Space product assurance - Particles contamination monitoring for spacecraft systems and cleanrooms

This standard defines the requirements and guidelines for the measurement of particulate contamination on the surfaces of spacecraft systems and those of the cleanrooms or other cleanliness controlled areas in which they reside.
This includes the measurement of particulate contamination that is present on the spacecraft or cleanroom surfaces via the use of representative witness samples placed in the vicinity of the spacecraft hardware, the direct measurement of particulate contamination
levels on surfaces of spacecraft hardware from the direct surface transfer to adhesive tape-lift samples and particulate contaminant levels within fluids used for the cleaning or rinsing of such spacecraft system components and cleanroom surfaces. This standard also defines the methods to be used for the visual inspection of spacecraft system hardware for particulate contamination.
The measurement of airborne particulate contamination is not covered in this standard and ISO 14644 “Cleanrooms and associated
controlled environments” is applicable in this case.
This standard does not cover particulate contamination monitoring for spacecraft propulsion hardware which is covered in ECSS-E-ST-35-06.
This standard may be tailored for the specific characteristic and constrains of a space project in conformance with ECSS-S-ST-00.

Raumfahrtproduktsicherung - Überwachung der Teilchenkontamination von Raumfahrzeugsystemen und Reinräumen

Assurance produit des projets spatiaux - Surveillance de la contamination aux particules des systèmes orbitaux et des salles blanches

Zagotavljanje varnih proizvodov v vesoljski tehniki - Nadzorovanje onesnaženja z delci v sistemih vesoljskega plovila in čistih prostorih

Ta standard določa zahteve in smernice za merjenje onesnaženja z delci na površinah sistemov vesoljskega plovila in površinah čistih prostorov ali drugih območij z nadzorom čistoče, v katerih bivajo. Sem spada merjenje onesnaženja z delci, ki je prisotno na površinah vesoljskega plovila ali čistih prostorov, z uporabo reprezentativnih vzorcev v bližini strojne opreme vesoljskega plovila, neposredno merjenje ravni onesnaženja z delci na površinah strojne opreme vesoljskega plovila z neposrednega prenosa s površin na vzorce, zbrane z adhezivnim trakom, in ravni onesnaženja z delci v tekočinah, ki se uporabljajo za čiščenje ali splakovanje teh komponent sistemov vesoljskega plovila in površin čistih prostorov. Ta standard določa tudi metode, ki se uporabljajo za vizualni pregled strojne opreme sistemov vesoljskega plovila za onesnaženje z delci. Merjenje onesnaženja z delci v zraku ni obravnavano v tem standardu; v tem primeru se uporablja standard ISO 14644 »Čiste sobe in podobna nadzorovana okolja«. Ta standard ne obravnava nadzorovanja onesnaženja z delci za pogonsko strojno opremo vesoljskega plovila, kar je obravnavano v standardu ECSS-E-ST-35-06. Ta standard se lahko prilagodi posameznim lastnostim in omejitvam vesoljskega projekta v skladu s standardom ECSS-S-ST-00

General Information

Status
Published
Public Enquiry End Date
19-Aug-2014
Publication Date
04-Mar-2015
Technical Committee
Current Stage
6060 - National Implementation/Publication (Adopted Project)
Start Date
19-Feb-2015
Due Date
26-Apr-2015
Completion Date
05-Mar-2015

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SLOVENSKI STANDARD
SIST EN 16602-70-50:2015
01-april-2015
=DJRWDYOMDQMHYDUQLKSURL]YRGRYYYHVROMVNLWHKQLNL1DG]RURYDQMHRQHVQDåHQMD]
GHOFLYVLVWHPLKYHVROMVNHJDSORYLODLQþLVWLKSURVWRULK

Space product assurance - Particles contamination monitoring for spacecraft systems

and cleanrooms
Raumfahrtproduktsicherung - Überwachung der Teilchenkontamination von
Raumfahrzeugsystemen und Reinräumen

Assurance produit des projets spatiaux - Surveillance de la contamination aux particules

des systèmes orbitaux et des salles blanches
Ta slovenski standard je istoveten z: EN 16602-70-50:2015
ICS:
13.040.35 Brezprašni prostori in Cleanrooms and associated
povezana nadzorovana controlled environments
okolja
49.140 Vesoljski sistemi in operacije Space systems and
operations
SIST EN 16602-70-50:2015 en

2003-01.Slovenski inštitut za standardizacijo. Razmnoževanje celote ali delov tega standarda ni dovoljeno.

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SIST EN 16602-70-50:2015
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SIST EN 16602-70-50:2015
EUROPEAN STANDARD
EN 16602-70-50
NORME EUROPÉENNE
EUROPÄISCHE NORM
January 2015
ICS 49.140
English version
Space product assurance - Particles contamination monitoring
for spacecraft systems and cleanrooms

Assurance produit des projets spatiaux - Surveillance de la Raumfahrtproduktsicherung - Überwachung der

contamination aux particules des systèmes orbitaux et des Teilchenkontamination von Raumfahrzeugsystemen und

salles blanches Reinräumen
This European Standard was approved by CEN on 25 October 2014.

CEN and CENELEC members are bound to comply with the CEN/CENELEC Internal Regulations which stipulate the conditions for giving

this European Standard the status of a national standard without any alteration. Up-to-date lists and bibliographical references concerning

such national standards may be obtained on application to the CEN-CENELEC Management Centre or to any CEN and CENELEC

member.

This European Standard exists in three official versions (English, French, German). A version in any other language made by translation

under the responsibility of a CEN and CENELEC member into its own language and notified to the CEN-CENELEC Management Centre

has the same status as the official versions.

CEN and CENELEC members are the national standards bodies and national electrotechnical committees of Austria, Belgium, Bulgaria,

Croatia, Cyprus, Czech Republic, Denmark, Estonia, Finland, Former Yugoslav Republic of Macedonia, France, Germany, Greece,

Hungary, Iceland, Ireland, Italy, Latvia, Lithuania, Luxembourg, Malta, Netherlands, Norway, Poland, Portugal, Romania, Slovakia,

Slovenia, Spain, Sweden, Switzerland, Turkey and United Kingdom.
CEN-CENELEC Management Centre:
Avenue Marnix 17, B-1000 Brussels

© 2015 CEN/CENELEC All rights of exploitation in any form and by any means reserved Ref. No. EN 16602-70-50:2015 E

worldwide for CEN national Members and for CENELEC
Members.
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SIST EN 16602-70-50:2015
EN 16602-70-50:2015 (E)
Table of contents

Foreword .................................................................................................................... 4

Introduction ................................................................................................................ 5

1 Scope ....................................................................................................................... 6

2 Normative references ............................................................................................. 7

3 Terms, definitions and abbreviated terms ............................................................ 8

3.1 Terms defined in other standards ............................................................................. 8

3.2 Terms specific to the present standard ..................................................................... 8

3.3 Abbreviated terms................................................................................................... 11

4 Particulate cleanliness monitoring requirements .............................................. 12

4.1 Cleanliness requirement specification overview ...................................................... 12

4.2 Cleanliness and contamination control plan ............................................................ 12

5 Quantitative method requirements ..................................................................... 13

5.1 Particles sampling from surfaces ............................................................................ 13

5.1.1 Tape lift method ........................................................................................ 13

5.1.2 Direct deposition on silicon wafers ............................................................ 16

5.1.3 Rinsing (direct or indirect) ......................................................................... 18

5.2 Volume sampling .................................................................................................... 21

5.2.1 Particles sampling from filtered liquid samples .......................................... 21

5.2.2 Particles sampling from filtered gas samples............................................. 23

5.2.3 Particles sampling with automatic counters ............................................... 25

5.3 Particles counting with microscope ......................................................................... 25

5.3.1 Introduction ............................................................................................... 25

5.3.2 General requirements ............................................................................... 25

5.3.3 Apparatus ................................................................................................. 26

5.3.4 Method ...................................................................................................... 26

5.3.5 Statistical sampling method ....................................................................... 27

5.3.6 Conversion of particle count to obscuration factor ..................................... 29

5.4 Particle fallout measurement (PFO) ........................................................................ 30

5.4.1 Introduction ............................................................................................... 30

5.4.2 General requirements ............................................................................... 30

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EN 16602-70-50:2015 (E)

5.4.3 Apparatus ................................................................................................. 30

5.4.4 Cleaning of the sensors ............................................................................ 31

5.4.5 Packing of PFO sensors............................................................................ 31

5.4.6 Transportation of PFO sensors ................................................................. 31

5.4.7 Exposure of PFO sensors ......................................................................... 32

5.4.8 Location of the PFO sensors ..................................................................... 32

5.4.9 Fixation of the PFO sensors ...................................................................... 33

6 Visual inspection method requirements............................................................. 34

6.1 Introduction ............................................................................................................. 34

6.2 General requirements ............................................................................................. 34

6.3 Visual inspection of small items .............................................................................. 35

6.3.1 Visual inspection of small contamination sensitive items ........................... 35

6.3.2 Visual inspection of small non sensitive contamination items .................... 37

6.4 In situ visual inspection of spacecraft ...................................................................... 38

6.4.1 Introduction ............................................................................................... 38

6.4.2 Apparatus ................................................................................................. 38

6.4.3 Method ...................................................................................................... 38

7 Quality assurance ................................................................................................. 39

7.1 Records .................................................................................................................. 39

7.2 Report ..................................................................................................................... 39

7.3 Acceptance criteria and nonconformance ............................................................... 39

Annex A (normative) Request for particle contamination monitoring - DRD ..... 41
Annex B (normative) Particulate contamination monitoring procedure

(Work proposal) - DRD ........................................................................................ 42

Annex C (normative) Report on particle contamination monitoring - DRD ....... 44

Annex D (normative) Report on visual inspection - DRD .................................... 47

Bibliography ............................................................................................................. 50

Figures

Figure 5-1: Schematic for vacuum filtering apparatus ........................................................... 23

Figure 5-2: Gas sampling schematics ................................................................................... 25

Figure 5-3: Mask example for statistical sampling ................................................................ 28

Tables

Table 5-1: Ranges and average areas for a single particle in each range ............................ 30

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SIST EN 16602-70-50:2015
EN 16602-70-50:2015 (E)
Foreword
This document (EN 16602-70-50:2015) has been prepared by Technical
Committee CEN/CLC/TC 5 “Space”, the secretariat of which is held by DIN.
This standard (EN 16602-70-50:2015) originates from ECSS-Q-ST-70-50C.
This European Standard shall be given the status of a national standard, either

by publication of an identical text or by endorsement, at the latest by July 2015,

and conflicting national standards shall be withdrawn at the latest by July 2015.

Attention is drawn to the possibility that some of the elements of this document
may be the subject of patent rights. CEN [and/or CENELEC] shall not be held
responsible for identifying any or all such patent rights.
This document has been prepared under a mandate given to CEN by the
European Commission and the European Free Trade Association.
This document has been developed to cover specifically space systems and has
therefore precedence over any EN covering the same scope but with a wider
domain of applicability (e.g. : aerospace).
According to the CEN-CENELEC Internal Regulations, the national standards
organizations of the following countries are bound to implement this European
Standard: Austria, Belgium, Bulgaria, Croatia, Cyprus, Czech Republic,
Denmark, Estonia, Finland, Former Yugoslav Republic of Macedonia, France,
Germany, Greece, Hungary, Iceland, Ireland, Italy, Latvia, Lithuania,
Luxembourg, Malta, Netherlands, Norway, Poland, Portugal, Romania,
Slovakia, Slovenia, Spain, Sweden, Switzerland, Turkey and the United
Kingdom.
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SIST EN 16602-70-50:2015
EN 16602-70-50:2015 (E)
Introduction
Particulate contaminants can be hazardous to spacecraft in a number of ways
including failure of precision mechanisms, light absorption and scattering,
points of high local electric field and associated electrostatic discharge, and
noise on electrical contacts. It is therefore important to control, measure and
verify the particulate contamination levels on spacecraft systems and the
environments in which they reside, in order that an assessment can be made on
any hazards that may be present as a result of such contamination.
The objective of this standard is to ensure that the particle monitoring of
spacecraft systems and cleanrooms utilised in the production of such systems,
is carried out in an appropriate manner, and is controlled both in terms of the
precision of the measurements and the reproducibility of such measurements.
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SIST EN 16602-70-50:2015
EN 16602-70-50:2015 (E)
Scope
This standard defines the requirements and guidelines for the measurement of
particulate contamination on the surfaces of spacecraft systems and those of the
cleanrooms or other cleanliness controlled areas in which they reside.
This includes the measurement of particulate contamination that is present on
the spacecraft or cleanroom surfaces via the use of representative witness
samples placed in the vicinity of the spacecraft hardware, the direct
measurement of particulate contamination levels on surfaces of spacecraft
hardware from the direct surface transfer to adhesive tape-lift samples and
particulate contaminant levels within fluids used for the cleaning or rinsing of
such spacecraft system components and cleanroom surfaces. This standard also
defines the methods to be used for the visual inspection of spacecraft system
hardware for particulate contamination.
The measurement of airborne particulate contamination is not covered in this
standard and ISO 14644 “Cleanrooms and associated controlled environments”
is applicable in this case.
This standard does not cover particulate contamination monitoring for
spacecraft propulsion hardware which is covered in ECSS-E-ST-35-06.

This standard may be tailored for the specific characteristic and constrains of a

space project in conformance with ECSS-S-ST-00.
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SIST EN 16602-70-50:2015
EN 16602-70-50:2015 (E)
Normative references
The following normative documents contain provisions which, through
reference in this text, constitute provisions of this ECSS Standard. For dated
references, subsequent amendments to, or revision of any of these publications
do not apply. However, parties to agreements based on this ECSS Standard are

encouraged to investigate the possibility of applying the more recent editions of

the normative documents indicated below. For undated references, the latest
edition of the publication referred to applies.
EN reference Reference in text Title
EN 16601-00-01 ECSS-S-ST-00-01 ECSS System - Glossary of terms
EN 16602-10-09 ECSS-Q-ST-10-09 Space product assurance - Nonconformance control
system
EN 16602-20 ECSS-Q-ST-20 Space product assurance - Quality assurance
EN 16602-70-01 ECSS-Q-ST-70-01 Space product assurance - Cleanliness and
contamination control
ISO 14952-3 Space systems - Surface cleanliness of fluid systems -
Part 3: Analytical procedures for the determination of
nonvolatile residues and particulate contamination
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SIST EN 16602-70-50:2015
EN 16602-70-50:2015 (E)
Terms, definitions and abbreviated terms
3.1 Terms defined in other standards
For the purpose of this Standard, the terms and definitions from ECSS-S-ST-00-01
apply.
3.2 Terms specific to the present standard
3.2.1 background count
measurement of the contamination levels produced by the measurement
method (and associated apparatus) and the measurement environment as
distinct from the inherent contamination level of the item to be measured
3.2.2 background subtraction
act of subtracting a background count from a measurement
3.2.3 black light illumination
illumination which predominantly produces light in the near UV region (310 nm
to 400 nm)
3.2.4 bubble
volume of trapped gas encapsulated by another medium
3.2.5 cleanliness and contamination control plan
plan which defines the organized actions to control the level of contamination
3.2.6 cleanliness controlled area
area in which there are specific measures to control and monitor contamination
which allows the counting of particles to be performed with sufficient accuracy
as defined by the background count
3.2.7 cleanliness requirement specification
specification that defines the requirement for allowable contamination levels
3.2.8 cleanliness verification
activity intended to verify that the actual cleanliness conditions of the
spacecraft system, the cleanrooms, and other environments in which the
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EN 16602-70-50:2015 (E)
spacecraft system will reside, are in conformance with the applicable
specifications and other cleanliness requirements
3.2.9 compatible
not deteriorating the functionality, performance and integrity of any item or
surface
3.2.10 contamination potential
potential amount of contaminant in the source which can produce
contamination defined in terms of the obscuration factor per unit time
NOTE The obscuration factor per unit time can be
2 2
expressed in [(mm /m )/h].
3.2.11 contamination sensitive

article which, if exposed to contamination, can be adversely affected in terms of

its designed function
3.2.12 effective sample area
area on a surface that has been exposed to a contamination source
3.2.13 lint-free
resistant to fibre generation
3.2.14 membrane filter
polymer film with specific pore sizes, designed to separate particles from
liquids or gases
3.2.15 non-shedding
resistant to particle generation
3.2.16 obscuration factor

ratio of the projected area of all particles to the total surface area on which they

rest
3.2.17 particle
unit of matter with observable length, width and thickness
NOTE For the purposes of this standard the particles
have typical dimensions of 0,1 μm to 1000 μm.
3.2.18 particulate contamination
airborne or surface contamination relating to particles
3.2.19 particle fallout
accumulated deposit of particulate matter on a surface
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SIST EN 16602-70-50:2015
EN 16602-70-50:2015 (E)
3.2.20 representative sample
sample which is designed to be the same as another item, either in physical
form or the environment in which it resides, or both
3.2.21 ripple
topographical in-homogeneity usually in the form of a wave pattern
3.2.22 sensitive surface
surface that has a high probability of damage
3.2.23 spectral grade
measure of solvent purity determined from its absorption spectrum
NOTE Typically spectral grade solvents have a purity
of greater than 99,5 %.
3.2.24 tape-lift
method of transferring particulate contamination from a surface with an
adhesive tape
3.2.25 tape-lift sample
length of transparent adhesive tape that has been used for a tape lift and
subsequently applied to a clean substrate to encapsulate any contamination
3.2.26 trained inspector

inspector certified by a third party certification body, or with proven on the job

experience that is agreed with or recognized by the customer
3.2.27 ultrasonic bath
bath containing liquid and a transducer which produces ultrasonic waves
which produce microscopic cavitation bubbles in the liquid which aids in the
removal of particles from surfaces of an item placed in the liquid
NOTE Typical frequency of ultrasonic waves is from
15 kHz to 400 kHz.
3.2.28 visibly clean
absence of surface contamination when examined with a specific light source,
angle of incidence and viewing distance using normal or magnified vision
NOTE 1 Different inspection methods are available,
depending on:
• hardware to be inspected, in term of size
and accessibility and sensitivity to
contamination
• inspection distance
• light spectra (including UV), intensities and
angles
NOTE 2 The “visibly clean” level roughly corresponds to
2 2
an obscuration factor smaller than 300 mm /m
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SIST EN 16602-70-50:2015
EN 16602-70-50:2015 (E)
when inspected from a distance of 30 cm to 60
cm with an oblique white light of 540 lx to 1620
lx.
NOTE 3 Typical magnification levels range from 2x to 8x.
3.2.29 visibly clean standard
absence of surface contamination when examined under oblique white light of
more than 540 lx and from a distance of 150 cm to 300 cm using normal vision
3.2.30 visibly clean sensitive
absence of surface contamination when examined under oblique white light of
more than 540 lx and from a distance of 60 cm to 120 cm using normal vision
3.2.31 visibly clean highly sensitive
absence of surface contamination when examined under oblique white light of
more than 1080 lx and from a distance of 15 cm to 45 cm using normal or
magnified vision
3.2.32 visual inspection
act of examining an object under defined illumination and viewing conditions
with normal or magnified vision
3.2.33 void
area devoid of matter
3.3 Abbreviated terms
The following abbreviations are defined and used within this standard:
Abbreviation Meaning
cleanliness and contamination control plan
C&CCP
cleanliness requirement specification
CRS
isopropyl alcohol
IPA
International Organization for Standardization
ISO
laser emitting diode
LED
lux
obscuration factor
printed circuit board
PCB
particle fallout
PFO
ultra-violet
ultra-violet (310 nm - 400 nm)
UVA
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SIST EN 16602-70-50:2015
EN 16602-70-50:2015 (E)
Particulate cleanliness monitoring
requirements
4.1 Cleanliness requirement specification overview
ECSS-Q-ST-70-01 requires that the particulate contamination level applicable to
spacecraft systems is defined in a cleanliness requirement specification (CRS).
This standard also requires that the CRS explicitly defines the allowable levels
of particulate contamination throughout the lifetime of the spacecraft, and that

this levels are incorporated into the overall cleanliness budget for the spacecraft

systems.
4.2 Cleanliness and contamination control plan
a. Particulate cleanliness and contamination control shall be planned in
accordance with ECSS-Q-ST-70-01.
NOTE Cleanliness and Contamination Control Plan
(C&CCP) identifies potential contamination
sources, the effects that those sources have on
the spacecraft systems in addition to identifying
spacecraft systems which are contamination
sensitive to particles.
b. Measurement methods specified in 5.1, 5.2 and 5.4 shall be employed in
order to monitor and report particulate contamination levels.
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EN 16602-70-50:2015 (E)
Quantitative method requirements
5.1 Particles sampling from surfaces
5.1.1 Tape lift method
5.1.1.1 Introduction
This clause describes the tape-lift method to be used for the sampling of
surfaces for the purpose of the determining particulate contamination levels,
and the definition of the particle size distribution. In this case, the surface
particulate is analysed using a direct transfer method, whereby a transparent
adhesive tape is applied to the surface to be tested and the particles are
transferred from the sample surface to the adhesive tape. The particles
transferred to the tape are then analysed using an optical microscope.
An ASTM standard also exists, ASTM E 1216-06, Standard practice for sampling
for particulate contamination by tape-lift.
5.1.1.2 General requirements
a. Any counting of particles for the purpose of determining particulate
contamination levels using the tape lift method shall be performed in a
cleanliness controlled area.
b. Sensitive surfaces shall not be analysed using the tape lift method.
c. In the case where adhesive residue is removed from the surface subjected
to the tape-lift test, the potential damage that can be caused by the
cleaning of the surface shall be assessed prior to conducting the tape-lift
test.
d. If the sensitivity of the surface to be tested is not known, the tape lift
method shall not be used unless a trial tape-lift has been conducted on a
representative sample with the same surface and shows the surface not to
be a sensitive surface.
e. The application of force on contaminant particles, present on the surface,
during the performing of the tape-lift test shall not damage the sampled
surface.
f. In the case of surfaces described in 5.1.1.2b, a non-sensitive surface that
has been subject to the same environmental conditions and is
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EN 16602-70-50:2015 (E)
representative of the sensitive surface, shall be used in place of the
sensitive surface.
5.1.1.3 Apparatus
a. The following apparatus shall be used to perform a tape-lift analysis:
1. A low-tack, transparent adhesive tape with an adhesive force of
less than 0,3 N/mm.
2. A tape that is free of particles, voids, bubbles, and other artefacts
detrimental to the counting of particles.
3. A membrane filter with a pore size less than 1 µm, and a minimum
diameter of 5 cm, which provides contrast with the particulate
contaminants being analyzed.
NOTE The choice of the membrane filter depends
upon the nature of the particles being analysed
(e.g. a white membrane filter in the case of
black particles and a black membrane filter in
the case of white particles). Membrane filters
can have grids when statistical counting is
used.
4. A mask or gridded membrane filter to perform statistical counting
on squares of pre-defined area.
5. Non-shedding and lint-free gloves.
6. Tweezers.
7. Scissors or a scalpel.
8. A clean container for the transport of the tape-lift sample to the
measurement facility.
NOTE 1 A clean container is a container devoid of
particulate that could influence the
measurement of the tape-lift sample.
NOTE 2 The container can be sealed to prevent external
contamination from reaching the internal parts
of the container.
5.1.1.4 Tape-lift method
a. Application of the adhesive tape to the surface to be analysed shall be
performed as follows:
1. Remove with a velocity not exceeding 1 cm/s a minimum of 6 cm
to 10 cm of the low tack, transparent adhesive tape from the tape
roll.
NOTE The reason to remove the tape slowly from the
roll is to minimise static electricity.
2. For small surfaces (< 5 cm dimension), if a tape-lift measurement is
performed to determine the local particulate contaminant levels,
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SIST EN 16602-70-50:2015
EN 16602-70-50:2015 (E)
the dimensions of both the total surface and the surface analysed
are recorded in the measurement report.
3. Once removed from the roll, the tape is immediately applied to the
sample surface in one direction by the application of a force of less
than 0,1 N, using one gloved finger, or a folded lint-free tissue, to
smooth the tape on the sample surface.
b. The applied tape shall have uniform adhesion to the surface, i.e. free of
voids, bubbles and un-adhered areas.
c. If the tape, as applied on the sample surface, is not uniformly adhered, or
shows the presence of ripple or bubbles, it shall be rejected and a new
sample taken in a different location.
d. The removal of the adhesive tape from the surface to be analysed shall be
conducted as follows:
1. Approximately 5 cm of tape are removed from the surface being
analysed using a constant speed of less than 1 cm/s, at
approximately 45 degrees to the sample surface.
2. Sudden or uneven forces are not used.
e. The membrane filter shall be applied to the adhesive side of the tape
using tweezers.
f. The tape shall be uniformly adhered to the membrane filter surface and
shall be free of voids, bubbles or un-adhered areas.
NOTE The tape can be smoothed on the membrane
filter as per 5.1.1.4a.3.
g. The remainder of the tape shall be removed from the surface using a
constant speed of less than 1 cm/s.
h. Excess tape not attached to the membrane filter shall be removed using
scissors or a scalpel.
i. The membrane filter/tape assembly shall be placed into the tape-lift
sample holder and the sample holder lid closed.
j. The tape-lift sample holder shall be labelled with the time and date the
tape-lift was performed, the operator performing the test, and a unique
reference for the tape-lift test.
k. The area of the space craft system where the tape has been applied shall
be inspected for any damage, remaining particulate or molecular
contamination.
l. Any damage, particulate or molecular contamination shall be
documented in the Contamination Monitoring Report specified in Annex
m. Where remaining particulate contamination has been observed, the tape-
lift test shall be repeated.
n. The tape-lift sample shall be analysed by the microscope counting
method as specified in 5.3.
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EN 16602-70-50:2015 (E)
5.1.2 Direct deposition on silicon wafers
5.1.2.1 Introduction
This clause describes the deposition on silicon wafers method to be used for the
sampling of surfaces with the purpose of determining particulate

contamination levels, and defining the particle size distribution. In this case, the

surface particulate is analysed directly without any transfer method, i.e. the
particles collected on the silicon wafer are directly analysed
...

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