ISO 11505:2025
(Main)Surface chemical analysis — General procedures for quantitative compositional depth profiling by glow discharge optical emission spectrometry
Surface chemical analysis — General procedures for quantitative compositional depth profiling by glow discharge optical emission spectrometry
This document specifies a glow discharge optical emission spectrometric (GD-OES) method for the determination of the thickness, mass per unit area and chemical composition of surface layer films. The applicability of this document is limited to description of general procedures for quantification of the chemical composition and thickness in GD-OES compositional depth profiling. This document is not directly applicable for quantification of individual materials having various thicknesses and elements to be determined.
Analyse chimique des surfaces — Modes opératoires généraux pour le profilage en profondeur compositionnel quantitatif par spectrométrie d'émission optique à décharge luminescente
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Standards Content (Sample)
International
Standard
ISO 11505
Second edition
Surface chemical analysis —
2025-06
General procedures for quantitative
compositional depth profiling by
glow discharge optical emission
spectrometry
Analyse chimique des surfaces — Modes opératoires généraux
pour le profilage en profondeur compositionnel quantitatif par
spectrométrie d'émission optique à décharge luminescente
Reference number
© ISO 2025
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ii
Contents Page
Foreword .v
1 Scope . 1
2 Normative references . 1
3 Terms and definitions . 1
4 Principle . 1
5 Apparatus . 2
5.1 Glow discharge optical emission spectrometer .2
5.1.1 General .2
5.1.2 Selection of spectral lines.2
5.1.3 Selection of glow discharge source type .2
6 Adjusting the glow discharge spectrometer system settings . 3
6.1 General .3
6.2 Setting the discharge parameters of a DC source .4
6.2.1 Constant applied current and voltage .4
6.2.2 Constant applied current and pressure .5
6.2.3 Constant applied voltage and pressure .5
6.3 Setting the discharge parameters of an RF source .6
6.3.1 Constant applied power and pressure .6
6.3.2 Constant applied power and DC bias voltage .6
6.3.3 Constant effective power and RF voltage.7
6.4 Minimum performance requirements .7
6.4.1 General .7
6.4.2 Control of lamp cleanliness and start-up performance .7
6.4.3 Minimum repeatabilitry .9
6.4.4 Detection limit .9
7 Sampling .11
8 Calibration .11
8.1 General .11
8.2 Calibration specimens.11
8.2.1 General .11
8.2.2 Low-alloy iron or steel specimens . 12
8.2.3 Stainless-steel specimens. 12
8.2.4 High-oxygen specimens . 12
8.2.5 High-carbon specimens . 12
8.2.6 High-nitrogen specimens . 12
8.2.7 High-purity copper specimens. 12
8.2.8 High-purity zinc specimens . 13
8.3 Validation specimens . 13
8.4 Determination of the sputtering rate of calibration and validation specimens. 13
8.5 Emission intensity measurements of calibration specimens .14
8.6 Calculation of calibration formulae .14
8.7 Validation of the calibration .14
8.7.1 General .14
8.7.2 Checking analytical accuracy using bulk reference materials . 15
8.7.3 Checking analytical accuracy using surface layer reference materials . 15
8.8 Verification and drift correction . 15
9 Analysis of test specimens . .16
9.1 Adjusting discharge parameters .16
9.2 Setting of measuring time and data acquisition rate .16
9.3 Quantifying depth profiles of test specimens .16
10 Expression of results . 16
iii
10.1 Expression of quantitative depth profile .16
10.2 Determination of total coating mass per unit area .17
10.3 Determination of average mass fractions .18
11 Precision .18
12 Test report .18
Annex A (normative) Calculation of calibration constants and quantitative evaluation of depth
profiles. 19
Annex B (informative) Suggested spectral lines for determination of given elements .32
Bibliography .34
iv
Foreword
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This document was prepared by Technical Committee ISO/TC 2
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