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ASTM E3034-15

(Guide)

Standard Guide for Workforce Education in Nanotechnology Pattern Generation

Standard Guide for Workforce Education in Nanotechnology Pattern Generation

SIGNIFICANCE AND USE
5.1 The purpose of this guide is to provide a basic educational structure for pattern generation in nanotechnology to organizations developing or carrying out education programs for the nanotechnology workforce. This guide helps to describe the minimum knowledge base for anyone involved in nanomanufacturing or nanomaterials research.  
5.2 The basic education should prepare an individual for varied roles in the nanotechnology workplace. The material in this standard may require a post-secondary two-year science or technology background to be understood sufficiently. Depth on the topics should be sufficient to transfer between various applications of nanotechnology such as nanomaterial fabrication, nanomaterial characterization, nanolithography, and patterning.  
5.3 Workers may transition in their roles in the workplace. Participants in such education will have a broad understanding of a complement of pattern generation methods, thus increasing their marketability for jobs within as well as beyond the nanotechnology field.  
5.4 This guide is intended to be one in a series of standards developed for workforce education in various aspects of nanotechnology. It will assist in providing an organization a basic structure for developing a program applicable to many areas in nanotechnology, thus providing dynamic and evolving workforce education.
SCOPE
1.1 This guide provides a framework for a basic workforce education in pattern generation topics related to nanotechnology, to be taught at an undergraduate college level. The education should be broadbased, preparing an individual to work in one of many areas in naotechnology research, development, or manufacturing. The individual so educated may be involved in nanoscale pattern definition.  
1.2 This guide may be used to develop or evaluate an education program for pattern generation topics in the nanotechnology field. This guide provides listings of key topics that should be covered in a nanotechnology education program on this subject, but it does not provide specific course material to be used in such a program. This approach is taken in order to allow workforce education entities to ensure their programs cover the required material while also enabling these institutions to tailor their programs to meet the needs of their local employers.  
1.3 While no units of measurements are used in this standard guide, values stated in SI units are to be regarded as standard.  
1.4 This standard does not purport to address all of the methods and concepts needed for pattern generation in nanotechnology. It may not cover knowledge and skill objectives applicable to local conditions or required by local regulations.  
1.5 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use.

General Information

Status
Historical
Publication Date
14-Oct-2015
ICS
07.120 - Nanotechnologies
Technical Committee
E56 - Nanotechnology
Drafting Committee
E56.07 - Education and Workforce Development
Current Stage
Ref Project

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ASTM E3034-15 - Standard Guide for Workforce Education in Nanotechnology Pattern Generation
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NOTICE: This standard has either been superseded and replaced by a new version or withdrawn.
Contact ASTM International (www.astm.org) for the latest information
Designation: E3034 − 15
Standard Guide for
Workforce Education in Nanotechnology Pattern
1
Generation
This standard is issued under the fixed designation E3034; the number immediately following the designation indicates the year of
original adoption or, in the case of revision, the year of last revision. A number in parentheses indicates the year of last reapproval. A
superscript epsilon (´) indicates an editorial change since the last revision or reapproval.
1. Scope 2. Referenced Documents
2
2.1 ASTM Standards:
1.1 This guide provides a framework for a basic workforce
E2456 Terminology Relating to Nanotechnology
education in pattern generation topics related to
E2996 Guide for Workforce Education in Nanotechnology
nanotechnology, to be taught at an undergraduate college level.
Health and Safety
The education should be broadbased, preparing an individual
E3001 Practice for Workforce Education in Nanotechnology
to work in one of many areas in naotechnology research,
Characterization
development, or manufacturing. The individual so educated
3
2.2 ISO Standards:
may be involved in nanoscale pattern definition.
ISO/TS 80004-2 Nanotechnologies – Vocabulary—Part 2:
1.2 This guide may be used to develop or evaluate an Nano-Objects
education program for pattern generation topics in the nano- ISO/TS 80004-8 Nanotechnologies – Vocabulary—Part 8:
Nanomanufacturing Processes
technology field.This guide provides listings of key topics that
should be covered in a nanotechnology education program on
3. Terminology
this subject, but it does not provide specific course material to
3.1 Definitions:
be used in such a program. This approach is taken in order to
allow workforce education entities to ensure their programs 3.1.1 For definitions of terms related to nanotechnology in
general, refer to Terminology E2456 and ISO/TS 80004-2.
cover the required material while also enabling these institu-
3.1.2 For definitions of terms related to nanotechnology
tions to tailor their programs to meet the needs of their local
pattern generation in general, refer to ISO/TS 80004-8.
employers.
3.2 Definitions of Terms Specific to This Standard:
1.3 While no units of measurements are used in this
3.2.1 education, n—the teaching of specific topics as part of
standard guide, values stated in SI units are to be regarded as
a degree or certificate program, or as training to provide
standard.
additional skills and knowledge.
1.4 This standard does not purport to address all of the
3.2.2 pattern, n—a design or a layout for fabricated struc-
methods and concepts needed for pattern generation in nano-
tures.
technology. It may not cover knowledge and skill objectives
3.2.3 pattern generation, n—the technique(s) to create and
applicable to local conditions or required by local regulations.
transferapatternontoamediumasappliedinfabricationatthe
1.5 This standard does not purport to address all of the
micro- or nanoscale; for example, photolithography is an
safety concerns, if any, associated with its use. It is the
optical technique used in chip manufacturing for generating a
responsibility of the user of this standard to establish appro-
pattern on a substrate.
priate safety and health practices and determine the applica-
bility of regulatory limitations prior to use. 4. Summary of Guide
4.1 This guide designates a list of six topics on pattern
generation relevant to nanotechnology workforce education.
2
For referenced ASTM standards, visit the ASTM website, www.astm.org, or
contact ASTM Customer Service at service@astm.org. For Annual Book of ASTM
1
This guide is under the jurisdiction of ASTM Committee E56 on Nanotech- Standards volume information, refer to the standard’s Document Summary page on
nology and is the direct responsibility of Subcommittee E56.07 on Education and the ASTM website.
3
Workforce Development. Available from International Organization for Standardization (ISO), ISO
Current edition approved Oct. 15, 2015. Published November 2015. DOI: Central Secretariat, BIBC II, Chemin de Blandonnet 8, CP 401, 1214 Vernier,
10.1520/E3034-15. Geneva, Switzerland, http://www.iso.org.
Copyright © ASTM International, 100 Barr Harbor Drive, PO Box C700, West Conshohocken, PA 19428-2959. United States
1

---------------------- Page: 1 ----------------------
E3034 − 15
Selection of the techniques, concepts, and materials are based 7. Concepts and Skills to be Covered
on inputs from industry, nanotechnology educators and subject
7.1 Relevant methods for workforce education in nanotech-
matter experts.
nology pattern generation are listed in Section 8, with specific
4.2 In this list, the first topic (8.1) pertains to the design of important topics to be covered for each method. Additional
the patterns. The following five topics cover various lithogra- methods or topics, or both, may be added on an a
...

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SIGNIFICANCE AND USE
5.1 The purpose of this guide is to provide, at the undergraduate college level, a basic educational structure in the infrastructure aspects of nanotechnology to organizations developing or carrying out education programs for the nanotechnology workforce. This guide helps to describe the minimum knowledge base for anyone involved in nanomanufacturing or nanomaterials research.  
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SCOPE
1.1 This document provides guidelines for basic workforce education in the infrastructure topics related to nanotechnology to be taught at an undergraduate college level. This education should be broad to prepare an individual to work within one of the many areas in nanotechnology research, development, or manufacturing. The individual so educated may be involved in material handling, manufacture, distribution, storage, use, or disposal of nanoscale materials.  
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5.1 This guide establishes, at the undergraduate college level, the basic education structure for understanding the unique properties and applications of nanoscale materials as compared to bulk properties and applications of macroscale materials. It helps to describe the minimum knowledge base for anyone involved in nanomanufacturing or nanomaterials research and can be used by organizations developing or carrying out education programs for the nanotechnology workforce.  
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ASTM
ASTM E3324-22(Test Method)
Standard Test Method for Lipid Quantitation in Liposomal Formulations Using Ultra-High-Performance Liquid Chromatography (UHPLC) with Triple Quadrupole Mass Spectrometry (TQMS)

SIGNIFICANCE AND USE
5.1 Liposomes are vesicles of nanoscale dimensions, composed of lipid bilayers, which are used for various diagnostic and therapeutic applications (9). The growing interest in liposomal formulations in the delivery of various drugs, antisense oligonucleotides, cloned genes, or recombinant proteins by the biopharmaceutical industry, warrants QC and thorough characterization of the constituent lipids. Lipid structure, composition, and concentration are key attributes in determining the quality and efficacy of a liposomal drug product as they influence the stability of liposomes, drug loading, release kinetics, biodistribution, and pharmacokinetic properties (9). Cholesterol modulates the lipid membrane fluidity, elasticity, and permeability; hence, it plays a key role in controlled drug release and increased stability of the liposome (10).  
5.2 This test method provides a rapid and reliable protocol for the determination of cholesterol, DSPE-PEG 2000, and HSPC in liposomal formulations using UHPLC-TQMS. Assessment of the stability of the analytes in terms of their degradation profiles is not included in this test method (11). This test method will benefit the biopharmaceutical industry in ascertaining quality assessment of liposomal formulations and monitoring batch-to-batch consistency for large-scale production, thereby facilitating safe and efficient drug development and regulatory review.  
5.3 UHPLC-MS/MS measurements are analytically more sensitive and specific for lipid analysis compared to other contemporary techniques using universal detectors, such as a charged aerosol or an evaporative light-scattering detector. For liposomes, MS/MS has further advantages over ultraviolet detectors, as lipids lack chromophores for detection. In this test method, TQMS has been used as the MS/MS technique of choice because of its high selectivity, sensitivity, S/N, accuracy, and broad linear range of quantitation, thereby allowing reproducible quantitation of the analytes,...
SCOPE
1.1 This test method describes the determination of lipid components in liposomal formulations, which includes sample solubilization in methanol followed by separation of the analytes using ultra-high-performance liquid chromatography (UHPLC) and detection with tandem mass-spectrometry (MS/MS). This test method adheres to multiple reaction monitoring (MRM) mass spectrometry on a triple quadrupole mass spectrometer (TQMS).  
1.2 This test method is specific for liposomal formulations containing cholesterol, 1,2- distearoyl-sn-glycero-3-phosphoethanolamine-N-[methoxy (polyethylene glycol)-2000] (DSPE- PEG 2000), and hydrogenated (soy) L-α-phosphatidylcholine (HSPC).  
1.3 This test method is applicable to report the absolute concentrations of cholesterol, DSPE-PEG 2000, and HSPC and their ratio (DSPE-PEG 2000: HSPC: cholesterol) in liposomal formulations. Assessment of the stability of the analytes in terms of their degradation as a result of oxidation or hydrolysis is beyond the scope of this test method.  
1.4 This test method includes calibration and standardization, sample preparation, UHPLC-TQMS instrumentation, potential interferences, method validation with acceptance criteria, sample analysis, and data reporting.  
1.5 The detection limits for cholesterol, DSPE-PEG 2000, and HSPC using this test method are 5.3, 0.5, and 0.5 ng/g, respectively. In addition, the quantitation limits for cholesterol, DSPE-PEG 2000, and HSPC are 10.6, 0.8, and 0.5 ng/g, respectively.  
1.6 This test method is intended for concentration ranges of 8-1600 ng/g for cholesterol, and of 2-400 ng/g for DSPE-PEG 2000 and HSPC.  
1.7 All observed and calculated values shall conform to the guidelines for significant digits and rounding as established in Practice D6026.  
1.8 Units—The values stated in SI units are to be regarded as the standard. Where appropriate, c.g.s units in addition to SI units are included in this standard.  
1.9 Th...

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