ASTM F1367-98(2003)

Standard Specification for Chromium Sputtering Targets for Thin Film Applications

ABSTRACT
This specification covers sputtering targets fabricated from chromium metal for use in thin film applications. The grades of chromium covered in this specification, are based on the total metallic impurity content of the metallic elements, and are classified as 4N, 3N7, 3N5, 3N, and 2N8. Materials shall be tested using analytical methods such as combustion/infrared spectrometry, thermal conductivity, atomic absorption spectrometry, direct current plasma, inductively coupled plasma, and spark source mass spectroscopy or glow discharge mass spectroscopy; and the individual grades shall conform to specified values of chemical composition, density, grain size.
SCOPE
1.1 This specification covers sputtering targets fabricated from chromium metal.
1.2 This specification sets purity grade levels, physical attributes, analytical methods and packaging requirements.
1.3 The values stated in SI units are regarded as standard.

General Information

• Status: Historical
• Publication Date: 09-Aug-1998
• ICS: 25.220.40 - Metallic coatings
• Technical Committee: F01 - Electronics
• Drafting Committee: F01.17 - Sputter Metallization

Relations

• Replaces: ASTM F1367-98 - Standard Specification for Chromium Sputtering Targets for Thin Film Applications
• Effective Date: 10-Aug-1998
• Replaced By: ASTM F1367-98(2011) - Standard Specification for Chromium Sputtering Targets for Thin Film Applications (Withdrawn 2020)
• Effective Date: 01-Jun-2011

Standards Content (Sample)

NOTICE: This standard has either been superseded and replaced by a new version or withdrawn.
Contact ASTM International (www.astm.org) for the latest information
Designation: F1367 – 98 (Reapproved 2003)
Standard Specification for
Chromium Sputtering Targets for Thin Film Applications
This standard is issued under the fixed designation F1367; the number immediately following the designation indicates the year of
original adoption or, in the case of revision, the year of last revision. A number in parentheses indicates the year of last reapproval. A
superscript epsilon (´) indicates an editorial change since the last revision or reapproval.
A
TABLE 1 Chromium Grades
1. Scope
Metallic Impurity Level by
1.1 This specification covers sputtering targets fabricated
Grade Implied Purity, %
Weight, ppm, max
from chromium metal.
4N 99.99 100
1.2 This specification sets purity grade levels, physical
3N7 99.97 300
attributes, analytical methods and packaging requirements.
3N5 99.95 500
3N 99.9 1000
1.3 The values stated in SI units are regarded as standard.
2N8 99.8 2000
A
2. Referenced Documents Additional grades may be designated by following the same pattern. That is,
examine the purity expressed in weight percent. Count the leading, “9’s” and set
2.1 ASTM Standards:
this number as “n”. Then note the first following digit, if present, (rounded if
necessary) and call this numeral “x”. The grade is expressed as “nNx”.
E112 Test Methods for Determining Average Grain Size
3. Terminology
6. Chemical Composition
3.1 Definitions of Terms Specific to This Standard:
6.1 The metallic elements listed in Table 2 shall be assayed
3.1.1 raw material lot—original material lot from which a
and reported.
number of targets is fabricated.
6.2 Gaseous elements to be assayed and reported are C, O,
3.1.2 relative density, n—actual target density divided by
N and S.
the theoretical density of chromium, 7.21 g/cm .
6.3 Other elements may be assayed and reported as agreed
upon between the purchaser and the supplier, but these shall
4. Classification
not be counted in determining the grade designation.
4.1 Grades of chromium are defined in Table 1.
6.3.1 Acceptable limits and analytical techniques for addi-
4.2 Grade, as defined in Table 1, is based on the total
tionalelementsshallbeagreeduponbetweenthepurchaserand
metallic impurity content of the metallic elements listed in
the supplier.
Table 2. Elements not detected shall be counted and reported as
present at the detection limit.
7. Physical Properties
7.1 Minimum relative density shall be agreed upon by the
5. Ordering Information
purchaser and the supplier.
5.1 Orders for these targets shall include the following:
7.2 ActualtargetdensityshallbedeterminedbyArchimedes
5.1.1 Grade,
principle or other acceptable techniques.
5.1.2 Configuration, (see 8.1 and 8.2),
7.3 Grain size shall be agreed upon between the purchaser
5.1.3 Whether certification is required, (see 12.1), and
and the supplier, and reported in accordance with Test Method
5.1.4 Whether a sample representative of the finished prod-
E112.
uct is required to be provided by the supplier to the purchaser.
8. Dimensions, Mass, and Permissible Variations
This specification is under the jurisdiction of ASTM Committee F01 on
8.1 Each target shall conform to an appropriate engineering
Electronics and is the direct responsibility of Subcommittee F01.17 on Sputter
drawing.
Metallization.
8.2 Nominal dimensions, tolerances and other attributes
Current edition approved Dec. 1, 2003. Published December 2003. Originally
shall be agreed upon between purchaser and supplier.
approved in 1992. Last previous edition approved in 1998 as F1367-98. DOI:
10.1520/F1367-98R03.
For referenced ASTM standards, visit the ASTM website, www.astm.org, or 9. Workmanship, Finish and Appearance
contact ASTM Customer Service at [e-mail]. For Annual Book of ASTM
9.1 Workmanship, finish and appearance shall be agreed
Standards volume information, refer to the standard’s Document Summary page on
upon between the purchaser and the supplier.
the ASTM website.
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