ASTM E673-03

Standard Terminology Relating to Surface Analysis (Withdrawn 2012)

SCOPE
1.1 This terminology is related to the various disciplines involved in surface analysis.
1.2 The definitions listed apply to (a) Auger electron spectroscopy (AES), (b) X-ray photoelectron spectroscopy (XPS), (c) ion-scattering spectroscopy (ISS), (d) secondary ion mass spectrometry (SIMS), and (e) energetic ion analysis (EIA).
WITHDRAWN RATIONALE
This terminology is related to the various disciplines involved in surface analysis.
Formerly under the jurisdiction of Committee E42 on Surface Analysis, this terminology was withdrawn in January 2012 in accordance with section 10.5.3.1 of the Regulations Governing ASTM Technical Committees, which requires that standards shall be updated by the end of the eighth year since the last approval date.

General Information

• Status: Withdrawn
• Publication Date: 30-Nov-2003
• Withdrawal Date: 31-Dec-2011
• ICS: 01.040.17 - Metrology and measurement. Physical phenomena (Vocabularies)
• ICS: 17.040.20 - Properties of surfaces
• Technical Committee: E42 - Surface Analysis
• Drafting Committee: E42.02 - Terminology

Relations

• Replaces: ASTM E673-02b - Standard Terminology Relating to Surface Analysis
• Effective Date: 01-Dec-2003
• Referred By: ASTM E1217-11(2019) - Standard Practice for Determination of the Specimen Area Contributing to the Detected Signal in Auger Electron Spectrometers and Some X-Ray Photoelectron Spectrometers
• Effective Date: 01-Dec-2003
• Referred By: ASTM E1162-11(2019) - Standard Practice for Reporting Sputter Depth Profile Data in Secondary Ion Mass Spectrometry (SIMS)
• Effective Date: 01-Dec-2003
• Referred By: ASTM E984-12(2020) - Standard Guide for Identifying Chemical Effects and Matrix Effects in Auger Electron Spectroscopy
• Effective Date: 01-Dec-2003
• Referred By: ASTM E1634-11(2019) - Standard Guide for Performing Sputter Crater Depth Measurements
• Effective Date: 01-Dec-2003
• Referred By: ASTM E1881-12(2020) - Standard Guide for Cell Culture Analysis with SIMS
• Effective Date: 01-Dec-2003
• Referred By: ASTM E2734/E2734M-10(2018) - Standard Specification for Dimensions of Knife-Edge Flanges
• Effective Date: 01-Dec-2003
• Referred By: ASTM E983-19 - Standard Guide for Minimizing Unwanted Electron Beam Effects in Auger Electron Spectroscopy
• Effective Date: 01-Dec-2003
• Referred By: ASTM E1438-11(2019) - Standard Guide for Measuring Widths of Interfaces in Sputter Depth Profiling Using SIMS
• Effective Date: 01-Dec-2003
• Referred By: ASTM E1523-15 - Standard Guide to Charge Control and Charge Referencing Techniques in X-Ray Photoelectron Spectroscopy
• Effective Date: 01-Dec-2003
• Referred By: ASTM E2108-16 - Standard Practice for Calibration of the Electron Binding-Energy Scale of an X-Ray Photoelectron Spectrometer
• Effective Date: 01-Dec-2003
• Referred By: ASTM E2426-10(2019) - Standard Practice for Pulse Counting System Dead Time Determination by Measuring Isotopic Ratios with SIMS
• Effective Date: 01-Dec-2003
• Referred By: ASTM E1635-06(2019) - Standard Practice for Reporting Imaging Data in Secondary Ion Mass Spectrometry (SIMS)
• Effective Date: 01-Dec-2003
• Referred By: ASTM E1504-11(2019) - Standard Practice for Reporting Mass Spectral Data in Secondary Ion Mass Spectrometry (SIMS)
• Effective Date: 01-Dec-2003
• Referred By: ASTM E1127-08(2015) - Standard Guide for Depth Profiling in Auger Electron Spectroscopy
• Effective Date: 01-Dec-2003
• Referred By: ASTM E1880-12(2020) - Standard Practice for Tissue Cryosection Analysis with SIMS
• Effective Date: 01-Dec-2003
• Referred By: ASTM E1016-07(2020) - Standard Guide for Literature Describing Properties of Electrostatic Electron Spectrometers
• Effective Date: 01-Dec-2003
• Referred By: ASTM E1508-12a(2019) - Standard Guide for Quantitative Analysis by Energy-Dispersive Spectroscopy
• Effective Date: 01-Dec-2003
• Referred By: ASTM E995-16 - Standard Guide for Background Subtraction Techniques in Auger Electron Spectroscopy and X-Ray Photoelectron Spectroscopy
• Effective Date: 01-Dec-2003

Standards Content (Sample)

NOTICE: This standard has either been superseded and replaced by a new version or withdrawn.
Contact ASTM International (www.astm.org) for the latest information
Designation:E673–03
Standard Terminology Relating to
1
Surface Analysis
This standard is issued under the fixed designation E673; the number immediately following the designation indicates the year of
original adoption or, in the case of revision, the year of last revision.Anumber in parentheses indicates the year of last reapproval.A
superscript epsilon (´) indicates an editorial change since the last revision or reapproval.
1. Scope analysis:
analysis area (specimen)—two-dimensional region of a
1.1 This terminology is related to the various disciplines
specimen surface measured in the plane of that surface from
involved in surface analysis.
whichtheentireanalyticalsignaloraspecifiedpercentageof
1.2 The definitions listed apply to ( a) Auger electron
that signal is detected.
spectroscopy (AES), (b) X-ray photoelectron spectroscopy
analysis volume (specimen)—three-dimensional region of
(XPS),(c)ion-scatteringspectroscopy(ISS),(d)secondaryion
aspecimensurfacefromwhichtheentireanalyticalsignalor
mass spectrometry (SIMS), and (e) energetic ion analysis
a specified percentage of that signal is detected.
(EIA).
analysis volume (spectrometer)—three-dimensional region
2. Abbreviations withinaspectrometerfromwhichtheentireanalyticalsignal
or a specified percentage of that signal is detected.
2.1 Abbreviations commonly used in surface analysis are as
analyzer transmission— see spectrometer transmission.
follows:
angle:
AES Auger electron spectroscopy
collection—SIMS, the angle between the normal to the
BS backscattering spectroscopy
CHA concentric hemispherical analyzer
original specimen surface and the axis of the secondary ion
CMA cylindrical mirror analyzer
collection optics.
EIA energetic ion analysis
eV electron-volts of detector—EIA, SIMS, the angle between the incident
ESCA electron spectroscopy for chemical analysis
beamdirectionandthedirectionpointingfromthebeamspot
FABMS fast atom bombardment mass spectrometry
to the center of the detector.
FWHM full width at half maximum peak height
ISS ion scattering spectroscopy of emission—AES, XPS, the angle of emission or ejection of
pp peak-to-peak
electrons from a solid measured relative to the normal to the
RBS Rutherford backscattering spectroscopy
surface.
RFA retarding field analyzer
SAM scanning Auger microprobe of incidence— the angle between the incident beam and the
SIMS secondary ion mass spectrometry
normal to the surface.
SNMS sputtered neutral mass spectrometry
of scattering—EIA, the angle between the incident beam
XPS X-ray photoelectron spectroscopy
direction and the direction in which a particle is traveling
3. Terminology Definitions
after it is scattered. If the particle is incident on the detector,
this angle will be the same as angle of detector.
adventitious carbon referencing— XPS, determining the
solid, of detector—EIA, the solid angle intercepted by the
chargingpotentialofaparticularspecimenbycomparingthe
detector, with the radius originating at the beam spot.
experimentally determined binding energy of the C 1s
takeoff—AES, XPS the angle at which particles leave a
binding energy from absorbed hydrocarbon on the specimen
specimen measured relative to the plane of the specimen
with a standard binding energy value.
surface. (see angle of emission).
NOTE 1—Anominalvalueof285.0isoftenusedforthebindingenergy
angle lapping—a method specimen preparation in which a
of the relevant C 1s peak, although some analysts prefer specific values in
specimenismechanicallypolishedatanangletotheoriginal
the range 284.6 eV to 285.2 eV depending on the nature of the substrate.
surface.
NOTE 2—Thisanglemayoftenbelessthan1°sothatdepthinformation
with respect to the original surface is transformed lateral information.
1
ThisterminologyisunderthejurisdictionofASTMCommitteeE42onSurface
Analysis and is the direct responsibility of Subcommittee E42.02 on Terminology.
angle resolved AES—the recording ofAuger electron spectra
Current edition approved Dec. 1, 2003. Published January 2004. Originally
as a function of angle emission.
approved in 1979. Last previous edition approved in 2002 as E673–02b. DOI:
10.1520/E0673-03. angular distribution of secondary ions—see secondary ions.
Copyright © ASTM International, 100 Barr Harbor Drive, PO Box C700, West Conshohocken, PA 19428-2959, United States.
1

---------------------- Page: 1 ----------------------
E673–03
attenuation coefficient—for a parallel beam of specified transition—transitions involved in electron emission by an
particles or radiation, the quantity µ in the expression µDx Auger process are designated by indicating the electron
for the fraction removed in passing through a thin layer Dx shells. The first letter designates the shell containing the
of a substance in the limit as D x approaches zero, where Dx initial vacancy and the last two letters designate the
...