ASTM E827-02

Standard Practice for Indentifying Elements by the Peaks in Auger Electron Spectroscopy

SIGNIFICANCE AND USE
Auger analysis is used to determine the elemental composition of the first few atomic layers, typically 0.5 to 2.0 nm thick, of a specimen surface. In conjunction with inert gas ion sputtering, it is used to determine the sputter depth profile to a depth of a few micrometres.
The specimen is normally a solid conductor, semiconductor, or insulator. For insulators, provisions may be required for control of charge accumulation at the surface (see Guide E 1523). Typical applications include the analysis of thin film deposits or segregated overlayers on metallic or alloy substrates. The specimen topography may vary from a smooth, polished specimen to a rough fracture surface.
Auger analysis of specimens with volatile species that evaporate in the ultra-high vacuum environment of the Auger chamber and substances which are susceptible to electron or X-ray beam damage, such as organic compounds, may require special techniques not covered herein. (See Guide E 983.)
SCOPE
1.1 This practice outlines the necessary steps for the identification of elements in a given Auger spectrum obtained using conventional electron spectrometers. Spectra displayed as either the electron energy distribution (direct spectrum) or the first derivative of the electron energy distribution are considered.
1.2 This practice applies to Auger spectra generated by electron or X-ray bombardment of the specimen surface and can be extended to spectra generated by other methods such as ion bombardment.
1.3 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use.

General Information

• Status: Historical
• Publication Date: 09-Apr-2002
• ICS: 71.040.50 - Physicochemical methods of analysis
• Technical Committee: E42 - Surface Analysis
• Drafting Committee: E42.03 - Auger Electron Spectroscopy and X-Ray Photoelectron Spectroscopy

Relations

• Replaces: ASTM E827-95 - Standard Practice for Indentifying Elements by the Peaks in Auger Electron Spectroscopy
• Effective Date: 10-Apr-2002
• Replaced By: ASTM E827-07 - Standard Practice for Identifying Elements by the Peaks in Auger Electron Spectroscopy
• Effective Date: 01-Oct-2007
• Referred By: ASTM E1127-08(2015) - Standard Guide for Depth Profiling in Auger Electron Spectroscopy
• Effective Date: 10-Apr-2002
• Referred By: ASTM E984-12(2020) - Standard Guide for Identifying Chemical Effects and Matrix Effects in Auger Electron Spectroscopy
• Effective Date: 10-Apr-2002

Standards Content (Sample)

NOTICE: This standard has either been superseded and replaced by a new version or withdrawn.
Contact ASTM International (www.astm.org) for the latest information
Designation:E827–02
Standard Practice for
Indentifying Elements by the Peaks in Auger Electron
1
Spectroscopy
This standard is issued under the fixed designation E827; the number immediately following the designation indicates the year of
original adoption or, in the case of revision, the year of last revision.Anumber in parentheses indicates the year of last reapproval.A
superscript epsilon (e) indicates an editorial change since the last revision or reapproval.
1. Scope mately30eVtoanupperkineticenergylimitofapproximately
2000 eV or higher to include all the principal Auger electron
1.1 This practice outlines the necessary steps for the iden-
energies of all elements (except H and He which do not have
tificationofelementsinagivenAugerspectrumobtainedusing
Auger transitions).
conventional electron spectrometers. Spectra displayed as ei-
4.2 This practice assumes the existence of appropriate
ther the electron energy distribution (direct spectrum) or the
reference spectra from pure element or stoichiometric com-
first derivative of the electron energy distribution are consid-
pound standards, or both, with which an unknown spectrum
ered.
3
canbecompared (1, 2). Itmaybeusefultonotethatalthough
1.2 This practice applies to Auger spectra generated by
Auger energies in some data bases are referenced to the Fermi
electron or X-ray bombardment of the specimen surface and
level, other data collections have been referenced to the
can be extended to spectra generated by other methods such as
vacuum level. Auger kinetic energies referenced to the Fermi
ion bombardment.
level would be approximately 5 eV larger than values refer-
1.3 This standard does not purport to address all of the
enced to the vacuum level.
safety concerns, if any, associated with its use. It is the
4.3 An element in an Auger spectrum is considered posi-
responsibility of the user of this standard to establish appro-
tively identified if the peak shapes, the peak energies, and the
priate safety and health practices and determine the applica-
relative signal strengths of peaks from the unknown coincide
bility of regulatory limitations prior to use.
with those from a standard reference spectrum of the element
2. Referenced Documents or compound.
2.1 ASTM Standards:
5. Significance and Use
2
E673 Terminology Relating to Surface Analysis
5.1 Auger analysis is used to determine the elemental
E983 Guide for Minimizing Unwanted Electron Beam
2 composition of the first few atomic layers, typically 0.5 to 2.0
Effects In Auger Electron Spectroscopy
nm thick, of a specimen surface. In conjunction with inert gas
E984 Guide for Identifying Chemical Effects and Matrix
2 ion sputtering, it is used to determine the sputter depth profile
Effects in Auger Electron Spectroscopy
to a depth of a few micrometres.
E1523 Guide to Charge Control and Charge Referencing
2 5.2 The specimen is normally a solid conductor, semicon-
Techniques in X-Ray Photoelectron Spectroscopy
ductor, or insulator. For insulators, provisions may be required
3. Terminology for control of charge accumulation at the surface (see Guide
E1523). Typical applications include the analysis of thin film
3.1 Terms used in Auger electron spectroscopy are defined
deposits or segregated overlayers on metallic or alloy sub-
in Terminology E673.
strates. The specimen topography may vary from a smooth,
4. Summary of Practice
polished specimen to a rough fracture surface.
5.3 Auger analysis of specimens with volatile species that
4.1 TheAugerspectrumisobtainedwithappropriateinstru-
evaporate in the ultra-high vacuum environment of the Auger
mental parameters from a low kinetic energy limit of approxi-
chamber and substances which are susceptible to electron or
X-ray beam damage, such as organic compounds, may require
1
This practice is under the jurisdiction of ASTM Committee E42 on Surface
special techniques not covered herein. (See Guide E983.)
AnalysisandisthedirectresponsibilityofSubcommitteeE42.03onAugerElectron
Spectroscopy and XPS.
Current edition approved April 10, 2002. Published April 2002. Originally
3
published as E827–81. Last previous edition E827–95. Theboldfacenumbersinparenthesesrefertothelistofreferencesattheendof
2
Annual Book of ASTM Standards, Vol 03.06. this standard.
Copyright © ASTM International, 100 Barr Harbor Drive, PO Box C700, West Conshohocken, PA 19428-2959, United States.
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E827
6. Apparatus kineticenergyoftheAugerelectronsdoesnotchangewhenthe
energy of the incident X-rays is changed. This may allow the
6.1 Electron Energy Analyzers, a retarding field analyzer,
Auger peaks to be distinguished from the photoelectron peaks.
cylindrical mirror analyzer (single or double pass), or hemi-
7.9 Auger features generated by incident ions may have
spherical analyzer is typically used
...