IEC 63378-3:2025
(Main)Thermal standardization on semiconductor packages - Part 3: Thermal circuit simulation models of discrete semiconductor packages for transient analysis
Thermal standardization on semiconductor packages - Part 3: Thermal circuit simulation models of discrete semiconductor packages for transient analysis
IEC 63378-3:2025 specifies the thermal circuit network model of discrete (TO‑243, TO‑252 and TO‑263) packages, which is used in the transient analysis of electronic devices to estimate precise junction temperatures without experimental verification.
This model is intended to be made and provided by semiconductor suppliers and to be used by assembly makers of electronic devices.
Normalisation thermique des boîtiers de semiconducteurs - Partie 3: Modèles de simulation de circuits thermiques de boîtiers de semiconducteurs discrets pour analyse transitoire
L’IEC 63378-3:2025 spécifie le modèle de réseau de circuits thermiques des boîtiers discrets (TO‑243, TO‑252 et TO‑263), qui est utilisé dans l’analyse transitoire des dispositifs électroniques pour estimer avec précision les températures de jonction sans vérification expérimentale.
Ce modèle est destiné à être fabriqué et fourni par les fournisseurs de semiconducteurs, et à être utilisé par les assembleurs de dispositifs électroniques.
General Information
Standards Content (Sample)
IEC 63378-3 ®
Edition 1.0 2025-05
INTERNATIONAL
STANDARD
NORME
INTERNATIONALE
Thermal standardization on semiconductor packages –
Part 3: Thermal circuit simulation models of discrete semiconductor packages
for transient analysis
Normalisation thermique des boîtiers de semiconducteurs –
Partie 3: Modèles de simulation de circuits thermiques de boîtiers de
semiconducteurs discrets pour analyse transitoire
ICS 31.080.01 ISBN 978-2-8327-0399-1
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– 2 – IEC 63378-3:2025 © IEC 2025
CONTENTS
FOREWORD . 3
1 Scope . 5
2 Normative references . 5
3 Terms and definitions . 5
4 Procedure of thermal circuit network model . 6
4.1 General . 6
4.2 Detailed model analysis . 6
4.3 Delphi model preparation . 9
4.4 Thermal circuit model topology . 9
4.5 Determination of thermal capacitance values . 10
Annex A (normative) Validation for TO-252 case . 13
A.1 General . 13
A.2 Simulation parameters . 13
A.3 Comparison of detailed thermal model versus D2elphi model . 13
Bibliography . 15
Figure 1 – Two-resistor model. 6
Figure 2 – Delphi model . 6
Figure 3 – Detailed model (example) . 7
Figure 4 – PCB model . 8
Figure 5 – Simulation volume . 8
Figure 6 – Topology . 10
Figure A.1 – Heatsink model . 13
Table 1 – Dimensions and material properties of detailed model (Example) . 7
Table 2 – Dimensions and material properties of PCB model . 8
Table 3 – Thermal capacitance of the portions (Example) . 10
Table 4 – Thermal capacitance assignment . 11
Table 5 – The combination of α, β, γ (example) . 11
Table A.1 – Comparison with detailed thermal model and D2elphi model . 14
INTERNATIONAL ELECTROTECHNICAL COMMISSION
____________
THERMAL STANDARDIZATION ON SEMICONDUCTOR PACKAGES –
Part 3: Thermal circuit simulation models of discrete
semiconductor packages for transient analysis
FOREWORD
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IEC 63378-3 has been prepared by subcommittee 47D: Semiconductor devices packaging, of
IEC technical committee 47: Semiconductor devices. It is an International Standard.
The text of this International Standard is based on the following documents:
Draft Report on voting
47D/967/CDV 47D/979/RVC
Full information on the voting for its approval can be found in the report on voting indicated in
the above table.
The language used for the development of this International Standard is English.
– 4 – IEC 63378-3:2025 © IEC 2025
This document was drafted in accordance with ISO/IEC Directives, Part 2, and developed in
accordance with ISO/IEC Directives, Part 1 and ISO/IEC Directives, IEC Supplement, available
at www.iec.ch/members_experts/refdocs. The main document types developed by IEC are
described in greater detail at www.iec.ch/publications.
A list of all parts in the IEC 63378 series, published under the general title Thermal
standardization on semiconductor packages, can be found on the IEC website.
The committee has decided that the contents of this document will remain unchanged until the
stability date indicated on the IEC website under webstore.iec.ch in the data related to the
specific document. At this date, the document will be
• reconfirmed,
• withdrawn, or
• revised.
THERMAL STANDARDIZATION ON SEMICONDUCTOR PACKAGES –
Part 3: Thermal circuit simulation models of discrete
semiconductor packages for transient analysis
1 Scope
This part of IEC 63378 specifies the thermal circuit network model of discrete (TO-243, TO-252
and TO-263) packages, which is used in the transient analysis of electronic devices to estimate
precise junction temperatures without experimental verification.
This model is intended to be made and provided by semiconductor suppliers and to be used by
assembly makers of electronic devices.
2 Normative references
There are no normative references in this document.
3 Terms and definitions
For the purposes of this document, the following terms and definitions apply.
ISO and IEC maintain terminology databases for use in standardization at the following
addresses:
• IEC Electropedia: available at https://www.electropedia.org/
• ISO Online browsing platform: available at https://www.iso.org/obp
3.1
detailed model
semiconductor package model which has both the geometrical dimensions of each portion, such
as die or moulding or lead, and the material properties, for thermal analysis
Note 1 to entry: This model is often simplified to some extent.
3.2
thermal circuit network model
RC network model
thermal model of semiconductor packages which comprises multiple nodes, thermal resistances
between nodes and thermal capacitances for each node
3.3
thermal resistance model
thermal circuit network model which is composed of multiple nodes and resistances between
nodes for steady-state analysis
3.4
two-resistor model
thermal resistance model which has three nodes and two resistances
Note 1 to entry: Figure 1 shows this model.
– 6 – IEC 63378-3:2025 © IEC 2025
Figure 1 – Two-resistor model
3.5
Delphi model
thermal resistance model in which multiple resistors are connected in two dimensions
Note 1 to entry: Figure 2 shows the basic type of this model which contains six nodes and nine resistances.
Figure 2 – Delphi model
4 Procedure of thermal circuit network model
4.1 General
Clause 4 describes how a conventional Delphi model is transformed into a proposed transient
model. The procedure is described using a specific package as an "example".
4.2 Detailed model analysis
At first, the thermal analysis using the detailed model shall be done in order to obtain the profile
of semiconductor temperature versus time. The power (heat quantity) shall be constant.
The detailed example model is shown in Figure 3. This model is composed of a moulding, a
semiconductor die, a die attach, a heat spreader and leads.
Figure 3 – Detailed model (example)
The dimensions and material properties shall then be prepared as shown in Table 1.
Table 1 – Dimensions and material properties of detailed model (Example)
Thermal
Material Size Density Specific heat
conductivity
3 3
(W/m∙K) (J/kg∙K)
(mm ) (kg/m )
Semiconductor die 2,0 × 2,0 × 0,3 117,5 2 330 700
Die attach 2,0 × 2,0 × 0,025 50,0 14 500 151
Moulding 6,1 × 6,54 × 2,29 0,649 1 840 882
4,32 × 4,32 × 0,67
Heat spreader 301,5 8 900 385
1,08 × 5,21 × 0,67
Width: 0,76
Lead 188 8 900 410
Thickness: 0,51
This package model shall be mounted on a printed circuit board (PCB) model. The PCB model
used in this case is shown in Figure 4. Copper traces of the PCB model shall be drawn as
follows:
1) recommended footprints of the package shall be drawn. The lengths of A, B and C which are
indicated in Figure 4, should be the same;
2) the footprints of the leads shall be extended in parallel to the edge of the PCB.
In this figure, the yellow area is Cu trace and the green one is insulator. The size of the PCB
model is 76,2 × 114,3 × 1,6 (mm ).
– 8 – IEC 63378-3:2025 © IEC 2025
Figure 4 – PCB model
Table 2 shows the dimensions and material properties of the PCB model.
Table 2 – Dimensions and material properties of PCB model
Thermal
Material Thickness Density Specific heat
conductivity
(mm) (W/m∙K) (kg/m ) (J/kg∙K)
Cu layer 0,07 385 8 930 385
1 200 880
Insulator 1,53 0,3
The simulation volume, which is filled with air, is 300 × 300 × 300 (mm ) as indicated in Figure 5.
Six surfaces of this volume have thermal convection constant of 6 W/m ∙K as boundary
conditions considering natural convection. The semiconductor package model shall be set at
the centre of this volume [1] .
Figure 5 – Simulation volume
___________
Numbers in square brackets refer to the Bibliography.
The end time of the simulation shall be long enough to reach steady state conditions and it
th
should be 1 800 s. The n calculation time shall be selected using Equation (1).
n
(1)
tn = t ⋅
( )
e
where
n is the calculation times which is from 1 to 200;
th
t(n) is the n calculation time;
t is the end time of simulation (1 800 s is recommended).
e
The die temperature of each time above is calculated using transient thermal analysis in case
of the conditions explained above.
4.3 Delphi model preparation
A Delphi model of the package shall be prepared [2]. The model shall have six nodes and nine
resistances. These nodes are called "solid node". Note that the analysis accuracy depends on
the prepared Delphi model, especially for the steady-state temperature. Figure 2 shows the
prepared Delphi model.
4.4 Thermal circuit model topology
A new node called "lower half" shall be made between the "semiconductor die node" and
"bottom inner node" because the main heat path has to be modelled finely. The resistance
between them shall be divided into two resistances.
The thermal resistance of the semiconductor die (Equation (2)) was given to the thermal
resistance between the semiconductor die node and the lower half node, the rest of the thermal
resistance was given to the resistance between the "lower half" node and the "bottom inner"
node.
l
R =
(2)
d
kA⋅
d
where
R is the thermal resistance of the semiconductor die;
d
k is the thermal conductivity of the semiconductor die (in this example, silicon is used as
d
shown in Table 1);
-6 2
A is the cross-sectional area of the die (in this example, the area is 4,0 × 10 m as shown
in Table 1);
-4
l is the thickness of the die (in this example, the thickness is 3,0 × 10 m as indicated in
Table 1).
In addition to this lower half node, six ground nodes shall be prepared. Solid nodes and ground
nodes shall be connected with thermal capacitance. Figure 6 shows the topology.
– 10 – IEC 63378-3:2025 © IEC 2025
Figure 6 – Topology
4.5 Determination of thermal capacitance values
The values of all thermal capacitances shall be calculated using a design of experiment (DoE) .
Table 3 shows the thermal capacitance of each portion. These thermal capacitances are
calculated by volume, density and specific heat of the components as indicated in Equation (3).
C= Vd⋅⋅ c
(3)
p p pp
where
C is the heat capacity of the portion such as moulding;
p
V is the volume of the portion;
p
d is the density of the portion;
p
c is the specific heat of the portion.
p
Table 3 – Thermal capacitance of the portions (Example)
Thermal
Portion Volume Density Specific heat
capacitance
3 3
(J/K) (m ) (kg/m ) (J/kg-K)
Moulding 0,122 5 7,549 5e-8 1 840 882
Semiconductor die 0,002 0 1,200 0e-9 2 330 700
Die attach 0,000 2 1,000 0e-10 14 500 151
Heat spreader 0,055 7 1,627 4e-8 8 900 385
Lead 0,019 9 5,441 9e-9 8 900 410
Bonding wire 0,000 1 3,927 0e-11 10 500 235
The thermal capacitances of the portions shall be fitted to the model capacitance. One method
is described below with the formulas of Table 4. The capacitance of bonding wire is so small
that it can be ignored.
Table 4 – Thermal capacitance assignment
Symbol Thermal capacitance value
C1 C
semiconductor die
C2 (1-α-β)·C
moulding
C3 α·C
moulding
C4 β·C
moulding
C5
(1-γ)·C
heat spreader
C6
γ·C
heat spreader
Where α, β, γ are constant parameters, their ranges are between 0,01 and 0,99.
A large number of combinations, more than 31, should be adopted. In case of 31 combinations,
the values of α, β, γ parameters should be used as shown in Table 5.
Table 5 – The combination of α, β, γ (example)
Number 0 1 2 3 4 5 6 7 8 9 10
α 0,050 0 0,123 1 0,490 6 0,170 2 0,481 2 0,311 5 0,066 5 0,019 4 0,038 3 0,094 8 0,057 1
β 0,900 0 0,865 2 0,434 0 0,819 8 0,502 1 0,445 4 0,456 7 0,967 3 0,695 0 0,626 9 0,479 4
γ 0,500 0 0,115 4 0,638 5 0,361 5 0,869 2 0,561 5 0,207 7 0,238 5 0,330 8 0,330 8 0,838 5
Number 11 12 13 14 15 16 17 18 19 20 21
α 0,339 8 0,076 0 0,255 0 0,179 6 0,085 4 0,010 0 0,321 0 0,207 9 0,471 7 0,283 3 0,377 5
β 0,422 7 0,717 7 0,729 0 0,581 5 0,672 3 0,978 7 0,524 8 0,400 0 0,513 5 0,706 3 0,604 2
γ 0,284 6 0,623 1 0,176 9 0,376 9 0,884 6 0,792 3 0,900 0 0,807 7 0,423 1 0,853 8 0,669 2
Number 22 23 24 25 26 27 28 29 30
α 0,236 2 0,500 0 0,028 8 0,132 5 0,386 9 0,189 0 0,349 2 0,141 9 0,226 7
β 0,751 7 0,468 1 0,536 2 0,853 8 0,592 9 0,570 2 0,638 3 0,411 3 0,490 8
γ 0,592 3 0,161 5 0,546 2 0,823 1 0,146 2 0,684 6 0,407 7 0,407 7 0,130 8
Then all combinations of thermal analysis shall be executed in order to define the constants of
α, β, γ. The same PCB model, simulation volume and time period as the detailed analysis shall
be used.
Then, square summation (SS) shown in Equation (4) shall be calculated.
SS T− T
(4)
( )
∑ d, nnn,
n=1
where
th
T is the temperature of the n calculation time step which is calculated using the
d, n
detailed model;
th
is the temperature of the n calculation time step which is calculated using this
T
n, n
thermal circuit network model.
Finally, the least case of square summation shall be selected.
=
– 12 – IEC 63378-3:2025 © IEC 2025
In the presented example, α, β, γ of number 25 (α = 0,132 5 and β = 0,853 8 and γ = 0,823 1)
results in the least square summation. The unknown parameters of thermal capacitance are
determined using these processes.
Simulation accuracy of this thermal simulation model is explained in Annex A.
Annex A
(normative)
Validation for TO-252 case
A.1 General
Annex A provides a description of the relationship between the detailed model and the
developed transient thermal circuit model.
This transient thermal circuit model is named as dynamic Delphi and its abbreviation is D2elphi.
A.2 Simulation parameters
There are two simulation parameters. One is the size of semiconductor die (1 × 1 × 0,3 (mm )
3 3
or 2 × 2 × 0,3 (mm )
...








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