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ASTM E2530-06

(Practice)

Standard Practice for Calibrating the Z-Magnification of an Atomic Force Microscope at Subnanometer Displacement Levels Using Si(111) Monatomic Steps (Withdrawn 2015)

Standard Practice for Calibrating the Z-Magnification of an Atomic Force Microscope at Subnanometer Displacement Levels Using Si(111) Monatomic Steps (Withdrawn 2015)

SIGNIFICANCE AND USE
Careful use of this practice can yield calibrated z-magnifications traceable to the SI unit of length with uncertainties (k = 2) of approximately 7 % over height ranges of approximately 1 nm.
SCOPE
1.1 This practice covers a measurement procedure to calibrate the z-scale of an atomic force microscope using Si(111) monatomic step height specimens.
1.2 Applications This procedure is applicable either in ambient or vacuum condition when the atomic force microscope (AFM) is operated at its highest levels of z-magnification, that is, in the nanometer and sub-nanometer ranges of z-displacement. These ranges of measurement are required when the AFM is used to measure the surfaces of semiconductors, optical surfaces, and other high technology components.
1.3 The values stated in SI units are to be regarded as the standard. The values given in parentheses are for information only.
1.4 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use.
WITHDRAWN RATIONALE
This practice covers a measurement procedure to calibrate the z-scale of an atomic force microscope using Si(111) monatomic step height specimens.
Formerly under the jurisdiction of Committee E42 on Surface Analysis, this practice was withdrawn in January 2015 in accordance with Section 10.6.3 of the Regulations Governing ASTM Technical Committees, which requires that standards shall be updated by the end of the eighth year since the last approval date.

General Information

Status
Withdrawn
Publication Date
31-Oct-2006
Withdrawal Date
14-Jan-2015
ICS
19.020 - Test conditions and procedures in general
71.040.50 - Physicochemical methods of analysis
Technical Committee
E42 - Surface Analysis
Drafting Committee
E42.14 - STM/AFM
Current Stage
Ref Project

Relations

Referred By
ASTM E2244-11(2018) - Standard Test Method for In-Plane Length Measurements of Thin, Reflecting Films Using an Optical Interferometer
Effective Date
01-Nov-2006
Referred By
ASTM E3220-20 - Standard Guide for Characterization of Graphene Flakes
Effective Date
01-Nov-2006
Referred By
ASTM E2859-11(2023) - Standard Guide for Size Measurement of Nanoparticles Using Atomic Force Microscopy
Effective Date
01-Nov-2006
Referred By
ASTM E2245-11(2018) - Standard Test Method for Residual Strain Measurements of Thin, Reflecting Films Using an Optical Interferometer
Effective Date
01-Nov-2006
Referred By
ASTM E2246-11(2018) - Standard Test Method for Strain Gradient Measurements of Thin, Reflecting Films Using an Optical Interferometer
Effective Date
01-Nov-2006

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ASTM E2530-06 - Standard Practice for Calibrating the Z-Magnification of an Atomic Force Microscope at Subnanometer Displacement Levels Using Si(111) Monatomic Steps (Withdrawn 2015)ASTM E2530-06 - Standard Practice for Calibrating the Z-Magnification of an Atomic Force Microscope at Subnanometer Displacement Levels Using Si(111) Monatomic Steps (Withdrawn 2015)
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ASTM E2530-06 - Standard Practice for Calibrating the Z-Magnification of an Atomic Force Microscope at Subnanometer Displacement Levels Using Si(111) Monatomic Steps (Withdrawn 2015)
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Standards Content (Sample)

NOTICE: This standard has either been superseded and replaced by a new version or withdrawn.
Contact ASTM International (www.astm.org) for the latest information
Designation:E2530 −06
StandardPractice for
Calibrating the Z-Magnification of an Atomic Force
Microscope at Subnanometer Displacement Levels Using
1
Si(111) Monatomic Steps
This standard is issued under the fixed designation E2530; the number immediately following the designation indicates the year of
original adoption or, in the case of revision, the year of last revision. A number in parentheses indicates the year of last reapproval. A
superscript epsilon (´) indicates an editorial change since the last revision or reapproval.
1. Scope GUM: 1993 Guide to the Expression of Uncertainty in
Measurement
1.1 This practice covers a measurement procedure to cali-
brate the z-scale of an atomic force microscope using Si(111)
3. Terminology
monatomic step height specimens.
3.1 Definitions of Terms Specific to This Standard:
1.2 Applications—This procedure is applicable either in
3.1.1 Atomic force microscope (AFM), n—surface topogra-
ambient or vacuum condition when the atomic force micro-
phy measurement method whereby the surface height is sensed
scope (AFM) is operated at its highest levels of
from the mechanical force of attraction or repulsion between a
z-magnification, that is, in the nanometer and sub-nanometer
probe tip and a surface.
ranges of z-displacement. These ranges of measurement are
3.1.2 Coordinate axes, n—coordinate system in which sur-
required when the AFM is used to measure the surfaces of
face topographic measurements are performed.
semiconductors, optical surfaces, and other high technology
3.1.2.1 Discussion—It is usual to use a rectangular coordi-
components.
nate system in which the axes form a right Cartesian set, the
1.3 The values stated in SI units are to be regarded as
x-axis being the direction of tracing colinear with the mean
standard. The values given in parentheses are mathematical
line,the y-axisalsonominallylyingontherealsurface,andthe
conversions to inch-pound units that are provided for informa-
z-axis being in an outward direction (from the material to the
tion only and are not considered standard.
surrounding medium).
1.4 This standard does not purport to address all of the
3.1.3 Si(111), n—single crystal surface of silicon, oriented
safety concerns, if any, associated with its use. It is the
near the (111) crystal plane and perhaps with either a grown
responsibility of the user of this standard to establish appro-
oxide overlayer or native oxide layer, which, when prepared
priate safety and health practices and determine the applica-
appropriately, contains a large number of separated monatomic
bility of regulatory limitations prior to use.
steps and atomically smooth terraces between them.
3.1.4 x-y displacement stage, n—mechanical means used to
2. Referenced Documents
moveaprobewithrespecttoasurface(orviceversa)alongthe
2
2.1 ISO Standards:
two coordinate axes in the plane of the surface.
ISODraftInternationalStandard25178-2 GeometricalProd-
3.1.5 z-magnification (alternatively, z-sensitivity or z-scale),
ucts Specification (GPS)---Surface Texture: Areal----Part
n—term that describes the sensitivity of the output of a surface
2: Terms, Definitions and Surface Texture Parameters.
profiling instrument to displacements in the z-direction.
ISO Committee Draft 25178-6 Geometrical Products Speci-
fication (GPS)---Surface Texture: areal----Part 6: Classifi-
4. Significance and Use
cation of methods for measuring surface texture.
4.1 Careful use of this practice can yield calibrated
ISO/TS 21748: 2004 Guidance for the Use of Repeatability,
z-magnifications traceable to the SI unit of length with uncer-
Reproducibility and Trueness Estimates in Measurement
tainties (k = 2) of approximately 7 % over height ranges of
Uncertainty Estimation
approximately 1 nm.
5. Calibration Specimen
1
This test method is under the jurisdiction ofASTM Committee E42 on Surface
Analysis and is the direct responsibility of Subcommittee E42.14 on STM/AFM.
5.1 The physical step height specimen is the vicinal Si(111)
Current edition approved Nov. 1, 2006. Published November 2006. DOI:
surface (see Fig. 1), defined in 3.1.3, containing numerous
10.1520/E2530-06.
2
monatomic steps, having on average a calibrated step height
Available from International Organization for Standardization (ISO), 1 rue de
Varembé, Case postale 56, CH-1211, Geneva 20, Switzerland, http://www.iso.ch. value. The calibrated value has been traditionally assigned to
Copyright © ASTM International, 100 Barr Harbor Drive, PO Box C700, West Conshohocken, PA 19428-2959. United States
1

---------------------- Page: 1 ----------------------
E2530−06
FIG. 1Image of a Silicon Monatomic Stepped Surface
be 314 pm based on X-ray value of lattice parameter of bulk 7.4 Measure an area containing about five or six terraces
3
silicon (1). However, recent analysis (2-7), also taking into and monatomi
...

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