ASTM E407-07e1

Standard Practice for Microetching Metals and Alloys

SIGNIFICANCE AND USE
This practice lists recommended methods and solutions for the etching of specimens for metallographic examination. Solutions are listed to highlight phases present in most major alloy systems.
SCOPE
1.1 This practice covers chemical solutions and procedures to be used in etching metals and alloys for microscopic examination. Safety precautions and miscellaneous information are also included.
1.2 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use. For specific cautionary statements, see 6.1 and Table 2.

General Information

• Status: Historical
• Publication Date: 30-Apr-2007
• ICS: 77.040.99 - Other methods of testing of metals
• Technical Committee: E04 - Metallography
• Drafting Committee: E04.01 - Specimen Preparation

Standards Content (Sample)

NOTICE: This standard has either been superseded and replaced by a new version or withdrawn.
Contact ASTM International (www.astm.org) for the latest information
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Designation: E407 − 07
StandardPractice for
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Microetching Metals and Alloys
This standard is issued under the fixed designation E407; the number immediately following the designation indicates the year of
original adoption or, in the case of revision, the year of last revision.Anumber in parentheses indicates the year of last reapproval.A
superscript epsilon (´) indicates an editorial change since the last revision or reapproval.
This standard has been approved for use by agencies of the Department of Defense.
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´ NOTE—Table 2 was editorially corrected in May 2011.
1. Scope 3.2.2 vapor-deposition interference layer method— a tech-
niqueforproducingenhancedcontrastbetweenmicrostructural
1.1 This practice covers chemical solutions and procedures
constituents, usually in color, by thin films formed by vacuum
to be used in etching metals and alloys for microscopic
deposition of a dielectric compound (such as ZnTe, ZnSe,
examination. Safety precautions and miscellaneous informa-
TiO ,ZnSorZnO)withaknownindexofrefraction,generally
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tion are also included.
duetolightinterferenceeffects(alsoknownasthe“Pepperhoff
1.2 This standard does not purport to address all of the
method”).
safety concerns, if any, associated with its use. It is the
4. Summary of Practice
responsibility of the user of this standard to establish appro-
priate safety and health practices and determine the applica-
4.1 Table1 is an alphabetical listing of the metals (includ-
bility of regulatory limitations prior to use. For specific
ing rare earths) and their alloys for which etching information
cautionary statements, see 6.1 and Table2.
is available. For each metal and alloy, one or more etchant
numbers and their corresponding use is indicated. Alloys are
2. Referenced Documents
listed as a group or series when one or more etchants are
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common to the group or series. Specific alloys are listed only
2.1 ASTM Standards:
when necessary. When more than one etchant number is given
D1193Specification for Reagent Water
for a particular use, they are usually given in order of
E7Terminology Relating to Metallography
preference. The numbers of electrolytic etchants are italicized
E2014Guide on Metallographic Laboratory Safety
to differentiate them from nonelectrolytic etchants.
3. Terminology
4.2 Table2 is a numerical listing of all the etchants refer-
3.1 Definitions: enced in Table1and includes the composition and general
procedure to be followed for each etchant.
3.1.1 For definition of terms used in this standard, see
Terminology E7.
4.3 To use the tables, look up the metal or alloy of interest
3.2 Definitions of Terms Specific to This Standard:
in Table1 and note the etchant numbers corresponding to the
3.2.1 tint etch—an immersion etchant that produces color
results desired. The etchant composition and procedure is then
contrast, often selective to a particular constituent in the
located in Table2corresponding to the etchant number.
microstructure, due to a thin oxide, sulfide, molybdate, chro-
4.4 If the common name of an etchant is known (Marble’s,
mate or elemental selenium film on the polished surface that
Vilella’s, etc.), and it is desired to know the composition,
reveals the structure due to variations in light interference
Table3contains an alphabetical listing of etchant names, each
effects as a function of the film thickness (also called a ``stain
codedwithanumbercorrespondingtotheetchantcomposition
etch”).
given in Table2.
5. Significance and Use
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This practice is under the jurisdiction of ASTM Committee E04 on Metallog-
5.1 This practice lists recommended methods and solutions
raphy and is the direct responsibility of Subcommittee E04.01 on Specimen
for the etching of specimens for metallographic examination.
Preparation.
Solutions are listed to highlight phases present in most major
Current edition approved May 1, 2007. Published May 2007. Originally
approved in 1999. Last previous edition approved in 1999 as E407–99 DOI:
alloy systems.
10.1520/E0407-07.
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For referenced ASTM standards, visit the ASTM website, www.astm.org, or
6. Safety Precautions
contact ASTM Customer Service at [e-mail]. For Annual Book of ASTM
6.1 Beforeusingormixinganychemicals,allproductlabels
Standards volume information, refer to the standard’s Document Summary page on
the ASTM website. and pertinent Material Safety Data Sheets (MSDS) should be
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E407 − 07
read and understood concerning all of the hazards and safety 6.2.7 When working with HF always be sure to wear the
precautions to be observed. Users should be aware of the type appropriategloves,eyeprotectionandapron.BuyingHFatthe
of hazards involved in the use of all chemic
...