ASTM E1577-95(2000)
(Guide)Standard Guide for Reporting of Ion Beam Parameters Used in Surface Analysis
Standard Guide for Reporting of Ion Beam Parameters Used in Surface Analysis
SCOPE
1.1 This guide covers the information needed to characterize ion beams used in surface analysis.
1.2 This guide does not cover all information required to perform a sputter depth profile (see referenced documents), specify any properties of the specimen except its surface normal, and discuss the rationale for choosing a particular set of ion beam parameters (1). This guide does assume that the ion flux has a unique direction, that is, is an ion beam, rather than a wide spectrum of velocity vectors more typical of a plasma.
1.3 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use.
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Designation:E1577–95 (Reapproved 2000)
Standard Guide for
Reporting of Ion Beam Parameters Used in Surface
Analysis
This standard is issued under the fixed designation E 1577; the number immediately following the designation indicates the year of
original adoption or, in the case of revision, the year of last revision. A number in parentheses indicates the year of last reapproval. A
superscript epsilon (e) indicates an editorial change since the last revision or reapproval.
1. Scope 4. Summary of Guide
1.1 This guide covers the information needed to character- 4.1 Thisguidedescribesionbeamparameterstobereported
ize ion beams used in surface analysis. so that experiments can be reproduced and understood.
1.2 This guide does not cover all information required to
5. Significance and Use
perform a sputter depth profile (see referenced documents),
specify any properties of the specimen except its surface 5.1 Ion beams are utilized in surface analysis in two ways.
First, they can generate signals from the specimen, for ex-
normal, and discuss the rationale for choosing a particular set
of ion beam parameters (1). This guide does assume that the ample, in SIMS and ISS. Second, they can remove material
from the specimen surface while a surface analytical technique
ion flux has a unique direction, that is, is an ion beam, rather
than a wide spectrum of velocity vectors more typical of a determines the composition of the freshly exposed surface.
Thisprocessiscalledsputterdepthprofiling.Ideally,thisguide
plasma.
1.3 This standard does not purport to address all of the requires reporting all characteristics of the ion beam that can
possibly affect the results so that the measurement can be
safety concerns, if any, associated with its use. It is the
responsibility of the user of this standard to establish appro- reproduced.
priate safety and health practices and determine the applica-
6. Information to be Reported
bility of regulatory limitations prior to use.
6.1 Ion Gun Instrumentation—Specify the manufacturer,
2. Referenced Documents
type, and model of the ion gun (as well as of the analytical
2.1 ASTM Standards: spectrometer). Report the base pressure of the spectrometer
E 673 Terminology Relating to Surface Analysis vacuum chamber, the pressure in the vacuum chamber during
the ion gun operation, and any information on the gas pressure
E 684 Practice for Approximate Determination of Current
Density of Large-Diameter Ion Beams for Sputter Depth within the ionization chamber of the ion gun. If a mass filter is
used, note its characteristics.
Profiling of Solid Surfaces
E 996 Practice for Reporting Data in Auger Electron Spec- 6.2 Recommended Ion Beam Parameters— The following
ion beam parameters may vary in both space and time. Report
troscopy and X-Ray Photoelectron Spectroscopy
E 1127 Guide for Depth Profiling in Auger Electron Spec- such variations. For example the ion beam may be pulsed as is
sometimes done in static SIMS. If so, report the pulse duration
troscopy
E 1162 Practice for Reporting Sputter Depth Profile Data in and repetition rate (Hz).The spatial uniformity of the ion beam
can be monitored by measuring the ion current with a Faraday
Secondary Ion Mass Spectrometery (SIMS)
cup whose aperture diameter is much smaller in size than the
3. Terminology
ion beam diameter (2). If a Faraday cup is used whose aperture
3.1 Definitions: is larger than the ion beam diameter, temporal variations of the
3.1.1 For definitions of terms used in this guide, see ion beam current can be observed.
Terminology E 673. 6.2.1 Composition—Report species present and their charge
+ ++
states, for example, Ar and Ar , as well as their relative
concentrations. If a neutral trap is used, report its use and its
This guide is under the jurisdiction of ASTM Committee E-42 on Surface
location.
Analysis and is the direct responsibility of Subcommittee E42.08 on Ion Beam
6.2.2 Kinetic Energy (keV)—Report the kinetic energy of
Sputtering.
Current edition approved Oct. 10, 1995. Published December 1995. Originally the ion beam as it impacts on the specimen surface. It is this
published as E 1577 – 93. Last previous edition E 1577 – 94.
energy that controls many ion/solid effects (1) rather than the
The boldface numbers given in parentheses refer to a list of references at the
energy of the ion beam as it leaves the gun.These two energies
end of this guide.
will differ if the specimen is electrically biased.
Annual Book of ASTM Standards, Vol 03.06.
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E1577
6.2.3 Ion Current (A)—Report the method used to measure 6.2.8 Specimen Rotation—If specimen rotation is used,
the ion beam current. If a Faraday cup is used, note its aperture specify rotation rate and any effect on ion beam angle (that is,
diameter relative to the ion beam diameter. rotation axis not the sample normal (3)).
6.2.4 Ion Current Density (A/m )—The ion beam current 6.3 Second Ion Gun—If a second ion gun is used, for
density is the ion current passing through a unit cross-sectional example, to reduce surface roughness, also report
...
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