June 2026: New Standards Advance Industrial Networking and ALD Processes

In June 2026, two pivotal international standards were published, setting new benchmarks for quality, safety, and operational performance within the field of manufacturing engineering. These updates, comprising Part 4 of this month’s standards coverage, address high-stakes industrial communications for automation systems and chemical requirements for atomic layer deposition processes. Both standards aim to streamline best practices, minimize operational risks, and empower manufacturers to innovate more reliably.

Overview / Introduction

Manufacturing engineering is a dynamic sector that thrives on precision, safety, and efficiency—values that are increasingly underpinned by robust international standards. With industrial networks forming the backbone of smart factories, and atomic layer deposition (ALD) technology supporting breakthroughs in semiconductors and nanotechnology, evolving standards directly shape both productivity and product quality. This article unpacks two newly published standards: IEC PAS 63693:2026 for industrial networking (WiTSnet fieldbus specification) and ISO 19383:2026 for ALD precursor chemical/process requirements. Industry professionals seeking clarity on these changes will find detailed explanations, compliance guidance, and practical industry impact analysis inside.

Detailed Standards Coverage

IEC PAS 63693:2026 - Industrial Networks—Fieldbus Specifications—WiTSnet

Industrial Networks—Fieldbus Specifications—WiTSnet

This new IEC Publicly Available Specification establishes essential requirements for the next generation of industrial automation communication networks. Targeting “time-critical” messaging, the WiTSnet fieldbus specification standardizes the structure, services, and behavior required for safe, reliable, and deterministic device communications within industrial environments. WiTSnet is engineered to support stringent timing constraints, ensuring that commands and data exchanges between devices and user programs occur within narrowly defined time windows—a vital feature for protecting equipment and personnel in highly automated plants.

Scope and Key Provisions

• Abstract Service Models: The standard details a comprehensive model for defining, manipulating, and sequencing application resources (objects) across the fieldbus, including the primitives (basic operations and events) available to users.
• Protocol Behavior: WiTSnet’s protocol specifications define the visible behavior of both data-link and application layers, specifying abstract and transfer syntax, encoding rules, and the operational states and transitions necessary for reliable message delivery.
• Layer Boundaries and Interface Definitions: The document provides granular definitions for service interfaces between the application, data-link, systems management, and user environments in the Fieldbus Reference Model.
• Implementation Requirements: Manufacturers and system integrators are guided in how to represent service primitives (message structures) on the wire and ensure protocol compliance during device communications.

Who Should Comply?

This standard is vital for equipment manufacturers, systems integrators, and automation solution providers designing or maintaining modern industrial networks—particularly where time-sensitive control, data integrity, and deterministic operation are non-negotiable. Sectors include discrete and process automation, energy, life sciences, logistics, and critical infrastructure.

Practical Implications

• Upgrading networks to WiTSnet-compliance will enhance predictable, traceable device interactions and system-wide operational safety.
• Adopting the standard can reduce integration times, lower long-term maintenance risks, and bolster readiness for smart factory initiatives (Industry 4.0).

Notable Changes (for users of prior fieldbus specs)

• Formalization of timing controls and deterministic state machines
• Enhanced error detection/recovery mechanisms
• Detailed encoding and frame structure for Ethernet and UDP-based industrial communications

Key highlights:

• Abstract protocol and service models for robust, time-critical messaging
• Comprehensive encoding, state machine, and interface definitions for fieldbus systems
• Supports integration of highly reliable, real-time industrial communication architectures

Access the full standard:View IEC PAS 63693:2026 on iTeh Standards

ISO 19383:2026 - Atomic Layer Deposition—Chemical Characteristics and Related Process Specifications

Atomic Layer Deposition — Chemical Characteristics and Related Process Specifications of Atomic Layer Deposition Precursors

ISO 19383:2026 lays the groundwork for uniform quality and process control in atomic layer deposition (ALD) technologies, a core technique in modern electronics, nanotechnology, photovoltaics, and advanced manufacturing. The standard defines chemical and purity requirements for ALD precursors—the specialized chemicals crucial to producing ultra-thin, high-performance films.

Scope and Key Provisions

• Classification of ALD Precursors: Systematic categorization of both metal and non-metal precursors (e.g., metal halides, hydrides, alkoxides, amidinates, silicon, boron, phosphorus compounds), based on application and chemical nature.
• Chemical Purity and Testing: Defines minimum purity standards, including:
  • Assay content: The fraction of target component (measured via GC, NMR, TGA, HPLC)
  • Metal purity: Weight percent of metal content minus impurities
  • Anion content: Percentage of negatively charged ions by weight
• Process and Testing Methods: Specifies recommended methods for each class of precursor and correlates purity levels directly with ALD film growth rate and uniformity (see informative annexes on growth rate and film uniformity).

Who Should Comply?

Manufacturers and suppliers of ALD precursors, as well as R&D labs and end-users in electronics manufacturing, semiconductor fabrication, photovoltaics, flexible electronics, MEMS, and catalysis, will benefit from the clarity and harmonization provided by this international specification.

Practical Implications

• Enables consistent sourcing and quality assurance for critical ALD chemicals
• Ensures repeatable film properties (e.g., uniformity, electrical performance)
• Facilitates process innovation, regulatory compliance, and risk management in competitive global markets

Notable Changes (for industry first adopters)

• Establishment of unified metrics and methodologies for purity and process testing across global suppliers
• Guidance tailored for both metal-organic and non-metal precursor handling
• Direct linkage between chemical quality and operational process results

Key highlights:

• Standardized chemical purity and performance criteria for ALD precursor materials
• Comprehensive classification and illustrative examples of both metal and non-metal precursors
• Quantitative and qualitative testing protocols for the ALD industry supply chain

Access the full standard:View ISO 19383:2026 on iTeh Standards

Industry Impact & Compliance

The publication of these two standards arrives at a critical juncture as manufacturing becomes ever more dependent on integrated digital networks and ultrapure process inputs. Here’s what businesses and professionals should keep in mind:

• Enhanced Reliability & Efficiency: Both standards drive up system dependability—WiTSnet by enabling precision automation, and ISO 19383 by ensuring ALD product consistency and material performance.
• Mandatory Compliance for Key Sectors: Industrial automation and high-tech material producers should immediately review these requirements, as non-compliance can result in quality shortfalls, regulatory infractions, or even workplace safety risks.
• Timelines: While immediate compliance is not always mandated, early adoption is a best practice—especially for OEM integrators, quality managers, and chemical suppliers serving tier-one manufacturing clients.
• Competitive Advantage: Early compliance enables smoother integration of new equipment, faster customer approval cycles, and a stronger reputation for quality and consistency.
• Risk of Non-Compliance: Failure to conform can lead to network failures, product rejection, liability, and a tarnished industry standing.

Technical Insights

Common Technical Requirements

• Data Integrity: Each standard emphasizes traceability, accurate data representation, and reliable state transitions—principles at the heart of modern industrial management.
• Rigorous Testing & Certification: Adhering to the defined test methodologies (e.g., NMR, TGA for ALD, protocol conformity for WiTSnet) is crucial. Independent laboratory verification and digital compliance records streamline audit readiness.
• Best Practice Implementation
  1. Conduct a gap analysis to assess current processes and networks against new standard requirements.
  2. Update procurement specifications to ensure purchased equipment and chemicals are compliant.
  3. Provide staff training on new fieldbus protocol requirements (WiTSnet) and ALD precursor handling and certification procedures.
  4. Invest in smart diagnostics for industrial networks and high-precision analytics in ALD process monitoring.
• Certification Considerations: Both standards foresee external or internal conformity assessment. However, the sector’s leaders will invest in third-party certification to guarantee global acceptance and customer trust.

Conclusion / Next Steps

The June 2026 release of IEC PAS 63693:2026 and ISO 19383:2026 demonstrates a clear trend: manufacturing engineering is converging on tighter, globally harmonized standards that underpin safe automation and advanced materials innovation.

Key takeaways:

• WiTSnet redefines robust, deterministic communication in safety- and time-critical automation settings.
• ALD precursor standardization enables predictable, high-quality thin film production across the high-tech, semiconductor, and nanotech industries.

Recommendations for Organizations

• Proactively review and integrate the new requirements into your processes and supplier mandates.
• Engage with cross-functional teams—engineering, quality control, procurement, and compliance—to accelerate adoption.
• Monitor updates from iTeh Standards and related international bodies for further developments.

Stay ahead: explore these new standards in detail and power your operations with world-class compliance.