ASTM E1577-04

Standard Guide for Reporting of Ion Beam Parameters Used in Surface Analysis

SIGNIFICANCE AND USE
Ion beams are utilized in surface analysis in two ways. First, they can generate signals from the specimen, for example, in SIMS and ISS. Second, they can remove material from the specimen surface while a surface analytical technique determines the composition of the freshly exposed surface. This process is called sputter depth profiling. Ideally, this guide requires reporting all characteristics of the ion beam that can possibly affect the results so that the measurement can be reproduced.
SCOPE
1.1 This guide covers the information needed to characterize ion beams used in surface analysis.  
1.2 This guide does not cover all information required to perform a sputter depth profile (see referenced documents), specify any properties of the specimen except its surface normal, and discuss the rationale for choosing a particular set of ion beam parameters (1,7). This guide does assume that the ion flux has a unique direction, that is, is an ion beam, rather than a wide spectrum of velocity vectors more typical of a plasma.  
1.3  This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use.

General Information

• Status: Historical
• Publication Date: 31-Oct-2004
• ICS: 17.040.20 - Properties of surfaces
• Technical Committee: E42 - Surface Analysis
• Drafting Committee: E42.08 - Ion Beam Sputtering

Relations

• Replaces: ASTM E1577-95(2000) - Standard Guide for Reporting of Ion Beam Parameters Used in Surface Analysis
• Effective Date: 01-Nov-2004
• Replaced By: ASTM E1577-11 - Standard Guide for Reporting of Ion Beam Parameters Used in Surface Analysis (Withdrawn 2020)
• Effective Date: 01-May-2011
• Referred By: ASTM E1127-08(2015) - Standard Guide for Depth Profiling in Auger Electron Spectroscopy
• Effective Date: 01-Nov-2004
• Referred By: ASTM E2735-14(2020) - Standard Guide for Selection of Calibrations Needed for X-ray Photoelectron Spectroscopy (XPS) Experiments
• Effective Date: 01-Nov-2004

Standards Content (Sample)

NOTICE: This standard has either been superseded and replaced by a new version or withdrawn.
Contact ASTM International (www.astm.org) for the latest information
Designation:E1577–04
Standard Guide for
Reporting of Ion Beam Parameters Used in Surface
1
Analysis
This standard is issued under the fixed designation E1577; the number immediately following the designation indicates the year of
original adoption or, in the case of revision, the year of last revision. A number in parentheses indicates the year of last reapproval. A
superscript epsilon (´) indicates an editorial change since the last revision or reapproval.
1. Scope 3.1.1 For definitions of terms used in this guide, see
Terminology E673.
1.1 This guide covers the information needed to character-
ize ion beams used in surface analysis.
4. Summary of Guide
1.2 This guide does not cover all information required to
4.1 Thisguidedescribesionbeamparameterstobereported
perform a sputter depth profile (see referenced documents),
so that experiments can be reproduced and understood.
specify any properties of the specimen except its surface
normal, and discuss the rationale for choosing a particular set
5. Significance and Use
2
of ion beam parameters (1,7). This guide does assume that the
5.1 Ion beams are utilized in surface analysis in two ways.
ion flux has a unique direction, that is, is an ion beam, rather
First, they can generate signals from the specimen, for ex-
than a wide spectrum of velocity vectors more typical of a
ample, in SIMS and ISS. Second, they can remove material
plasma.
from the specimen surface while a surface analytical technique
1.3 This standard does not purport to address all of the
determines the composition of the freshly exposed surface.
safety concerns, if any, associated with its use. It is the
Thisprocessiscalledsputterdepthprofiling.Ideally,thisguide
responsibility of the user of this standard to establish appro-
requires reporting all characteristics of the ion beam that can
priate safety and health practices and determine the applica-
possibly affect the results so that the measurement can be
bility of regulatory limitations prior to use.
reproduced.
2. Referenced Documents
6. Information to be Reported
3
2.1 ASTM Standards:
6.1 Ion Gun Instrumentation—Specify the manufacturer,
E673 Terminology Relating to Surface Analysis
type, and model of the ion gun (as well as of the analytical
E684 Practice for Approximate Determination of Current
spectrometer). Report the base pressure of the spectrometer
Density of Large-Diameter Ion Beams for Sputter Depth
vacuum chamber, the pressure in the vacuum chamber during
Profiling of Solid Surfaces
the ion gun operation, and any information on the gas pressure
E996 Practice for Reporting Data in Auger Electron Spec-
within the ionization chamber of the ion gun. If a mass filter is
troscopy and X-ray Photoelectron Spectroscopy
used, note its characteristics.
E1127 Guide for Depth Profiling in Auger Electron Spec-
6.2 Recommended Ion Beam Parameters— The following
troscopy
ion beam parameters may vary in both space and time. Report
E1162 Practice for Reporting Sputter Depth Profile Data in
such variations. For example the ion beam may be pulsed as is
Secondary Ion Mass Spectrometry (SIMS)
sometimes done in static SIMS. If so, report the pulse duration
3. Terminology and repetition rate (Hz).The spatial uniformity of the ion beam
can be monitored by measuring the ion current with a Faraday
3.1 Definitions:
cup whose aperture diameter is much smaller in size than the
ion beam diameter (2). If a Faraday cup is used whose aperture
1
This guide is under the jurisdiction of ASTM Committee E42 on Surface
is larger than the ion beam diameter, temporal variations of the
Analysis and is the direct responsibility of Subcommittee E42.08 on Ion Beam
ion beam current can be observed.
Sputtering.
Current edition approved Nov. 1, 2004. Published December 2004. Originally
6.2.1 Composition—Report species present and their charge
+ ++
approved in 1993. Last previous edition approved in 2000 as E1577 – 95 (2000).
states, for example, Ar and Ar , as well as their relative
DOI: 10.1520/E1577-04.
2 concentrations. If a neutral trap is used, report its use and its
The boldface numbers given in parentheses refer to a list of references at the
location.
end of this guide.
3
For referenced ASTM standards, visit the ASTM website, www.astm.org, or
6.2.2 Kinetic Energy (keV)—Report the kinetic energy of
contact ASTM Customer Service at [e-mail]. For Annual Book of ASTM
the ion beam as it impacts on the specimen surface. It is this
Standards volume information, refer to the standard’s Document Summary page on
energy that controls many ion/solid effects (1) rather than the
the ASTM website.
Copyright © ASTM International, 100 Barr Harbor Drive, PO Box C700, West Conshohocken, PA 19428-2959, United States.
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E1577–04
energy of the ion beam as it leaves the gun.These
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