Standard Guide for Minimizing Unwanted Electron Beam Effects in Auger Electron Spectroscopy

SIGNIFICANCE AND USE
4.1 When electron beam excitation is used in AES, the incident electron beam can interact with the specimen material causing physical and chemical changes. In general, these effects are a hindrance to AES analysis because they cause localized specimen modification (1-4).5  
4.2 With specimens that have poor electrical conductivity the electron beam can stimulate the development of localized charge on the specimen surface. This effect is a hindrance to AES analysis because the potentials associated with the charge can either adversely affect the integrity of Auger data or make Auger data collection difficult (5, 6).
SCOPE
1.1 This guide outlines the origins and manifestations of unwanted electron beam effects in Auger electron spectroscopy (AES).  
1.2 Some general guidelines are provided concerning the electron beam parameters which are most likely to produce these effects and suggestions are offered on how to minimize them.  
1.3 General classes of materials are identified which are most likely to exhibit unwanted electron beam effects. In addition, a tabulation of some specific materials which have been observed to undergo electron damage effects is provided.  
1.4 A simple method is outlined for establishing the existence and extent of these effects during routine AES analysis.  
1.5 The values stated in SI units are to be regarded as standard. No other units of measurement are included in this standard.  
1.6 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety, health, and environmental practices and determine the applicability of regulatory limitations prior to use.  
1.7 This international standard was developed in accordance with internationally recognized principles on standardization established in the Decision on Principles for the Development of International Standards, Guides and Recommendations issued by the World Trade Organization Technical Barriers to Trade (TBT) Committee.

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This international standard was developed in accordance with internationally recognized principles on standardization established in the Decision on Principles for the
Development of International Standards, Guides and Recommendations issued by the World Trade Organization Technical Barriers to Trade (TBT) Committee.
Designation: E983 − 19
Standard Guide for
Minimizing Unwanted Electron Beam Effects in Auger
1
Electron Spectroscopy
This standard is issued under the fixed designation E983; the number immediately following the designation indicates the year of
original adoption or, in the case of revision, the year of last revision. A number in parentheses indicates the year of last reapproval. A
superscript epsilon (´) indicates an editorial change since the last revision or reapproval.
1. Scope E673 Terminology Relating to SurfaceAnalysis (Withdrawn
3
2012)
1.1 This guide outlines the origins and manifestations of
E996 Practice for Reporting Data in Auger Electron Spec-
unwanted electron beam effects inAuger electron spectroscopy
troscopy and X-ray Photoelectron Spectroscopy
(AES).
4
2.2 ISO Standard:
1.2 Some general guidelines are provided concerning the
ISO 18115-1:2013 Surface chemical analysis -- Vocabulary
electron beam parameters which are most likely to produce
-- Part 1: General terms and terms used in spectroscopy
these effects and suggestions are offered on how to minimize
3. Terminology
them.
3.1 See ISO 18115-1:2013 for terms used inAuger electron
1.3 General classes of materials are identified which are
spectroscopy.
most likely to exhibit unwanted electron beam effects. In
addition, a tabulation of some specific materials which have
NOTE 1—Electron beam effects and their consequences are widely
been observed to undergo electron damage effects is provided.
referred to in the literature using any one or more of the following terms:
electron beam damage, sample damage, specimen damage, beam effects,
1.4 A simple method is outlined for establishing the exis-
electron beam induced processes, and electron irradiation effects.
tence and extent of these effects during routine AES analysis.
4. Significance and Use
1.5 The values stated in SI units are to be regarded as
standard. No other units of measurement are included in this 4.1 When electron beam excitation is used in AES, the
standard. incident electron beam can interact with the specimen material
causing physical and chemical changes. In general, these
1.6 This standard does not purport to address all of the
effects are a hindrance to AES analysis because they cause
safety concerns, if any, associated with its use. It is the
5
localized specimen modification (1-4).
responsibility of the user of this standard to establish appro-
priate safety, health, and environmental practices and deter-
4.2 With specimens that have poor electrical conductivity
mine the applicability of regulatory limitations prior to use.
the electron beam can stimulate the development of localized
1.7 This international standard was developed in accor-
charge on the specimen surface. This effect is a hindrance to
dance with internationally recognized principles on standard-
AES analysis because the potentials associated with the charge
ization established in the Decision on Principles for the
can either adversely affect the integrity of Auger data or make
Development of International Standards, Guides and Recom-
Auger data collection difficult (5, 6).
mendations issued by the World Trade Organization Technical
5. Origins of Electron Beam Effects
Barriers to Trade (TBT) Committee.
5.1 Electron beam effects inAES may originate from one or
2. Referenced Documents
more distinct processes.
2
5.1.1 Charge accumulation (7) (see Chapter 9) in materials
2.1 ASTM Standards:
with poor electrical conductivity leading to potentials that
cause distortion of Auger data or make AES data collection
1
This guide is under the jurisdiction of ASTM Committee E42 on Surface
difficult by virtue of:
Analysis and is the direct responsibility of Subcommittee E42.03 on Auger Electron
Spectroscopy and X-Ray Photoelectron Spectroscopy.
3
Current edition approved April 1, 2019. Published May 2019. Originally The last approved version of this historical standard is referenced on
approved in 1984. Last previous edition approved in 2018 as E983–10 (2018). DOI: www.astm.org.
4
10.1520/E0983–19. Available from International Organization for Standardization (ISO), ISO
2
For referenced ASTM standards, visit the ASTM website, www.astm.org, or Central Secretariat, BIBC II, Chemin de Blandonnet 8, CP 401, 1214 Vernier,
contact ASTM Customer Service at service@astm.org. For Annual Book of ASTM Geneva, Switzerland, http://www.iso.org.
5
Standards volume information, refer to the standard’s Document Summary page on The boldface numbers in parentheses refer to the references listed at the end of
the ASTM website. this standard.
Copyright © ASTM International, 100 Barr Harbor Drive, PO Box C700, West Conshohocken, PA 19428
...

This document is not an ASTM standard and is intended only to provide the user of an ASTM standard an indication of what changes have been made to the previous version. Because
it may not be technically possible to adequately depict all changes accurately, ASTM recommends that users consult prior editions as appropriate. In all cases only the current version
of the standard as published by ASTM is to be considered the official document.
Designation: E983 − 10 (Reapproved 2018) E983 − 19
Standard Guide for
Minimizing Unwanted Electron Beam Effects in Auger
1
Electron Spectroscopy
This standard is issued under the fixed designation E983; the number immediately following the designation indicates the year of
original adoption or, in the case of revision, the year of last revision. A number in parentheses indicates the year of last reapproval. A
superscript epsilon (´) indicates an editorial change since the last revision or reapproval.
1. Scope
1.1 This guide outlines the origins and manifestations of unwanted electron beam effects in Auger electron spectroscopy (AES).
1.2 Some general guidelines are provided concerning the electron beam parameters which are most likely to produce these
effects and suggestions are offered on how to minimize them.
1.3 General classes of materials are identified which are most likely to exhibit unwanted electron beam effects. In addition, a
tabulation of some specific materials which have been observed to undergo electron damage effects is provided.
1.4 A simple method is outlined for establishing the existence and extent of these effects during routine AES analysis.
1.5 The values stated in SI units are to be regarded as standard. No other units of measurement are included in this standard.
1.6 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility
of the user of this standard to establish appropriate safety, health, and environmental practices and determine the applicability of
regulatory limitations prior to use.
1.7 This international standard was developed in accordance with internationally recognized principles on standardization
established in the Decision on Principles for the Development of International Standards, Guides and Recommendations issued
by the World Trade Organization Technical Barriers to Trade (TBT) Committee.
2. Referenced Documents
2
2.1 ASTM Standards:
3
E673 Terminology Relating to Surface Analysis (Withdrawn 2012)
E996 Practice for Reporting Data in Auger Electron Spectroscopy and X-ray Photoelectron Spectroscopy
4
2.2 ISO Standard:
ISO 18115-1:2013 Surface chemical analysis -- Vocabulary -- Part 1: General terms and terms used in spectroscopy
3. Terminology
3.1 See TerminologyISO E67318115-1:2013 for terms used in Auger electron spectroscopy.
NOTE 1—Electron beam effects and their consequences are widely referred to in the literature using any one or more of the following terms: electron
beam damage, sample damage, specimen damage, beam effects, electron beam induced processes, and electron irradiation effects.
4. Significance and Use
4.1 When electron beam excitation is used in AES, the incident electron beam can interact with the specimen material causing
physical and chemical changes. In general, these effects are a hindrance to AES analysis because they cause localized specimen
5
modification (1-4).
1
This guide is under the jurisdiction of ASTM Committee E42 on Surface Analysis and is the direct responsibility of Subcommittee E42.03 on Auger Electron
Spectroscopy and X-Ray Photoelectron Spectroscopy.
Current edition approved Nov. 1, 2018April 1, 2019. Published November 2018May 2019. Originally approved in 1984. Last previous edition approved in 20102018 as
E983–10. –10 (2018). DOI: 10.1520/E0983–10R18.10.1520/E0983–19.
2
For referenced ASTM standards, visit the ASTM website, www.astm.org, or contact ASTM Customer Service at service@astm.org. For Annual Book of ASTM Standards
volume information, refer to the standard’s Document Summary page on the ASTM website.
3
The last approved version of this historical standard is referenced on www.astm.org.
4
Available from International Organization for Standardization (ISO), ISO Central Secretariat, BIBC II, Chemin de Blandonnet 8, CP 401, 1214 Vernier, Geneva,
Switzerland, http://www.iso.org.
5
The boldface numbers in parentheses refer to the references listed at the end of this standard.
Copyright © ASTM International, 100 Barr Harbor Drive, PO Box C700, West Conshohocken, PA 19428-2959. United States
1

---------------------- Page: 1 ----------------------
E983 − 19
4.2 With specimens that have poor electrical conductivity the electron beam can stimulate the development of localized charge
on the specimen surface. This effect is a hindrance to AES analysis because the potentials associated with the charge can either
adversely affect the integrity of Auger data or make Auger data collection difficult (5, 6).
5. Origins of Electron
...

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