ISO 14701:2018

Surface chemical analysis — X-ray photoelectron spectroscopy — Measurement of silicon oxide thickness

This document specifies several methods for measuring the oxide thickness at the surfaces of (100) and (111) silicon wafers as an equivalent thickness of silicon dioxide when measured using X-ray photoelectron spectroscopy. It is only applicable to flat, polished samples and for instruments that incorporate an Al or Mg X-ray source, a sample stage that permits defined photoelectron emission angles and a spectrometer with an input lens that can be restricted to less than a 6° cone semi-angle. For thermal oxides in the range 1 nm to 8 nm thickness, using the best method described in this document, uncertainties, at a 95 % confidence level, could typically be around 2 % and around 1 % at optimum. A simpler method is also given with slightly poorer, but often adequate, uncertainties.

Analyse chimique des surfaces — Spectroscopie de photoélectrons par rayons X — Mesurage de l'épaisseur d'oxyde de silicium

General Information

• Status: Published
• Publication Date: 30-Oct-2018
• ICS: 71.040.40 - Chemical analysis
• Technical Committee: ISO/TC 201/SC 7 - Electron spectroscopies
• Drafting Committee: ISO/TC 201/SC 7/WG 2 - Quantification and interpretation of data in electron spectroscopy
• Current Stage: 9060 - Close of review
• Start Date: 04-Jun-2029

Relations

• Consolidated By: ISO 9288:2022 - Thermal insulation — Heat transfer by radiation — Vocabulary
• Effective Date: 06-Jun-2022
• Revises: ISO 14701:2011 - Surface chemical analysis — X-ray photoelectron spectroscopy — Measurement of silicon oxide thickness
• Effective Date: 28-Oct-2017

Standards Content (Sample)

INTERNATIONAL ISO
STANDARD 14701
Second edition
2018-11
Surface chemical analysis — X-ray
photoelectron spectroscopy —
Measurement of silicon oxide
thickness
Analyse chimique des surfaces — Spectroscopie de photoélectrons par
rayons X — Mesurage de l'épaisseur d'oxyde de silicium
Reference number
ISO 14701:2018(E)
©
ISO 2018

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ISO 14701:2018(E)

COPYRIGHT PROTECTED DOCUMENT
© ISO 2018
All rights reserved. Unless otherwise specified, or required in the context of its implementation, no part of this publication may
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Published in Switzerland
ii © ISO 2018 – All rights reserved

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ISO 14701:2018(E)

Contents Page
Foreword .iv
Introduction .v
1 Scope . 1
2 Normative references . 1
3 Terms and definitions . 1
4 Abbreviated terms and symbols . 1
4.1 Abbreviated terms . 1
4.2 Symbols . 1
5 Outline of method . 2
6 Method for measuring the oxide thickness . 4
6.1 Cleaning and preparing the sample . 4
6.2 Mounting the sample . 5
6.3 Choosing spectrometer settings . 5
6.4 Recording data . 8
6.5 Measuring intensities . 9
6.6 Calculating the oxide thickness .12
6.7 Calculating the uncertainty of the oxide thickness .14
Bibliography .16
© ISO 2018 – All rights reserved iii

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ISO 14701:2018(E)

Foreword
ISO
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