ISO/TS 25138:2019
(Main)Surface chemical analysis — Analysis of metal oxide films by glow-discharge optical-emission spectrometry
Surface chemical analysis — Analysis of metal oxide films by glow-discharge optical-emission spectrometry
This document describes a glow-discharge optical-emission spectrometric method for the determination of the thickness, mass per unit area and chemical composition of metal oxide films. This method is applicable to oxide films 1 nm to 10 000 nm thick on metals. The metallic elements of the oxide can include one or more from Fe, Cr, Ni, Cu, Ti, Si, Mo, Zn, Mg, Mn, Zr and Al. Other elements that can be determined by the method are O, C, N, H, P and S.
Analyse chimique des surfaces — Analyse de films d'oxyde de métal par spectrométrie d'émission optique à décharge luminescente
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Standards Content (Sample)
TECHNICAL ISO/TS
SPECIFICATION 25138
Second edition
2019-08
Surface chemical analysis — Analysis
of metal oxide films by glow-discharge
optical-emission spectrometry
Analyse chimique des surfaces — Analyse de films d'oxyde de métal
par spectrométrie d'émission optique à décharge luminescente
Reference number
ISO/TS 25138:2019(E)
©
ISO 2019
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ISO/TS 25138:2019(E)
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ii © ISO 2019 – All rights reserved
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ISO/TS 25138:2019(E)
Contents Page
Foreword .v
1 Scope . 1
2 Normative references . 1
3 Terms and definitions . 1
4 Principle . 2
5 Apparatus . 2
5.1 Glow-discharge optical-emission spectrometer . 2
5.1.1 General. 2
5.1.2 Selection of spectral lines . 2
5.1.3 Selection of glow-discharge source type . 3
6 Adjusting the glow-discharge spectrometer system settings . 4
6.1 General . 4
6.2 Setting the parameters of a DC source . 4
6.2.1 Constant applied current and voltage . 4
6.2.2 Constant applied current and pressure . 5
6.2.3 Constant voltage and pressure . 6
6.3 Setting the discharge parameters of an RF source . . 6
6.3.1 General. 6
6.3.2 Constant applied voltage and pressure . 6
6.3.3 Constant applied power and DC bias voltage . 7
6.3.4 Constant effective power and RF voltage .
...
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