ASTM E673-02

Standard Terminology Relating to Surface Analysis

SCOPE
1.1 This terminology is related to the various disciplines involved in surface analysis.  
1.2 The definitions listed apply to (a) Auger electron spectroscopy (AES), (b) X-ray photoelectron spectroscopy (XPS), (c) ion-scattering spectroscopy (ISS), (d) secondary ion mass spectrometry (SIMS), and (e) energetic ion analysis (EIA).

General Information

• Status: Historical
• Publication Date: 09-Jul-2002
• ICS: 01.040.17 - Metrology and measurement. Physical phenomena (Vocabularies)
• ICS: 17.040.20 - Properties of surfaces
• Technical Committee: E42 - Surface Analysis
• Drafting Committee: E42.02 - Terminology

Relations

• Replaced By: ASTM E673-02a - Standard Terminology Relating to Surface Analysis
• Effective Date: 10-Dec-2002

Standards Content (Sample)

NOTICE: This standard has either been superseded and replaced by a new version or withdrawn.
Contact ASTM International (www.astm.org) for the latest information
Designation:E673–02
Standard Terminology Relating to
1
Surface Analysis
This standard is issued under the fixed designation E673; the number immediately following the designation indicates the year of
original adoption or, in the case of revision, the year of last revision.Anumber in parentheses indicates the year of last reapproval.A
superscript epsilon (ε) indicates an editorial change since the last revision or reapproval.
1. Scope comparing the experimentally determined binding energy of
the C1speakmaximumfromcontaminatinghydrocarbonor
1.1 This terminology is related to the various disciplines
hydrocarbon groups on the specimen to a standard binding
involved in surface analysis.
energy value.
1.2 The definitions listed apply to (a) Auger electron spec-
analysis:
troscopy (AES), (b) X-ray photoelectron spectroscopy (XPS),
area—a two-dimensional region of a specimen surface,
(c) ion-scattering spectroscopy (ISS), (d) secondary ion mass
usually measured in the plane of the specimen surface, from
spectrometry (SIMS), and (e) energetic ion analysis (EIA).
which a specified percentage of the signal is detected.
2. Abbreviations
volume—a three dimensional region of a specimen from
which a specified percentage of the measured signal is
2.1 Abbreviationscommonlyusedinsurfaceanalysisareas
follows: generated. Also see information depth.
analyzer transmission— see spectrometer transmission.
AES Auger electron spectroscopy
CDP compositional depth profile
angle:
CMA cylindrical mirror analyzer
collection—SIMS, the angle between the normal to the
EELS electron energy loss spectroscopy
original specimen surface and the axis of the secondary ion
EIA energetic ion analysis
EPMA electron probe microanalysis
collection optics.
eV electron volt
of detector—EIA, SIMS, the angle between the incident
ESCA electron spectroscopy for chemical analysis
beamdirectionandthedirectionpointingfromthebeamspot
FAB fast atom bombardment
FABMS fast atom bombardment mass spectrometry
to the center of the detector.
FWH full width at half maximum peak
of emission—AES, XPS, the angle of emission or ejection of
FWHM full width at half maximum peak height
HEISS high energy ion scattering spectrometry electrons from a solid measured relative to the normal to the
ISS ion scattering spectroscopy
surface.
LEISS low energy ion scattering spectrometry
of incidence— the angle between the incident beam and the
MEISS medium energy ion scattering spectrometry
normal to the surface.
MS spectroscopy
M height
of scattering—EIA, the angle between the incident beam
ptp peak-to-peak
direction and the direction in which a particle is traveling
RBS Rutherford backscattering spectroscopy
after it is scattered. If the particle is incident on the detector,
RFA retarding field analyzer
SAM scanning Auger microprobe
this angle will be the same as angle of detector.
SDP sputter depth profile
solid, of detector—EIA, the solid angle intercepted by the
SEM scanning electron microscope
SIMS secondary ion mass spectrometry detector, with the radius originating at the beam spot.
SNMS sputtered neutral mass spectrometry
takeoff—AES, XPS the angle at which particles leave a
SSA spherical sector analyser
specimen measured relative to the plane of the specimen
TOF or ToF time of flight
TXRF total reflection X-ray fluorescence spectroscopy surface. (see angle of emission).
UPS ultra-violet photoelectron spectroscopy
angle lapping—a method of specimen preparation in which a
XPS X-ray photoelectron spectroscopy
specimen is mechanically polished at an angle so that
3. Terminology Definitions
changes in composition as a function of position, usually
depth, can be more easily determined.
adventitious carbon referencing—XPS, a method of deter-
angle resolved AES—the recording ofAuger electron spectra
mining the charging potential of a particular specimen by
as a function of angle emission.
angular distribution of secondary ions—see secondary ions.
1
ThisterminologyisunderthejurisdictionofASTMCommitteeE42onSurface
attenuation coefficient—for a parallel beam of specified
Analysis and is the direct responsibility of Subcommittee E42.02 on Terminology.
particlesorradiation,thequantityµintheexpressionµ∆xfor
Current edition approved July 10, 2002. Published August 2002. Originally
the fraction removed in passing through a thin layer ∆x
published as E673–79a. Last previous edition E673–01.
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E673–02
of a substance in the limit as ∆x approaches zero, where ∆x initial vacancy and the last two letters designate the shells
is measured in the direction of the beam. containing electron vacancies created by Auger emission
Auger: (for example, KLL, and LMN). When a bonding electro
...