 also aid XPS users in experiment design for typical samples. ASTM Committee E42 and ISO TC201 are in a continuous process of updating and adding standards and guides. It is recommended to refer to the ASTM and ISO websites for a current list of standards.
SCOPE
1.1 This guide describes an approach to enable users and analysts to determine the calibrations and standards useful to obtain meaningful surface chemistry data with X-ray photoelectron spectroscopy (XPS) and to optimize the instrument for specific analysis objectives and data collection time.  
1.2 This guide offers an organized collection of information or a series of options and does not recommend a specific course of action. This guide cannot replace education or experience and should be used in conjunction with professional judgment. Not all aspects of this guide will be applicable in all circumstances.  
1.3 The values stated in SI units are to be regarded as standard. No other units of measurement are included in this standard.  
1.4 This standard is not intended to represent or replace the standard of care by which the adequacy of a given professional service must be judged, nor should this document be applied without consideration of a project’s many unique aspects. The word “Standard” in the title of this document means only that the document has been approved through the ASTM consensus process.  
1.5 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety, health, and environmental practices and determine the applicability of regulatory limitations prior to use.  
1.6 This international standard was developed in accordance with internationally recognized principles on standardization established in the Decision on Principles for the Development of International Standards, Guides and Recommendations issued by the World Trade Organization Technical Barriers to Trade (TBT) Committee.

  • Guide
    6 pages
    English language
    sale 15% off
ASTM
ASTM E1829-14(2020)(Guide)
Standard Guide for Handling Specimens Prior to Surface Analysis

SIGNIFICANCE AND USE
4.1 Proper handling and preparation of specimens is particularly critical for analysis. Improper handling of specimens can result in alteration of the surface composition and unreliable data. Specimens should be handled carefully so as to avoid the introduction of spurious contaminants. The goal must be to preserve the state of the surface so that analysis remains representative of the original subject.  
4.2 AES, XPS, and SIMS are sensitive to surface layers that are typically a few nanometres thick. Such thin layers can be subject to severe perturbations from improper specimen handling  (1).4  
4.3 This guide describes methods to minimize the effects of specimen handling on the results obtained using surface-sensitive analytical techniques. It is intended for the specimen owner or the purchaser of surface analytical services and the surface analyst. Because of the wide range of types of specimens and desired information, only broad guidelines and general examples are presented here. The optimum handling procedures will be dependent on the particular specimen and the needed information. It is recommended that the specimen supplier consult the surface analyst as soon as possible with regard to specimen history, the specific problem to be solved or information needed, and the particular specimen preparation or handling procedures required. The surface analyst also is referred to Guide E1078 that discusses additional procedures for preparing, mounting, and analysis of specimens.
SCOPE
1.1 This guide covers specimen handling and preparation prior to surface analysis and applies to the following surface analysis disciplines:  
1.1.1 Auger electron spectroscopy (AES),  
1.1.2 X-ray photoelectron spectroscopy (XPS or ESCA), and  
1.1.3 Secondary ion mass spectrometry (SIMS).  
1.1.4 Although primarily written for AES, XPS, and SIMS, these methods may also apply to many surface-sensitive analysis methods, such as ion scattering spectrometry, low-energy electron diffraction, and electron energy loss spectroscopy, where specimen handling can influence surface-sensitive measurements.  
1.2 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety, health, and environmental practices and determine the applicability of regulatory limitations prior to use.  
1.3 This international standard was developed in accordance with internationally recognized principles on standardization established in the Decision on Principles for the Development of International Standards, Guides and Recommendations issued by the World Trade Organization Technical Barriers to Trade (TBT) Committee.

  • Guide
    5 pages
    English language
    sale 15% off
ASTM
ASTM E1078-14(2020)(Guide)
Standard Guide for Specimen Preparation and Mounting in Surface Analysis

SIGNIFICANCE AND USE
4.1 Proper preparation and mounting of specimens is particularly critical for surface analysis. Improper preparation of specimens can result in alteration of the surface composition and unreliable data. Specimens should be handled carefully so as to avoid the introduction of spurious contaminants in the preparation and mounting process. The goal must be to preserve the state of the surface so that the analysis remains representative of the original.  
4.2 AES, XPS or ESCA, and SIMS are sensitive to surface layers that are typically a few nanometres thick. Such thin layers can be subject to severe perturbations caused by specimen handling (1)4 or surface treatments that may be necessary prior to introduction into the analytical chamber. In addition, specimen mounting techniques have the potential to affect the intended analysis.  
4.3 This guide describes methods that the surface analyst may need to minimize the effects of specimen preparation when using any surface-sensitive analytical technique. Also described are methods to mount specimens so as to ensure that the desired information is not compromised.  
4.4 Guide E1829 describes the handling of surface sensitive specimens and, as such, complements this guide.
SCOPE
1.1 This guide covers specimen preparation and mounting prior to, during, and following surface analysis and applies to the following surface analysis disciplines:  
1.1.1 Auger electron spectroscopy (AES),  
1.1.2 X-ray photoelectron spectroscopy (XPS and ESCA), and  
1.1.3 Secondary ion mass spectrometry (SIMS).  
1.1.4 Although primarily written for AES, XPS, and SIMS, these methods will also apply to many surface sensitive analysis methods, such as ion scattering spectrometry, low energy electron diffraction, and electron energy loss spectroscopy, where specimen handling can influence surface sensitive measurements.  
1.2 The values stated in SI units are to be regarded as standard. No other units of measurement are included in this standard.  
1.3 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety, health, and environmental practices and determine the applicability of regulatory limitations prior to use.  
1.4 This international standard was developed in accordance with internationally recognized principles on standardization established in the Decision on Principles for the Development of International Standards, Guides and Recommendations issued by the World Trade Organization Technical Barriers to Trade (TBT) Committee.

  • Guide
    10 pages
    English language
    sale 15% off
ASTM
ASTM E984-12(2020)(Guide)
Standard Guide for Identifying Chemical Effects and Matrix Effects in Auger Electron Spectroscopy

SIGNIFICANCE AND USE
4.1 Auger electron spectroscopy is often capable of yielding information concerning the chemical and physical environment of atoms in the near-surface region of a solid as well as giving elemental and quantitative information. This information is manifested as changes in the observed Auger electron spectrum for a particular element in the specimen under study compared to the Auger spectrum produced by the same element when it is in some reference form. The differences in the two spectra are said to be due to a chemical effect or a matrix effect. Despite sometimes making elemental identification and quantitative measurements more difficult, these effects in the Auger spectrum are considered valuable tools for characterizing the environment of the near-surface atoms in a solid.
SCOPE
1.1 This guide outlines the types of chemical effects and matrix effects which are observed in Auger electron spectroscopy.  
1.2 Guidelines are given for the reporting of chemical and matrix effects in Auger spectra.  
1.3 Guidelines are given for utilizing Auger chemical effects for identification or characterization.  
1.4 This guide is applicable to both electron excited and X-ray excited Auger electron spectroscopy.  
1.5 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety, health, and environmental practices and determine the applicability of regulatory limitations prior to use.  
1.6 This international standard was developed in accordance with internationally recognized principles on standardization established in the Decision on Principles for the Development of International Standards, Guides and Recommendations issued by the World Trade Organization Technical Barriers to Trade (TBT) Committee.

  • Guide
    5 pages
    English language
    sale 15% off
ASTM
ASTM E1504-11(2019)(Practice)
Standard Practice for Reporting Mass Spectral Data in Secondary Ion Mass Spectrometry (SIMS)

SIGNIFICANCE AND USE
5.1 This practice is intended for use in reporting the experimental and data reduction procedures described in other publications.
SCOPE
1.1 This practice provides the minimum information necessary to describe the instrumental, experimental, and data reduction procedures used in acquiring and reporting secondary ion mass spectrometry (SIMS) mass spectral data.  
1.2 The values stated in SI units are to be regarded as standard. No other units of measurement are included in this standard.  
1.3 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety, health, and environmental practices and determine the applicability of regulatory limitations prior to use.  
1.4 This international standard was developed in accordance with internationally recognized principles on standardization established in the Decision on Principles for the Development of International Standards, Guides and Recommendations issued by the World Trade Organization Technical Barriers to Trade (TBT) Committee.

  • Standard
    2 pages
    English language
    sale 15% off
ASTM
ASTM E1162-11(2019)(Practice)
Standard Practice for Reporting Sputter Depth Profile Data in Secondary Ion Mass Spectrometry (SIMS)

SIGNIFICANCE AND USE
5.1 This practice is used for reporting the experimental conditions as specified in Section 6 in the “Methods” or “Experimental” sections of other publications (subject to editorial restrictions).  
5.2 The report would include specific conditions for each data set, particularly, if any parameters are changed for different sputter depth profile data sets in a publication. For example, footnotes of tables or figure captions would be used to specify differing conditions.
SCOPE
1.1 This practice covers the information needed to describe and report instrumentation, specimen parameters, experimental conditions, and data reduction procedures. SIMS sputter depth profiles can be obtained using a wide variety of primary beam excitation conditions, mass analysis, data acquisition, and processing techniques (1-4).2  
1.2 Limitations—This practice is limited to conventional sputter depth profiles in which information is averaged over the analyzed area in the plane of the specimen. Ion microprobe or microscope techniques permitting lateral spatial resolution of secondary ions within the analyzed area, for example, image depth profiling, are excluded.  
1.3 The values stated in SI units are to be regarded as standard. No other units of measurement are included in this standard.  
1.4 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety, health, and environmental practices and determine the applicability of regulatory limitations prior to use.  
1.5 This international standard was developed in accordance with internationally recognized principles on standardization established in the Decision on Principles for the Development of International Standards, Guides and Recommendations issued by the World Trade Organization Technical Barriers to Trade (TBT) Committee.

  • Standard
    3 pages
    English language
    sale 15% off
ASTM
ASTM E1217-11(2019)(Practice)
Standard Practice for Determination of the Specimen Area Contributing to the Detected Signal in Auger Electron Spectrometers and Some X-Ray Photoelectron Spectrometers

SIGNIFICANCE AND USE
5.1 Auger electron spectroscopy and X-ray photoelectron spectroscopy are used extensively for the surface analysis of materials. This practice summarizes methods for determining the specimen area contributing to the detected signal (a) for instruments in which a focused electron beam can be scanned over a region with dimensions greater than the dimensions of the specimen area viewed by the analyzer, and (b) by employing a sample with a sharp edge.  
5.2 This practice is intended as a means for determining the observed specimen area for selected conditions of operation of the electron energy analyzer. The observed specimen area depends on whether or not the electrons are retarded before energy analysis, the analyzer pass energy or retarding ratio if the electrons are retarded before energy analysis, the size of selected slits or apertures, and the value of the electron energy to be measured. The observed specimen area depends on these selected conditions of operation and also can depend on the adequacy of alignment of the specimen with respect to the electron energy analyzer.  
5.3 Any changes in the observed specimen area as a function of measurement conditions, for example, electron energy or analyzer pass energy, may need to be known if the specimen materials in regular use have lateral inhomogeneities with dimensions comparable to the dimensions of the specimen area viewed by the analyzer.  
5.4 This practice can give useful information on the imaging properties of the electron energy analyzer for particular conditions of operation. This information can be helpful in comparing analyzer performance with manufacturer's specifications.  
5.5 Information about the shape and size of the area viewed by the analyzer can also be employed to predict the signal intensity in XPS experiments when the sample is rotated and to assess the axis of rotation of the sample manipulator.  
5.6 Examples of the application of the methods described in this practice have been publis...
SCOPE
1.1 This practice describes methods for determining the specimen area contributing to the detected signal in Auger electron spectrometers and some types of X-ray photoelectron spectrometers (spectrometer analysis area) when this area is defined by the electron collection lens and aperture system of the electron energy analyzer. The practice is applicable only to those X-ray photoelectron spectrometers in which the specimen area excited by the incident X-ray beam is larger than the specimen area viewed by the analyzer, in which the photoelectrons travel in a field-free region from the specimen to the analyzer entrance. Some of the methods described here require an auxiliary electron gun mounted to produce an electron beam of variable energy on the specimen (“electron-gun method”). Other experiments require a sample with a sharp edge, such as a wafer covered with a uniform clean layer (for example, gold (Au) or silver (Ag)) and cleaved to obtain a long side (“sharp-edge method”).  
1.2 This practice is recommended as a useful means for determining the specimen area viewed by the analyzer for different conditions of spectrometer operation, for verifying adequate specimen and beam alignment, and for characterizing the imaging properties of the electron energy analyzer.  
1.3 The values stated in SI units are to be regarded as standard. No other units of measurement are included in this standard.  
1.4 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety, health, and environmental practices and determine the applicability of regulatory limitations prior to use.  
1.5 This international standard was developed in accordance with internationally recognized principles on standardization established in the Decision on Principles for the Development of International Standards, Guides and Recomm...

  • Standard
    9 pages
    English language
    sale 15% off
ASTM
ASTM E1634-11(2019)(Guide)
Standard Guide for Performing Sputter Crater Depth Measurements

SIGNIFICANCE AND USE
4.1 Sputter crater depth measurements are performed in order to determine a sputter rate (depth/time) for each matrix sputtered during a sputter depth profile or similar in-depth type analyses. From sputter rate values, a linear depth scale can be calculated and displayed for the sputter depth profile.  
4.2 Data obtained from surface profilometry are useful in monitoring instrumental parameters (for example, raster size, shape, and any irregularities in topography of the sputtered crater) used for depth profiles.
SCOPE
1.1 This guide covers the preferred procedure for acquiring and post-processing of sputter crater depth measurements. This guide is limited to stylus-type surface profilometers equipped with a stage, stylus, associated scan and sensing electronics, video system for sample and scan alignment, and computerized system.  
1.2 The values stated in SI units are to be regarded as standard. No other units of measurement are included in this standard.  
1.3 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety, health, and environmental practices and determine the applicability of regulatory limitations prior to use.  
1.4 This international standard was developed in accordance with internationally recognized principles on standardization established in the Decision on Principles for the Development of International Standards, Guides and Recommendations issued by the World Trade Organization Technical Barriers to Trade (TBT) Committee.

  • Guide
    3 pages
    English language
    sale 15% off
ASTM
ASTM E2426-10(2019)(Practice)
Standard Practice for Pulse Counting System Dead Time Determination by Measuring Isotopic Ratios with SIMS

SIGNIFICANCE AND USE
5.1 Electron multipliers are commonly used in pulse-counting mode to detect ions from magnetic sector mass spectrometers. The electronics used to amplify, detect and count pulses from the electron multipliers always have a characteristic time interval after the detection of a pulse, during which no other pulses can be counted. This characteristic time interval is known as the “dead time.” The dead time has the effect of reducing the measured count rate compared with the “true” count rate.  
5.2 In order to measure count rates accurately over the entire dynamic range of a pulse counting detector, such as an electron multiplier, the dead time of the entire pulse counting system must be well known. Accurate count rate measurement forms the basis of isotopic ratio measurements as well as elemental abundance determinations.  
5.3 The procedure described herein has been successfully used to determine the dead time of counting systems on SIMS instruments.6 The accurate determination of the dead time by this method has been a key component of precision isotopic ratio measurements made by SIMS.
SCOPE
1.1 This practice provides the Secondary Ion Mass Spectrometry (SIMS) analyst with a method for determining the dead time of the pulse-counting detection systems on the instrument. This practice also allows the analyst to determine whether the apparent dead time is independent of count rate.  
1.2 This practice is applicable to most types of mass spectrometers that have pulse-counting detectors.  
1.3 This practice does not describe methods for precise or accurate isotopic ratio measurements.  
1.4 This practice does not describe methods for the proper operation of pulse counting systems and detectors for mass spectrometry.  
1.5 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety, health, and environmental practices and determine the applicability of regulatory limitations prior to use.  
1.6 This international standard was developed in accordance with internationally recognized principles on standardization established in the Decision on Principles for the Development of International Standards, Guides and Recommendations issued by the World Trade Organization Technical Barriers to Trade (TBT) Committee.

  • Standard
    3 pages
    English language
    sale 15% off
ASTM
ASTM E2108-16(Practice)
Standard Practice for Calibration of the Electron Binding-Energy Scale of an X-Ray Photoelectron Spectrometer

SIGNIFICANCE AND USE
5.1 X-ray photoelectron spectroscopy is used extensively for the surface analysis of materials. Elements (with the exception of hydrogen and helium) are identified from comparisons of the binding energies determined from photoelectron spectra with tabulated values. Information on chemical state can be derived from the chemical shifts of measured photoelectron and Auger-electron features with respect to those measured for elemental solids.  
5.2 Calibrations of the BE scales of XPS instruments are required for four principal reasons. First, meaningful comparison of BE measurements from two or more XPS instruments requires that the BE scales be calibrated, often with an uncertainty of about 0.1 eV to 0.2 eV. Second, identification of chemical state is based on measurement of chemical shifts of photoelectron and Auger-electron features, again with an uncertainty of typically about 0.1 eV to 0.2 eV; individual measurements, therefore, should be made and literature sources need to be available with comparable or better accuracies. Third, the availability of databases (3) of measured BEs for reliable identification of elements and determination of chemical states by computer software requires that published data and local measurements be made with uncertainties of about 0.1 eV to 0.2 eV. Finally, the growing adoption of quality management systems, such as, ISO 9001:2015, in many analytical laboratories has led to requirements that the measuring and test equipment be calibrated and that the relevant measurement uncertainties be known.  
5.3 The actual uncertainty of a BE measurement depends on instrument properties and stability, measurement conditions, and the method of data analysis. This practice makes use of tolerance limits ±δ (chosen, for example, at the 95 % confidence level) that represent the maximum likely uncertainty of a BE measurement, associated with the instrument in a specified time interval following a calibration (ISO 15472:2010). A user should select a...
SCOPE
1.1 This practice describes a procedure for calibrating the electron binding-energy (BE) scale of an X-ray photoelectron spectrometer that is to be used for performing spectroscopic analysis of photoelectrons excited by unmonochromated aluminum or magnesium Kα X-rays or by monochromated aluminum Kα X-rays.  
1.2 The calibration of the BE scale is recommended after the instrument is installed or modified in any substantive way. Additional checks and, if necessary, recalibrations are recommended at intervals chosen to ensure that BE measurements are statistically unlikely to be made with an uncertainty greater than a tolerance limit, specified by the analyst, based on the instrumental stability and the analyst’s needs. Information is provided by which the analyst can select an appropriate tolerance limit for the BE measurements and the frequency of calibration checks.  
1.3 This practice is based on the assumption that the BE scale of the spectrometer is sufficiently close to linear to allow for calibration by measurements of reference photoelectron lines having BEs near the extremes of the working BE scale. In most commercial instruments, X-ray sources with aluminum or magnesium anodes are employed and BEs are typically measured at least over the 0–1200 eV range. This practice can be used for the BE range from 0 eV to 1040 eV.  
1.4 The assumption that the BE scale is linear is checked by a measurement made with a reference photoelectron line or Auger-electron line that appears at an intermediate position. A single check is a necessary but not sufficient condition for establishing linearity of the BE scale. Additional checks can be made with specified reference lines on instruments equipped with magnesium or unmonochromated aluminum X-ray sources, with secondary BE standards, or by following the procedures of the instrument manufacturer. Deviations from BE-scale linearity can occur because of mechanical misalignments, ...

  • Standard
    17 pages
    English language
    sale 15% off
  • Standard
    17 pages
    English language
    sale 15% off