ASTM E1016-96
(Guide)Standard Guide for Literature Describing Properties of Electrostatic Electron Spectrometers
Standard Guide for Literature Describing Properties of Electrostatic Electron Spectrometers
SCOPE
1.1 The purpose of this guide is to familiarize the analyst with some of the relevant literature describing the physical properties of modern electrostatic electron spectrometers.
1.2 this guide is intended to apply to electron spectrometers generally used in Auger electron spectroscopy (AES) and X-ray photoelectron spectroscopy (XPS).
1.3 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use.
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Designation: E 1016 – 96
Standard Guide for
Literature Describing Properties of Electrostatic Electron
Spectrometers
This standard is issued under the fixed designation E 1016; the number immediately following the designation indicates the year of
original adoption or, in the case of revision, the year of last revision. A number in parentheses indicates the year of last reapproval. A
superscript epsilon (e) indicates an editorial change since the last revision or reapproval.
1. Scope 6. General Description of Electron Spectrometers
1.1 The purpose of this guide is to familiarize the analyst 6.1 An electron spectrometer is typically used to measure
with some of the relevant literature describing the physical the energy and angular distributions of electrons emitted from
properties of modern electrostatic electron spectrometers. a specimen, typically for energies in the range 0 to 2500 eV. In
1.2 This guide is intended to apply to electron spectrometers surface analysis applications, the analyzed electrons are pro-
generally used in Auger electron spectroscopy (AES) and duced from the bombardment of a sample surface with
X-ray photoelectron spectroscopy (XPS). electrons, photons or ions. The entire spectrometer instrument
1.3 This standard does not purport to address all of the may include one or more of the following: (1) apertures to
safety concerns, if any, associated with its use. It is the define the specimen area and emission solid angle for the
responsibility of the user of this standard to establish appro- electrons accepted for analysis; (2) an electrostatic and/or
priate safety and health practices and determine the applica- magnetic lens system; (3) an electrostatic (dispersing) ana-
bility of regulatory limitations prior to use. lyzer; and (4) a detector. Methods to check the operating
characteristics of X-ray photoelectron spectrometers are re-
2. Referenced Documents
ported in Practice E 902.
2.1 ASTM Standards:
6.2 Intensity Scale Calibration and Spectrometer Transmis-
E 673 Terminology Relating to Surface Analysis sion Function—Quantitative analysis requires the determina-
E 902 Practice for Checking the Operating Characteristics
tion of the ability of the spectrometer to transmit electrons, and
of X-Ray Photoelectron Spectrometers the resultant detector signal, throughout the spectrometer
E 1217 Practice for Determination of the Specimen Area
instrument. This can be described by an overall electron
Contributing to the Detected Signal in X-Ray Photoelec- energy-dependent transmission function Q (E) and is given by
tron Spectroscopy and Auger Electron Spectroscopy
the product (1,2), as follows:
Q E! 5 H E!·T E!·D E!·F E!, (1)
~ ~ ~ ~ ~
3. Terminology
3.1 For definitions of terms used in this guide, refer to where:
H(E) = the effect of mechanical imperfections (such as
Terminology E 673.
aberrations, fringing fields, etc.),
4. Summary of Guide
T(E) = electron-optical transmission function,
D(E) = detector efficiency, and
4.1 This guide serves as a resource for relevant literature
F(E) = efficiency of the counting systems.
which describes the properties of electron spectrometers com-
Knowledge of this transmission function permits the cali-
monly used in surface analysis.
bration of the spectra intensity axis (3). A detailed review of the
5. Significance and Use
experimental determination of the transmission function for
XPS (4) and AES (5) measurements has been published.
5.1 The analyst may use this document to obtain informa-
6.3 Energy Scale Calibration—Quantitative analysis also
tion on the properties of electron spectrometers and instrumen-
requires the absolute calibration of spectra energy scales in
tal aspects associated with quantitative surface analysis.
either XPS or AES. Suitable photon energy values for Al and
Mg anode X-ray sources often used in XPS measurements are
available (6) and reference binding energy values for Cu, Au,
and Ag have been published (7). Binding energy scale calibra-
This guide is under the jurisdiction of ASTM Committee E-42 on Surface
tion procedures have been described in the literature for XPS
Analysis and is the direct responsibility of Subcommittee E42.03 on Auger Electron
Spectroscopy and XPS.
Current edition approved Sept. 10, 1996. Published November 1996. Originally
published as E 1016 – 84. Last previous edition E 1016 – 90. The boldface numbers in parentheses refer to the list of references at the end of
Annual Book of ASTM Standards, Vol 03.06. this guide.
Copyright © ASTM, 100 Barr Harbor Drive, West Conshohocken, PA 19428-2959, United States.
E 1016
(8,9) and kinetic energy scale calibrations for AES (10-12) exit slits and apertures, their associated fringing fields, as well
measurements. as the effect of the divergence of the incident electron trajec-
tories on analyzer performance, particularly energy resolution,
7. Literature
have also been reviewed (13-17). A detailed examination of the
7.1 Electrostatic Analyzers—Spectrometers commonly used
effects of unwanted internal scattering in CHA and CMA
on modern AES and XPS spectrometer instruments generally
electron spectrometers has been reported in the literature
employ electrostatic deflection analyzers. Auger electron spec-
(19-21).
trometers often use cylindrical mirror analyzer (CMA) designs,
7.3 Lens Systems—Input lens systems are frequently em-
although concentric hemispherical analyzers (CHA) (also
ployed in CHA (and cylindrical sector) designs to vary the
known as spherical deflection (or sector) analyzers) are also
surface analysis area (22) and to permit a convenient location
used. The CHA design is the most common analyzer employed
of the CHA so as to allow access of complementary surface
on modern XPS instruments, although double-pass CMA
characterization techniques to the sample (23). The electro-
designs were also employed on earlier XPS instruments.
static lens design often consists of a coaxial series of electrodes
Retarding field analyzers (RFA) have historical interest in early
that define the analysis area on the sample surface and
AES work, but are now commonly used on low energy electron
determines the electron trajectories at the input to the analyzer.
diffraction apparatus.
The lens system also determines the angular resolution and
7.1.1 Electrostatic Deflection Analyzers— A review of the
modifies the transmission characteristics of the spectrometer
general properties of deflection analyzers may be found in
system (1). A review of electrostatic lens systems incorporated
recent reviews (13,14). A more detailed review is also available
in surface analysis instruments is offered (13-17,24). Lens
where, in addition to the CMA and CHA designs, plane mirror,
systems have also been introduced at the exit of analyzers for
spherical mirror, cylindrical sector, and toroidal deflection
photoelectron imaging (14,25-27). Methods to determine the
analyzers are treated (15-17). As the width of typical Auger
specimen area examined are described in Practice E 1217.
spectral features are several electron volts, the use of a CMA
7.4 Detectors—Detection of the analyzed electrons is gen-
design in conventional AES has sufficed for routine analysis,
erally accomplished through the use of an electron multiplier to
particularly for small area analysis where a compromise
produce usable signals. Surface analysis instruments currently
between signal-to-noise and energy resolution is important.
use a variety of multipliers, but most are glass upon which a
These are commonly used at a resolution defined by the
resistive counting is placed. The coating is formulated to
full-width at half-maximum of the spectrometer energy reso-
provide a substantial secondary electron yield upon primary
lution, DE, divided by the electron energy, E, of 0.25 to 0.6 %.
electron impact. The multiplier has a potential placed upon it so
The ability to incorporate an electron source concentric with
that the secondary electrons are accelerated to adjacent coated
the CMA axis has been extensively exploited in scanning-
surfaces, thus providing the electron multiplying effect. Mul-
electron microscope instruments to give Auger data as a
tipliers are available in various shapes for both analog and
function of beam position (that is, images). However, analysis
pulse counting amplification modes of operation (28). Single-
of the Auger spectra from some compounds and surface
channel electron multipliers were common in early instru-
morphologies may be enhanced by the use of a CHA design
ments, but multiple-channel (“multichannel”) electron multi-
which can provide better energy resolution (but a lower
pliers fabricated into thin plates are now available for use in
transmission) and superior angular resolution. The CHA design
detectors. See a general review of electron multipliers (29-31).
is most frequently employed on XPS instruments where
The use of position-sensitive detectors, such as resistive
spectral features generally have narrow energy widths of 1 eV
anodes, as well as wedge and
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