ASTM F1367-98(2011)

Standard Specification for Chromium Sputtering Targets for Thin Film Applications (Withdrawn 2020)

ABSTRACT
This specification covers sputtering targets fabricated from chromium metal for use in thin film applications. The grades of chromium covered in this specification, are based on the total metallic impurity content of the metallic elements, and are classified as 4N, 3N7, 3N5, 3N, and 2N8. Materials shall be tested using analytical methods such as combustion/infrared spectrometry, thermal conductivity, atomic absorption spectrometry, direct current plasma, inductively coupled plasma, and spark source mass spectroscopy or glow discharge mass spectroscopy; and the individual grades shall conform to specified values of chemical composition, density, grain size.
SCOPE
1.1 This specification covers sputtering targets fabricated from chromium metal.
1.2 This specification sets purity grade levels, physical attributes, analytical methods and packaging requirements.
1.3 The values stated in SI units are to be regarded as standard. No other units of measurement are included in this standard.
WITHDRAWN RATIONALE
This specification covers sputtering targets fabricated from chromium metal.
Formerly under the jurisdiction of Committee F01 on Electronics, this practice was withdrawn in January 2020 in accordance with section 10.6.3 of the Regulations Governing ASTM Technical Committees, which requires that standards shall be updated by the end of the eighth year since the last approval date.

General Information

• Status: Withdrawn
• Publication Date: 31-May-2011
• Withdrawal Date: 08-Jan-2020
• ICS: 25.220.40 - Metallic coatings
• Technical Committee: F01 - Electronics
• Drafting Committee: F01.17 - Sputter Metallization

Standards Content (Sample)

NOTICE: This standard has either been superseded and replaced by a new version or withdrawn.
Contact ASTM International (www.astm.org) for the latest information
Designation:F1367 −98 (Reapproved 2011)
Standard Specification for
1
Chromium Sputtering Targets for Thin Film Applications
This standard is issued under the fixed designation F1367; the number immediately following the designation indicates the year of
original adoption or, in the case of revision, the year of last revision. A number in parentheses indicates the year of last reapproval. A
superscript epsilon (´) indicates an editorial change since the last revision or reapproval.
1. Scope 5.1.4 Whether a sample representative of the finished prod-
uct is required to be provided by the supplier to the purchaser.
1.1 This specification covers sputtering targets fabricated
from chromium metal.
6. Chemical Composition
1.2 This specification sets purity grade levels, physical
6.1 The metallic elements listed in Table 2 shall be assayed
attributes, analytical methods and packaging requirements.
and reported.
1.3 The values stated in SI units are to be regarded as
6.2 Gaseous elements to be assayed and reported are C, O,
standard. No other units of measurement are included in this
N and S.
standard.
6.3 Other elements may be assayed and reported as agreed
upon between the purchaser and the supplier, but these shall
2. Referenced Documents
not be counted in determining the grade designation.
2
2.1 ASTM Standards:
6.3.1 Acceptable limits and analytical techniques for addi-
E112 Test Methods for Determining Average Grain Size
tionalelementsshallbeagreeduponbetweenthepurchaserand
the supplier.
3. Terminology
7. Physical Properties
3.1 Definitions of Terms Specific to This Standard:
3.1.1 raw material lot—original material lot from which a 7.1 Minimum relative density shall be agreed upon by the
number of targets is fabricated. purchaser and the supplier.
3.1.2 relative density, n—actualtargetdensitydividedbythe
7.2 Actual target densityshall bedeterminedbyArchimedes
2
theoretical density of chromium, 7.21 g/cm .
principle or other acceptable techniques.
7.3 Grain size shall be agreed upon between the purchaser
4. Classification
and the supplier, and reported in accordance with Test Method
4.1 Grades of chromium are defined in Table 1.
E112.
4.2 Grade, as defined in Table 1, is based on the total
8. Dimensions, Mass, and Permissible Variations
metallic impurity content of the metallic elements listed in
8.1 Each target shall conform to an appropriate engineering
Table 2. Elements not detected shall be counted and reported as
drawing.
present at the detection limit.
8.2 Nominal dimensions, tolerances and other attributes
5. Ordering Information
shall be agreed upon between purchaser and supplier.
5.1 Orders for these targets shall include the following:
9. Workmanship, Finish and Appearance
5.1.1 Grade,
9.1 Workmanship, finish and appearance shall be agreed
5.1.2 Configuration, (see 8.1 and 8.2),
upon between the purchaser and the supplier.
5.1.3 Whether certification is required, (see 12.1), and
10. Sampling
1 10.1 Analyses for impurities shall be performed on a sample
This specification is under the jurisdiction of ASTM Committee F01 on
Electronics and is the direct responsibility of Subcommittee F01.17 on Sputter
that is representative of the finished product.
Metallization.
10.2 Reporting analytical results of the unprocessed raw
Current edition approved June 1, 2011. Published June 2011. Originally
approved in 1992. Last previous edition approved in 2003 as F1367-98 (2003). DOI:
material lot is not acceptable.
10.1520/F1367-98R11.
2
For referenced ASTM standards, visit the ASTM website, www.astm.org, or 11. Analytical Methods
contact ASTM Customer Service at [e-mail]. For Annual Book of ASTM
11.1 Analysis for impurities in Table 2 and 6.2 shall be
Standards volume information, refer to the standard’s Document Summary page on
the ASTM website. performed as follows:
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F1367−98 (2011)
A
TABLE 1 Chromium Grades
method of analysis, and any other information agreed upon
Metallic Impurity Level by
between the purchaser and the supplier.
Grade Implied Purity, %
Weight, ppm, max
12.3 Impurity levels may be reported on a certificate of
4N 99.99 100
3N7 99.97 300 analysis using actual analytical results, or typical results based
3N5 99.95 500
upon historical statistical data for the same process, as agreed
3N 99.9 1000
upon between the purchaser and the supplier. The minimum
2N8 99.8 2000
detection limit for each element listed in Table 2 that was not
A
Additional grades may be designated by following the same pattern. That is,
detected in the analysis shall be noted on the certificate of
examine the purity expressed in weight percent. Count the leading, “9’s” and set
this number as “n”. Then note the fi
...