Surface chemical analysis — General procedures for quantitative compositional depth profiling by glow discharge optical emission spectrometry

ISO 11505:2013 describes a glow discharge optical emission spectrometric (GD-OES) method for the determination of the thickness, mass per unit area and chemical composition of surface layer films. It is limited to a description of general procedures of quantification of GD-OES and is not applicable directly for the quantification of individual materials having various thicknesses and elements to be determined.

Analyse chimique des surfaces — Modes opératoires généraux pour le profilage en profondeur compositionnel quantitatif par spectrométrie d'émission optique à décharge luminescente

General Information

Status
Published
Publication Date
11-Dec-2012
Current Stage
9092 - International Standard to be revised
Completion Date
29-Sep-2023
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ISO 11505:2012 - Surface chemical analysis -- General procedures for quantitative compositional depth profiling by glow discharge optical emission spectrometry
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INTERNATIONAL ISO
STANDARD 11505
First edition
2012-12-15
Surface chemical analysis —
General procedures for quantitative
compositional depth profiling by
glow discharge optical emission
spectrometry
Analyse chimique des surfaces — Modes opératoires généraux pour le
profilage en profondeur compositionnel quantitatif par spectrométrie
d’émission optique à décharge luminescente
Reference number
ISO 11505:2012(E)
©
ISO 2012

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ISO 11505:2012(E)

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© ISO 2012
All rights reserved. Unless otherwise specified, no part of this publication may be reproduced or utilized in any form or by any
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address below or ISO’s member body in the country of the requester.
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Published in Switzerland
ii © ISO 2012 – All rights reserved

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ISO 11505:2012(E)

Contents Page
Foreword .iv
1 Scope . 1
2 Normative references . 1
3 Principle . 1
4 Apparatus . 1
4.1 Glow discharge optical emission spectrometer. 1
5 Adjusting the glow discharge spectrometer system settings . 3
5.1 General . 3
5.2 Setting the discharge parameters of a DC source . 4
5.3 Setting the discharge parameters of an RF source . . 6
5.4 Minimum performance requirements . 7
6 Sampling . 9
7 Calibration . 9
7.1 General . 9
7.2 Calibration specimens . 9
7.3 Validation specimens .11
7.4 Determination of the sputtering rate of calibration and validation specimens .11
7.5 Emission intensity measurements of calibration specimens .12
7.6 Calculation of calibration equations .12
7.7 Validation of the calibration .12
7.8 Verificati
...

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