ASTM F2086-01

Standard Test Method for Pass Through Flux of Circular Magnetic Sputtering Targets, Method 2 (Withdrawn 2007)

SCOPE
1.1 This test method covers measuring the dc magnetic field transmitted through a round ferromagnetic sputtering target ("pass through flux" or "PTF"). In this test method the source magnetic field is in the test target's radial direction.
1.2 Planar disk-shaped targets in the diameter range 5 to 8 in. inclusive (125 to 205 mm inclusive) and of thickness 0.1 to 0.5 in. inclusive (2.5 to 13 mm) may be characterized by this procedure.
1.3 This test method is also applicable to targets having an open center, for example, to targets 5-in. outside diameter by 2.5-in. inside diameter by 0.25-in. thick (127-mm outside diameter by 63.5-mm inside diameter by 6.35-mm thick).
1.4 Targets of various diameters and thicknesses are accommodated by suitable fixturing to align the piece under test with the source magnet mounted in the test fixture. Tooling, covering several popular target designs is specified in this procedure. Additional target configurations may be tested by providing special tooling. When special fixturing is used all parties concerned with the testing must agree to the test setup.
1.5 The values stated in inch-pound units are to be regarded as the standard. The values given in parentheses are for information only.
1.6 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use.
WITHDRAWN RATIONALE
This test method covers measuring the dc magnetic field transmitted through a round ferromagnetic sputtering target ("pass through flux" or "PTF"). In this test method the source magnetic field is in the test target's radial direction.
Formerly under the jurisdiction of Committee F01 on Electronics, and Subcommittee F01.17 on Sputter Metallization, this test method was withdrawn in July 2007 in accordance with section 10.6.3.1 of the Regulations Governing ASTM Technical Committees, which requires that standards shall be updated by the end of the eighth year since the last approval date.

General Information

• Status: Withdrawn
• Publication Date: 09-Feb-2001
• Withdrawal Date: 26-Aug-2007
• ICS: 77.040.20 - Non-destructive testing of metals
• Technical Committee: F01 - Electronics
• Drafting Committee: F01.17 - Sputter Metallization

Standards Content (Sample)

NOTICE: This standard has either been superseded and replaced by a new version or withdrawn.
Contact ASTM International (www.astm.org) for the latest information
Designation: F 2086 – 01
Standard Test Method for
Pass Through Flux of Circular Magnetic Sputtering Targets,
Method 2
This standard is issued under the fixed designation F 2086; the number immediately following the designation indicates the year of
original adoption or, in the case of revision, the year of last revision. A number in parentheses indicates the year of last reapproval. A
superscript epsilon (e) indicates an editorial change since the last revision or reapproval.
1. Scope 2.1.2 reference field, n—for purposes of this standard, the
“reference field” is the dc magnetic field measured with the
1.1 This test method covers measuring the dc magnetic field
Hall probe Gaussmeter when no sputtering target is in position
transmitted through a round ferromagnetic sputtering target
on the test stand. The strength of the reference field depends
(“pass through flux” or “PTF”). In this test method the source
upon the height and position of the Hall probe relative to the
magnetic field is in the test target’s radial direction.
source magnet.
1.2 Planar disk-shaped targets in the diameter range 5 to 8
2.1.3 source field, n—for purposes of this standard, the
in. inclusive (125 to 205 mm inclusive) and of thickness 0.1 to
“source field” is the dc magnetic field measured with the Hall
0.5 in. inclusive (2.5 to 13 mm) may be characterized by this
probe at the top surface of the target support table.
procedure.
1.3 This test method is also applicable to targets having an
3. Summary of Test Method
open center, for example, to targets 5-in. outside diameter by
3.1 The sputtering target under test is mounted on a test
2.5-in. inside diameter by 0.25-in. thick (127-mm outside
fixture in which a permanent horseshoe-shaped magnet is held
diameter by 63.5-mm inside diameter by 6.35-mm thick).
in proximity to one of the flat planar faces of the target.AHall
1.4 Targets of various diameters and thicknesses are accom-
probe Gaussmeter is used to measure the dc magnetic field
modated by suitable fixturing to align the piece under test with
penetrating the target and entering the air space from the
the source magnet mounted in the test fixture. Tooling, cover-
target’s opposite face.
ingseveralpopulartargetdesignsisspecifiedinthisprocedure.
Additional target configurations may be tested by providing
4. Significance and Use
special tooling. When special fixturing is used all parties
4.1 It is standard practice to use magnetron cathode sputter
concerned with the testing must agree to the test setup.
deposition sources in manufacturing thin film magnetic data
1.5 The values stated in inch-pound units are to be regarded
storage media. But a ferromagnetic sputtering target tends to
as the standard. The values given in parentheses are for
shunt a sputtering cathode’s magnetic field, thus reducing the
information only.
efficiency of the sputtering process.
1.6 This standard does not purport to address all of the
4.2 Makers of sputtering targets have developed various
safety concerns, if any, associated with its use. It is the
means of controlling alloy microstructure to minimize the
responsibility of the user of this standard to establish appro-
undesirable cathode shunting effect. Because of their differing
priate safety and health practices and determine the applica-
manufacturing methods, however, the targets of one supplier
bility of regulatory limitations prior to use.
mayhavemagneticpropertiessignificantlybetterorworsethan
2. Terminology those of another, even when the alloy compositions are the
same.
2.1 Definitions:
4.3 This test method permits comparing the magnetic shunt-
2.1.1 pass through flux (PTF), n—for purposes of this
ing power of magnetic targets under a standard test condition.
standard, the “pass through flux” is the dc magnetic field
The results are useful to sputtering target suppliers and buyers
transmittedthroughaferromagneticsputteringtarget,fromone
in predicting target performance, in specifying target quality,
face to the opposite face.
andinqualifyingincomingtargetshipments.Thistestmayalso
2.1.1.1 Discussion—PTF is also frequently called “leakage
be useful in quantifying target improvement efforts.
flux.”
4.4 Manufacturing process steps which lower a target ma-
terial’s magnetic permeability tend to increase the PTF, and
This test method is under the jurisdiction of ASTM Committee F01 on
visa versa. It would in principle be possible to predict the PTF
Electronics and is the direct responsibility of Subcommittee F01.17 on Sputter
by accumulating sufficient permeability data, and knowing the
Metallization.
Current edition approved Feb. 10, 2001. Published April 2001.
Copyright © ASTM International, 100 Barr Harbor Drive, PO Box C700, West Conshohocken, PA 19428-2959, United States.
F2086–01
target thickness and the field intensity of the magnetic assem- 7.2 Verify that the pole faces of the source magnet are in
bly used for magnetron sputtering. light contact with the bottom of the target support table.
Adjustment of the magnet’s vertical position can be made by
5. Interferences
loosening the magnet clamp screws, inserting nonmagnetic
shims under the magnet, and retightening the clamp screws.
5.1 The magnetic test fixture must be located in an area free
Recheck magnet location, per 7.1, if shims are adjusted.
of extraneous ferromagnetic materials and strong magnetic
7.3 Activate, zero, and calibrate the measuring Gaussmeter
fields that would interfere with the source magnet – test
(6.2) using the manufacturer’s instructions.
specimen dc magnetic field configuration.
7.4 Mount the Gaussmeter probe in the fixture’s Hall probe
5.2 The “magnetic conditioning” effect is strong in some
support tube. The bottom tip of the probe should extend 0.050
sputtering target alloys. It is important to verify that the target
6 0.025 in. (1.25 6 0.64 mm) beyond the support tube.
under test is magnetically stabilized before finalizing a data set
Mounted properly, the probe tip will be clearly visible, sticking
(see 9.2 and 9.10).
out of its support. Gently tighten the nylon clamping screws to
6. Apparatus secure and center the Hall probe in position in the probe
support tube. Excessive tightening may result in damage to the
6.1 Thistestmethodrequirestheuseofaspecialtestfixture.
probe that can affect test results.
Its construction is specified in the Appendix.
2 7.5 By visual sighting, align the Hall probe as indicated in
is required, equipped with a portable
6.2 Gaussmeter,
Fig.1,butwiththeprobetipclosetobutnottouchingthetarget
transverse-field Hall probe blade nominally 0.040-in. thick by
support table. The Hall probe should be centered as accurately
0.170-in. wide by 2.5-in. long (1.0-mm by 4.3-mm by 64-mm).
aspossiblebetweenthemagnetpoles,andtheflatsoftheprobe
The Gaussmeter must be capable of measuring dc magnetic
blade should be parallel to the fixture’s short dimension.
fields in the range 1 Gauss to 3500 Gauss, inclusive, to an
Loosen the post attachment screw at the baseplate and adjust
accuracy of 62 %. This unit is designated the “measuring
theHallprobepostposition,ifnecessary,toachievethecorrect
Gaussmeter,” and is used for making the magnetic field
location.
measurements specified in this test method.
7.5.1 To make the adjustments indicated in this and subse-
6.2.1 It is important that the semiconductor Hall probe
quent paragraphs it may be necessary to loosen and retighten
sensing element be mounted at the extreme tip end of the
the collars on the Hall probe support post and the appropriate
probe. The distance from the probe tip to the center of the
nylon clamping screws which secure other parts of the appa-
sensing element must not exceed 0.030 in. (0.75 mm).
ratus.
6.3 It is convenient to have a second Gaussmeter available,
7.6 Lower the support arm until the Hall probe blade tip is
alsoequippedwithaportabletransverse-fieldHallprobeblade.
in bare (light) contact with the target support table. Note the
This unit must be capable of measuring dc magnetic fields in
Gaussmeter reading. Swing (rotate) the cross arm to center the
the range 1 Gauss to 50 Gauss, inclusive, to an accuracy of
probe blade over the magnetic poles, and slightly rotate the
620 %. This unit is referred to in 8.1 as the “screening
probe support tube, as necessary, to maximize the Gaussmeter
Gaussmeter.” It is used to monitor residual magnetic fields in
reading. The proper position is achieved when the Gaussmeter
test specimen sputtering targets.
reading indicates a clear maximum in the magnetic field
NOTE 1—If a “screening Gaussmeter” is not available, the targets under
strength.
test must be degaussed and verified (8.3) using the measuring Gaussmeter
before starting Section 7. NOTE 2—If a clear maximum cannot be identified, the Hall probe blade
is not adequately centered in the probe support tube (see 7.4), or the blade
6.4 Demagnetizer, is needed which is capable of removing
is not in correct transverse alignment (7.6). Repeat 7.4 or 7.6 as required
the remnant magnetization in sputtering targets to be tested.
to provide a discernible maximum point in step 7.6.
7.6.1 The maximum Gaussmeter reading at the target sup-
7. Preparation of Apparatus
port table (7.6) is the “source field” (2.1.3).
7.1 Verify that the source magnet is securely clamped with
NOTE 3—Measuring and recording (preferably using an SPC control
themidpointbetweenthetwopolefaceslocated5.750 60.015
chart) the source field provides important information about the stability
in. (146.1 6 0.4 mm) from the end of the baseplate. This is
of the measuring system. A significant deviation in source field strength
illustrated in Fig. 1
may indicate a problem with the Hall probe, or a change in the operating
environment that may influence the test results.
7.7 The source field (7.6.1) must be in the range 900 6 50
Three Gaussmeters are known to the committee to be suitable. These are:
Gauss.
Model 4048, fitted with Model T4048-001 Hall probe, or Model 5070 fitted with
Model STH 57-0404 probe, all from F. W. Bell Company, 6120 T Hanging Moss
7.7.1 If the dc magnetic source field is not in the required
Rd., Orlando, FL 32807; or Model 410-SCT, fitted with model MPEC-410-3 Probe
range (7.7) the Hall probe should be inspected and replaced if
Extension Cable from Lake Shore Cryotronics, Inc., 575 McCorkle Blvd., Wester-
any evidence of damage is observed. If there are no indications
ville, OH 43082.
of probe damage the measurement of the source field (7.2-7.6)
The sole source of supply of the demagnetizer, 60-Hz hand held coil known to
thecommitteeatthistimeisRealisticHighPowerVideo/AudioTapeEraser,catalog
should be repeated, as needed, until t
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