ISO 25164:2026

• Abstract:

  This document specifies the technical requirements for TiAlSiN thin films deposited by magnetron sputtering. This document is also applicable to the deposition of TiN, TiAlN or TiSiN thin films.

• Status: Published
• Publication Date: 02-Aug-2026
• ICS: 25.220.40 - Metallic coatings
• Technical Committee: ISO/TC 107/SC 9 - Physical vapor deposition coatings
• Drafting Committee: ISO/TC 107/SC 9 - Physical vapor deposition coatings
• Current Stage: 6060 - International Standard published
• Start Date: 03-Aug-2026
• Due Date: 13-Jun-2027
• Completion Date: 03-Aug-2026

Overview

ISO 25164: Physical Vapor Deposition Coatings - Magnetron Sputtering Deposition of TiAlSiN Thin Films - Specification provides comprehensive technical requirements for the deposition of titanium aluminum silicon nitride (TiAlSiN) coatings using magnetron sputtering. This international standard ensures consistency, reliability, and high performance for TiAlSiN thin films, which are recognized for their superior hardness, wear resistance, corrosion resistance, and high-temperature oxidation resistance. The document is relevant to industries seeking quality-assured physical vapor deposition (PVD) coatings, including the deposition of related films such as TiN, TiAlN, and TiSiN.

Key Topics

• Technical Requirements: The standard outlines strict requirements for workpiece preparation, equipment specifications, vacuum parameters, target materials, and gas purity necessary for achieving optimal TiAlSiN film properties.
• Workpiece Preparation: Procedures include detailed cleaning (degreasing, rinsing, drying), surface quality control (free from cracks, burrs, or contamination), and proper storage in controlled environments.
• Magnetron Sputtering Process: ISO 25164 specifies equipment standards, including the use of molecular pumps, vacuum gauges, and observation systems for process monitoring, ensuring uniform and high-quality thin film deposition.
• Performance & Testing: Measurement methods for film composition, thickness, crystal structure, hardness, and adhesion are provided. These leverage established standards to support accurate, repeatable results.

Applications

TiAlSiN coatings deposited by magnetron sputtering are widely used where high-performance surface properties are critical. Notable applications include:

• Cutting Tools: Enhanced durability and wear resistance improve the performance of cutting inserts, drills, and milling tools used in automotive, aerospace, and machinery manufacturing.
• Industrial Components: Components exposed to corrosive or high-temperature environments benefit from the superior protection offered by TiAlSiN films.
• General Engineering: Any substrate material that demands improved surface hardness, longevity, or functional reliability can utilize this coating technique.
• Large-Scale Manufacturing: Magnetron sputtering provides rapid deposition, uniform film thickness, and low substrate temperature, making it suitable for large-area applications and scalable production.

Related Standards

ISO 25164 references and builds upon several international standards, ensuring compatibility and harmonized methodologies within the industry:

• ISO 4518: Metallic coatings - Measurement of coating thickness - Profilometric method
• ISO 14577-1 & ISO 14577-4: Instrumented indentation test for hardness and materials parameters for metallic and non-metallic coatings
• ISO 20502: Determination of adhesion of ceramic coatings by scratch testing
• ISO 22278: Test method for crystalline quality of thin films using X-ray diffraction (XRD)
• ISO 23833: Electron probe microanalysis (EPMA) - Vocabulary

Practical Value

By adhering to ISO 25164, organizations benefit from:

• Improved Product Quality: Consistently meeting demanding technical specifications for PVD coatings.
• Regulatory and Market Access: Streamlined compliance and confidence for global customers and partners.
• Enhanced Process Efficiency: Clearly defined methods and equipment requirements reduce trial-and-error in deposition processes.
• Risk Reduction: Minimized surface defects, improved coating-substrate adhesion, and reliable film performance in end-use applications.

Implementing ISO 25164 facilitates innovation in thin film technologies and supports the adoption of advanced coating solutions across high-impact industries. For manufacturers, suppliers, and end-users, this standard is an essential tool for ensuring excellence in magnetron sputtering deposition of TiAlSiN thin films.

International
Standard
ISO 25164
First edition
Physical vapor deposition
2026-08
coatings — Magnetron sputtering
deposition of TiAlSiN thin films —
Specification
Revêtements obtenus par dépôt physique en phase vapeur —
Dépôt de couches minces de TiAlSiN par pulvérisation cathodique
magnétron — Spécification
Reference number
© ISO 2026
All rights reserved. Unless otherwise specified, or required in the context of its implementation, no part of this publication may
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Published in Switzerland
ii
Contents Page
Foreword .iv
Introduction .v
1 Scope . 1
2 Normative references . 1
3 Terms and definitions . 1
4 Technical specifications. 2
4.1 General .2
4.2 Technical requirements of workpieces .2
4.2.1 General .2
4.2.2 Cleaning .2
4.2.3 Surface quality .2
4.2.4 Storage .3
4.3 Equipment and vacuum parameters .3
4.4 Target materials .3
4.5 Gas composition and purity .3
5 Performance and test methods . 3
5.1 Composition of thin films .3
5.2 Thickness of thin films .3
5.3 Crystalline structure of the film .3
5.4 Hardness of thin films .3
5.5 Coating-substrate adhesion .3
Annex A (normative) Vacuum requirementsfor deposition ofTiAlSiN thin film by magnetron
sputtering . 4
Bibliography . 6

iii
Foreword
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This document was prepared by Technical Committee ISO/TC 107, Metallic and other inorganic coatings,
Subcommittee SC 9, Physical vapor deposition coatings.
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iv
Introduction
TiAlSiN films have properties such as high hardness, wear resistance, corrosion resistance and high-
temperature oxidation resistance. These characteristics significantly enhance the performance, durability
and value of products. Consequently, TiAlSiN films have gained widespread industrial attention in cutting
tool processing fields, e.g. automobiles, aerospace and general machinery.
Magnetron sputtering is a preferred deposition technique for TiAlSiN films onto cemented carbide
substrates. This method provides several advantages, including rapid deposition rate, low substrate
temperature, minimal film damage, reduced stress, improved film-substrate integration, high purity,
excellent compactness and uniform film thickness. These characteristics make magnetron sputtering well-
suited for industrial-scale production of TiAlSiN coatings on large-area substrates.

v
International Standard ISO 25164:2026(en)
Physical vapor deposition coatings — Magnetron sputtering
deposition of TiAlSiN thin films — Specification
1 Scope
This document specifies the technical requirements for TiAlSiN thin films deposited by magnetron
sputtering.
This document is also applicable to the deposition of TiN, TiAlN or TiSiN thin films.
2 Normative references
The following documents are referred to in the text in such a way that some or all of their content constitutes
requirements of this document. For dated references, only the edition cited applies. For undated references,
the latest edition of the referenced document (including any amendments) applies.
ISO 4518, Metallic coatings — Measurement of coating thickness — Profilometric method
ISO 14577-1, Metallic materials — Instrumented indentation test for hardness and materials parameters — Part
1: Test method
ISO 14577-4, Metallic materials — Instrumented indentation test for hardness and materials parameters —
Part 4: Test method for metallic and non-metallic coatings
ISO 20
...