ASTM E1577-11

Standard Guide for Reporting of Ion Beam Parameters Used in Surface Analysis (Withdrawn 2020)

SIGNIFICANCE AND USE
Ion beams are utilized in surface analysis in two ways. First, they can generate signals from the specimen, for example, in SIMS and ISS. Second, they can remove material from the specimen surface while a surface analytical technique determines the composition of the freshly exposed surface. This process is called sputter depth profiling. Ideally, this guide requires reporting all characteristics of the ion beam that can possibly affect the results so that the measurement can be reproduced.
SCOPE
1.1 This guide covers the information needed to characterize ion beams used in surface analysis.  
1.2 This guide does not cover all information required to perform a sputter depth profile (see referenced documents), specify any properties of the specimen except its surface normal, and discuss the rationale for choosing a particular set of ion beam parameters (1,7). This guide does assume that the ion flux has a unique direction, that is, is an ion beam, rather than a wide spectrum of velocity vectors more typical of a plasma.  
1.3  This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use.
WITHDRAWN RATIONALE
This guide covers the information needed to characterize ion beams used in surface analysis.
Formerly under the jurisdiction of Committee E42 on Surface Analysis, this guide was withdrawn in January 2020 in accordance with Section 10.6.3 of the Regulations Governing ASTM Technical Committees, which requires that standards shall be updated by the end of the eighth year since the last approval date.

General Information

• Status: Withdrawn
• Publication Date: 30-Apr-2011
• Withdrawal Date: 13-Jan-2020
• ICS: 17.040.20 - Properties of surfaces
• Technical Committee: E42 - Surface Analysis
• Drafting Committee: E42.08 - Ion Beam Sputtering

Relations

• Referred By: ASTM E1127-08(2015) - Standard Guide for Depth Profiling in Auger Electron Spectroscopy
• Effective Date: 01-May-2011
• Referred By: ASTM E2735-14(2020) - Standard Guide for Selection of Calibrations Needed for X-ray Photoelectron Spectroscopy (XPS) Experiments
• Effective Date: 01-May-2011

Standards Content (Sample)

NOTICE: This standard has either been superseded and replaced by a new version or withdrawn.
Contact ASTM International (www.astm.org) for the latest information
Designation: E1577 − 11
Standard Guide for
Reporting of Ion Beam Parameters Used in Surface
1
Analysis
This standard is issued under the fixed designation E1577; the number immediately following the designation indicates the year of
original adoption or, in the case of revision, the year of last revision. A number in parentheses indicates the year of last reapproval. A
superscript epsilon (´) indicates an editorial change since the last revision or reapproval.
1. Scope 4. Summary of Guide
1.1 This guide covers the information needed to character- 4.1 This guide describes ion beam parameters to be reported
ize ion beams used in surface analysis. so that experiments can be reproduced and understood.
1.2 This guide does not cover all information required to
5. Significance and Use
perform a sputter depth profile (see referenced documents),
5.1 Ion beams are utilized in surface analysis in two ways.
specify any properties of the specimen except its surface
First, they can generate signals from the specimen, for
normal, and discuss the rationale for choosing a particular set
2
example, in SIMS and ISS. Second, they can remove material
ofionbeamparameters (1, 2). Thisguidedoesassumethatthe
from the specimen surface while a surface analytical technique
ion flux has a unique direction, that is, is an ion beam, rather
determines the composition of the freshly exposed surface.
than a wide spectrum of velocity vectors more typical of a
Thisprocessiscalledsputterdepthprofiling.Ideally,thisguide
plasma.
requires reporting all characteristics of the ion beam that can
1.3 This standard does not purport to address all of the
possibly affect the results so that the measurement can be
safety concerns, if any, associated with its use. It is the
reproduced.
responsibility of the user of this standard to establish appro-
priate safety and health practices and determine the applica-
6. Information to be Reported
bility of regulatory limitations prior to use.
6.1 Ion Gun Instrumentation—Specify the manufacturer,
type, and model of the ion gun (as well as of the analytical
2. Referenced Documents
spectrometer). Report the base pressure of the spectrometer
3
2.1 ASTM Standards:
vacuum chamber, the pressure in the vacuum chamber during
E673 Terminology Relating to SurfaceAnalysis (Withdrawn
the ion gun operation, and any information on the gas pressure
4
2012)
within the ionization chamber of the ion gun. If a mass filter is
E684 Practice for Approximate Determination of Current
used, note its characteristics.
Density of Large-Diameter Ion Beams for Sputter Depth
6.2 Recommended Ion Beam Parameters— The following
Profiling of Solid Surfaces
ion beam parameters may vary in both space and time. Report
3. Terminology
such variations. For example the ion beam may be pulsed as is
sometimes done in static SIMS. If so, report the pulse duration
3.1 Definitions:
and repetition rate (Hz).The spatial uniformity of the ion beam
3.1.1 For definitions of terms used in this guide, see
can be monitored by measuring the ion current with a Faraday
Terminology E673.
cup whose aperture diameter is much smaller in size than the
ion beam diameter (3). If a Faraday cup is used whose aperture
1
This guide is under the jurisdiction of ASTM Committee E42 on Surface
is larger than the ion beam diameter, temporal variations of the
Analysis and is the direct responsibility of Subcommittee E42.08 on Ion Beam
ion beam current can be observed.
Sputtering.
6.2.1 Composition—Report species present and their charge
Current edition approved May 1, 2011. Published June 2011. Originally
+ ++
approved in 1993. Last previous edition approved in 2004 as E1577 – 04. DOI:
states, for example, Ar and Ar , as well as their relative
10.1520/E1577-11.
concentrations. If a neutral trap is used, report its use and its
2
The boldface numbers given in parentheses refer to a list of references at the
location.
end of this guide.
3
6.2.2 Kinetic Energy (keV)—Report the kinetic energy of
For referenced ASTM standards, visit the ASTM website, www.astm.org, or
contact ASTM Customer Service at [e-mail]. For Annual Book of ASTM
the ion beam as it impacts on the specimen surface. It is this
Standards volume information, refer to the standard’s Document Summary page on
energy that controls many ion/solid effects (1) rather than the
the ASTM website.
4
energy of the ion beam as it leaves the gun.These two energies
The last approved version of this historical standard is referenced on
www.astm.org. will differ if the specimen is electrically biased.
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E1577 − 11
6.2.3 Ion Current (A)—Report the method used to measure 6.2.8 Specimen Rotation—If specimen rotation i
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