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ASTM E3034-20

(Guide)

Standard Guide for Workforce Education in Nanotechnology Pattern Generation

Standard Guide for Workforce Education in Nanotechnology Pattern Generation

SIGNIFICANCE AND USE
5.1 The purpose of this guide is to provide a basic educational structure for pattern generation in nanotechnology to organizations developing or carrying out education programs for the nanotechnology workforce. This guide helps to describe the minimum knowledge base for anyone involved in nanomanufacturing or nanomaterials research.  
5.2 The basic education should prepare an individual for varied roles in the nanotechnology workplace. The material in this standard may require a post-secondary two-year science or technology background to be understood sufficiently.  
5.3 Workers may transition in their roles in the workplace. Participants in such education will have a broad understanding of a complement of pattern generation methods, thus increasing their marketability for jobs within as well as beyond the nanotechnology field.  
5.4 This guide is intended to be one in a series of standards developed for workforce education in various aspects of nanotechnology. It will assist in providing an organization a basic structure for developing a program applicable to many areas in nanotechnology, thus providing dynamic and evolving workforce education.
SCOPE
1.1 This guide provides a framework for a basic workforce education in pattern generation topics related to nanotechnology, to be taught at an undergraduate college level. The education should be broadbased, preparing an individual to work in one of many areas in nanotechnology research, development, or manufacturing. The individual so educated may be involved in nanoscale pattern definition.  
1.2 This guide may be used to develop or evaluate an education program for pattern generation topics in the nanotechnology field. This guide provides listings of key topics that should be covered in a nanotechnology education program on this subject, but it does not provide specific course material to be used in such a program. This approach is taken in order to allow workforce education entities to ensure their programs cover the required material while also enabling these institutions to tailor their programs to meet the needs of their local employers.  
1.3 While no units of measurements are used in this standard guide, values stated in SI units are to be regarded as standard.  
1.4 This standard does not purport to address all of the methods and concepts needed for pattern generation in nanotechnology. It may not cover knowledge and skill objectives applicable to local conditions or required by local regulations.  
1.5 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety, health, and environmental practices and determine the applicability of regulatory limitations prior to use.  
1.6 This international standard was developed in accordance with internationally recognized principles on standardization established in the Decision on Principles for the Development of International Standards, Guides and Recommendations issued by the World Trade Organization Technical Barriers to Trade (TBT) Committee.

General Information

Status
Published
Publication Date
31-Aug-2020
ICS
07.120 - Nanotechnologies
Technical Committee
E56 - Nanotechnology
Drafting Committee
E56.07 - Education and Workforce Development
Current Stage
Ref Project

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This international standard was developed in accordance with internationally recognized principles on standardization established in the Decision on Principles for the
Development of International Standards, Guides and Recommendations issued by the World Trade Organization Technical Barriers to Trade (TBT) Committee.
Designation: E3034 − 20
Standard Guide for
Workforce Education in Nanotechnology Pattern
1
Generation
This standard is issued under the fixed designation E3034; the number immediately following the designation indicates the year of
original adoption or, in the case of revision, the year of last revision. A number in parentheses indicates the year of last reapproval. A
superscript epsilon (´) indicates an editorial change since the last revision or reapproval.
1. Scope mendations issued by the World Trade Organization Technical
Barriers to Trade (TBT) Committee.
1.1 This guide provides a framework for a basic workforce
education in pattern generation topics related to
2. Referenced Documents
nanotechnology, to be taught at an undergraduate college level.
2
2.1 ASTM Standards:
The education should be broadbased, preparing an individual
E2456 Terminology Relating to Nanotechnology
to work in one of many areas in nanotechnology research,
E2996 Guide for Workforce Education in Nanotechnology
development, or manufacturing. The individual so educated
Health and Safety
may be involved in nanoscale pattern definition.
E3001 Practice for Workforce Education in Nanotechnology
1.2 This guide may be used to develop or evaluate an
Characterization
education program for pattern generation topics in the nano-
E3089 Guide for Nanotechnology Workforce Education in
technology field.This guide provides listings of key topics that
Material Properties and Effects of Size
3
should be covered in a nanotechnology education program on
2.2 ISO Standards:
this subject, but it does not provide specific course material to
ISO/TS 80004-2 Nanotechnologies – Vocabulary—Part 2:
be used in such a program. This approach is taken in order to
Nano-objects
allow workforce education entities to ensure their programs
ISO/TS 80004-8 Nanotechnologies – Vocabulary—Part 8:
cover the required material while also enabling these institu-
Nanomanufacturing processes
tions to tailor their programs to meet the needs of their local
3. Terminology
employers.
3.1 Definitions:
1.3 While no units of measurements are used in this
3.1.1 For definitions of terms related to nanotechnology in
standard guide, values stated in SI units are to be regarded as
general, refer to Terminology E2456 and ISO/TS 80004-2.
standard.
3.1.2 For definitions of terms related to nanotechnology
1.4 This standard does not purport to address all of the
pattern generation in general, refer to ISO/TS 80004-8.
methods and concepts needed for pattern generation in nano-
3.2 Definitions of Terms Specific to This Standard:
technology. It may not cover knowledge and skill objectives
3.2.1 pattern, n—a design or a layout for fabricated struc-
applicable to local conditions or required by local regulations.
tures.
1.5 This standard does not purport to address all of the
3.2.2 pattern generation, n—the technique(s) to create and
safety concerns, if any, associated with its use. It is the
transferapatternontoamediumasappliedinfabricationatthe
responsibility of the user of this standard to establish appro-
micro- or nanoscale; for example, photolithography is an
priate safety, health, and environmental practices and deter-
optical technique used in chip manufacturing for generating a
mine the applicability of regulatory limitations prior to use.
pattern on a substrate.
1.6 This international standard was developed in accor-
dance with internationally recognized principles on standard-
4. Summary of Guide
ization established in the Decision on Principles for the
4.1 This guide designates a list of six topics on pattern
Development of International Standards, Guides and Recom-
generation relevant to nanotechnology workforce education.
2
For referenced ASTM standards, visit the ASTM website, www.astm.org, or
1
This guide is under the jurisdiction of ASTM Committee E56 on Nanotech- contact ASTM Customer Service at service@astm.org. For Annual Book of ASTM
nology and is the direct responsibility of Subcommittee E56.07 on Education and Standards volume information, refer to the standard’s Document Summary page on
Workforce Development. the ASTM website.
3
Current edition approved Sept. 1, 2020. Published October 2020. Originally Available from International Organization for Standardization (ISO), ISO
approved in 2015. Last previous edition approved in 2015 as E3034 – 15. DOI: Central Secretariat, BIBC II, Chemin de Blandonnet 8, CP 401, 1214 Vernier,
10.1520/E3034-20. Geneva, Switzerland, http://www.iso.org.
Copyright © ASTM International, 100 Barr Harbor Drive, PO Box C700, West Conshohocken, PA 19428-2959. United States
1

---------------------- Page: 1 ----------------------
E3034 − 20
NOTE 3—S
...

This document is not an ASTM standard and is intended only to provide the user of an ASTM standard an indication of what changes have been made to the previous version. Because
it may not be technically possible to adequately depict all changes accurately, ASTM recommends that users consult prior editions as appropriate. In all cases only the current version
of the standard as published by ASTM is to be considered the official document.
Designation: E3034 − 15 E3034 − 20
Standard Guide for
Workforce Education in Nanotechnology Pattern
1
Generation
This standard is issued under the fixed designation E3034; the number immediately following the designation indicates the year of
original adoption or, in the case of revision, the year of last revision. A number in parentheses indicates the year of last reapproval. A
superscript epsilon (´) indicates an editorial change since the last revision or reapproval.
1. Scope
1.1 This guide provides a framework for a basic workforce education in pattern generation topics related to nanotechnology, to
be taught at an undergraduate college level. The education should be broadbased, preparing an individual to work in one of many
areas in naotechnologynanotechnology research, development, or manufacturing. The individual so educated may be involved in
nanoscale pattern definition.
1.2 This guide may be used to develop or evaluate an education program for pattern generation topics in the nanotechnology field.
This guide provides listings of key topics that should be covered in a nanotechnology education program on this subject, but it does
not provide specific course material to be used in such a program. This approach is taken in order to allow workforce education
entities to ensure their programs cover the required material while also enabling these institutions to tailor their programs to meet
the needs of their local employers.
1.3 While no units of measurements are used in this standard guide, values stated in SI units are to be regarded as standard.
1.4 This standard does not purport to address all of the methods and concepts needed for pattern generation in nanotechnology.
It may not cover knowledge and skill objectives applicable to local conditions or required by local regulations.
1.5 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility
of the user of this standard to establish appropriate safety safety, health, and healthenvironmental practices and determine the
applicability of regulatory limitations prior to use.
1.6 This international standard was developed in accordance with internationally recognized principles on standardization
established in the Decision on Principles for the Development of International Standards, Guides and Recommendations issued
by the World Trade Organization Technical Barriers to Trade (TBT) Committee.
2. Referenced Documents
2
2.1 ASTM Standards:
E2456 Terminology Relating to Nanotechnology
E2996 Guide for Workforce Education in Nanotechnology Health and Safety
E3001 Practice for Workforce Education in Nanotechnology Characterization
E3089 Guide for Nanotechnology Workforce Education in Material Properties and Effects of Size
1
This guide is under the jurisdiction of ASTM Committee E56 on Nanotechnology and is the direct responsibility of Subcommittee E56.07 on Education and Workforce
Development.
Current edition approved Oct. 15, 2015Sept. 1, 2020. Published November 2015October 2020. Originally approved in 2015. Last previous edition approved in 2015 as
E3034 – 15. DOI: 10.1520/E3034-15.10.1520/E3034-20.
2
For referenced ASTM standards, visit the ASTM website, www.astm.org, or contact ASTM Customer Service at service@astm.org. For Annual Book of ASTM Standards
volume information, refer to the standard’s Document Summary page on the ASTM website.
Copyright © ASTM International, 100 Barr Harbor Drive, PO Box C700, West Conshohocken, PA 19428-2959. United States
1

---------------------- Page: 1 ----------------------
E3034 − 20
3
2.2 ISO Standards:
ISO/TS 80004-2 Nanotechnologies – Vocabulary—Part 2: Nano-ObjectsNano-objects
ISO/TS 80004-8 Nanotechnologies – Vocabulary—Part 8: Nanomanufacturing Processesprocesses
3. Terminology
3.1 Definitions:
3.1.1 For definitions of terms related to nanotechnology in general, refer to Terminology E2456 and ISO/TS 80004-2.
3.1.2 For definitions of terms related to nanotechnology pattern generation in general, refer to ISO/TS 80004-8.
3.2 Definitions of Terms Specific to This Standard:
3.2.1 education, n—the teaching of specific topics as part of a degree or certificate program, or as training to provide additional
skills and knowledge.
3.2.1 pattern, n—a design or a layout for fabricated structures.
3.2.2 pattern generation, n—the technique(s) to create and transfer a pattern onto a medium as applied in fabrication at the micro-
or nanoscale; for example, photolithography is an optical technique used in chip manufacturing for generat
...

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5.2 The basic education should prepare an individual for varied roles in the nanotechnology workplace. The material in this guide may require a post-secondary two-year science or technology background to be understood sufficiently.  
5.3 Workers may transition in their roles in the workplace. Participants in such education will have a broad understanding of a complement of topics related to the infrastructure required for advanced research and manufacturing, thus increasing their marketability for jobs within as well as beyond the nanotechnology field.  
5.4 Because nanotechnology is a rapidly developing field, the individual educated in nanotechnology needs to be cognizant of changing and evolving safety procedures and practices. Individuals should be aware of how to maintain an up-to-date understanding of the technology and have sufficient base education to enable the synthesis of emerging or evolving safety procedures and practices.  
5.5 This guide is intended to be one in a series of standards developed for workforce education in various aspects of nanotechnology. It will assist in providing an organization a basic structure for developing a program applicable to many areas in nanotechnology, thus providing dynamic and evolving workforce education.
SCOPE
1.1 This guide provides a framework for a basic workforce education in materials synthesis and processing at the nanoscale, to be taught at an undergraduate college level. This education should be broad to prepare an individual to serve within one of the many areas in nanotechnology research, development, or manufacturing.  
1.2 This guide may be used to develop or evaluate an education program for synthesis and processing applications in the nanotechnology field. This guide provides listings of key topics that should be covered in a nanotechnology education program on this subject, but it does not provide specific course material to be used in such a program. This approach is taken in order to allow workforce education entities to ensure their programs cover the required material while also enabling these institutions to tailor their programs to meet the needs of their local employers.  
1.3 While no units of measurements are used in this practice, values stated in SI units are to be regarded as standard.  
1.4 This standard does not purport to address all of the techniques, materials, and concepts needed for materials synthesis and processing at the nanoscale. It is the responsibility of the user of this standard to utilize other knowledge and skill objectives as applicable to local conditions or required by local regulations.  
1.5 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety, health, and environmental practices and determine the applicability of regulatory limitations prior to use.  
1.6 This international standard was developed in accordance with internationally recognized principles on standardization established in the Decision on Principles for the Development of International Standards, Guides and Recommendations issued by the World Trade Organization Technical Barriers to Trade (TBT) Committee.

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ASTM
ASTM E3059-22(Guide)
Standard Guide for Workforce Education in Nanotechnology Infrastructure

SIGNIFICANCE AND USE
5.1 The purpose of this guide is to provide, at the undergraduate college level, a basic educational structure in the infrastructure aspects of nanotechnology to organizations developing or carrying out education programs for the nanotechnology workforce. This guide helps to describe the minimum knowledge base for anyone involved in nanomanufacturing or nanomaterials research.  
5.2 The basic education should prepare an individual for varied roles in the nanotechnology workplace. The material in this guide may require a post-secondary two-year science or technology background to be understood sufficiently.  
5.3 Workers may transition in their roles in the workplace. Participants in such education will have a broad understanding of a complement of topics related to the infrastructure required for advanced research and manufacturing, thus increasing their marketability for jobs within as well as beyond the nanotechnology field.  
5.4 Because nanotechnology is a rapidly developing field, the individual educated in nanotechnology needs to be cognizant of changing and evolving safety procedures and practices. Individuals should be aware of how to maintain an up-to-date understanding of the technology and have sufficient base education to enable the synthesis of emerging or evolving safety procedures and practices.  
5.5 This guide is intended to be one in a series of standards developed for workforce education in various aspects of nanotechnology. It will assist in providing an organization a basic structure for developing a program applicable to many areas in nanotechnology, thus providing dynamic and evolving workforce education.
SCOPE
1.1 This document provides guidelines for basic workforce education in the infrastructure topics related to nanotechnology to be taught at an undergraduate college level. This education should be broad to prepare an individual to work within one of the many areas in nanotechnology research, development, or manufacturing. The individual so educated may be involved in material handling, manufacture, distribution, storage, use, or disposal of nanoscale materials.  
1.2 This guide may be used to develop or evaluate an education program for the infrastructure used in the nanotechnology field. This guide provides listings of key topics that should be covered in a nanotechnology education program on this subject, but it does not provide specific course material to be used in such a program. This approach is taken in order to allow workforce education entities to ensure their programs cover the required material while also enabling these institutions to tailor their programs to meet the needs of their local employers.  
1.3 While no units of measurements are used in this guide, values stated in SI units are to be regarded as standard.  
1.4 This standard does not purport to address all of the methods and concepts pertaining to the infrastructure for nanotechnology. It may not cover knowledge and skill objectives applicable to local conditions or required by local regulations.  
1.5 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety, health, and environmental practices and determine the applicability of regulatory limitations prior to use.  
1.6 This international standard was developed in accordance with internationally recognized principles on standardization established in the Decision on Principles for the Development of International Standards, Guides and Recommendations issued by the World Trade Organization Technical Barriers to Trade (TBT) Committee.

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ASTM
ASTM E3324-22(Test Method)
Standard Test Method for Lipid Quantitation in Liposomal Formulations Using Ultra-High-Performance Liquid Chromatography (UHPLC) with Triple Quadrupole Mass Spectrometry (TQMS)

SIGNIFICANCE AND USE
5.1 Liposomes are vesicles of nanoscale dimensions, composed of lipid bilayers, which are used for various diagnostic and therapeutic applications (9). The growing interest in liposomal formulations in the delivery of various drugs, antisense oligonucleotides, cloned genes, or recombinant proteins by the biopharmaceutical industry, warrants QC and thorough characterization of the constituent lipids. Lipid structure, composition, and concentration are key attributes in determining the quality and efficacy of a liposomal drug product as they influence the stability of liposomes, drug loading, release kinetics, biodistribution, and pharmacokinetic properties (9). Cholesterol modulates the lipid membrane fluidity, elasticity, and permeability; hence, it plays a key role in controlled drug release and increased stability of the liposome (10).  
5.2 This test method provides a rapid and reliable protocol for the determination of cholesterol, DSPE-PEG 2000, and HSPC in liposomal formulations using UHPLC-TQMS. Assessment of the stability of the analytes in terms of their degradation profiles is not included in this test method (11). This test method will benefit the biopharmaceutical industry in ascertaining quality assessment of liposomal formulations and monitoring batch-to-batch consistency for large-scale production, thereby facilitating safe and efficient drug development and regulatory review.  
5.3 UHPLC-MS/MS measurements are analytically more sensitive and specific for lipid analysis compared to other contemporary techniques using universal detectors, such as a charged aerosol or an evaporative light-scattering detector. For liposomes, MS/MS has further advantages over ultraviolet detectors, as lipids lack chromophores for detection. In this test method, TQMS has been used as the MS/MS technique of choice because of its high selectivity, sensitivity, S/N, accuracy, and broad linear range of quantitation, thereby allowing reproducible quantitation of the analytes,...
SCOPE
1.1 This test method describes the determination of lipid components in liposomal formulations, which includes sample solubilization in methanol followed by separation of the analytes using ultra-high-performance liquid chromatography (UHPLC) and detection with tandem mass-spectrometry (MS/MS). This test method adheres to multiple reaction monitoring (MRM) mass spectrometry on a triple quadrupole mass spectrometer (TQMS).  
1.2 This test method is specific for liposomal formulations containing cholesterol, 1,2- distearoyl-sn-glycero-3-phosphoethanolamine-N-[methoxy (polyethylene glycol)-2000] (DSPE- PEG 2000), and hydrogenated (soy) L-α-phosphatidylcholine (HSPC).  
1.3 This test method is applicable to report the absolute concentrations of cholesterol, DSPE-PEG 2000, and HSPC and their ratio (DSPE-PEG 2000: HSPC: cholesterol) in liposomal formulations. Assessment of the stability of the analytes in terms of their degradation as a result of oxidation or hydrolysis is beyond the scope of this test method.  
1.4 This test method includes calibration and standardization, sample preparation, UHPLC-TQMS instrumentation, potential interferences, method validation with acceptance criteria, sample analysis, and data reporting.  
1.5 The detection limits for cholesterol, DSPE-PEG 2000, and HSPC using this test method are 5.3, 0.5, and 0.5 ng/g, respectively. In addition, the quantitation limits for cholesterol, DSPE-PEG 2000, and HSPC are 10.6, 0.8, and 0.5 ng/g, respectively.  
1.6 This test method is intended for concentration ranges of 8-1600 ng/g for cholesterol, and of 2-400 ng/g for DSPE-PEG 2000 and HSPC.  
1.7 All observed and calculated values shall conform to the guidelines for significant digits and rounding as established in Practice D6026.  
1.8 Units—The values stated in SI units are to be regarded as the standard. Where appropriate, c.g.s units in addition to SI units are included in this standard.  
1.9 Th...

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