ASTM E983-10
(Guide)Standard Guide for Minimizing Unwanted Electron Beam Effects in Auger Electron Spectroscopy
Standard Guide for Minimizing Unwanted Electron Beam Effects in Auger Electron Spectroscopy
SIGNIFICANCE AND USE
When electron beam excitation is used in AES, the incident electron beam can interact with the specimen material causing physical and chemical changes. In general, these effects are a hindrance to AES analysis because they cause localized specimen modification (1-4).
With specimens that have poor electrical conductivity the electron beam can stimulate the development of localized charge on the specimen surface. This effect is a hindrance to AES analysis because the potentials associated with the charge can either adversely affect the integrity of Auger data or make Auger data collection difficult (5, 6).
SCOPE
1.1 This guide outlines the origins and manifestations of unwanted electron beam effects in Auger electron spectroscopy (AES).
1.2 Some general guidelines are provided concerning the electron beam parameters which are most likely to produce these effects and suggestions are offered on how to minimize them.
1.3 General classes of materials are identified which are most likely to exhibit unwanted electron beam effects. In addition, a tabulation of some specific materials which have been observed to undergo electron damage effects is provided.
1.4 A simple method is outlined for establishing the existence and extent of these effects during routine AES analysis.
1.5 The values stated in SI units are to be regarded as standard. No other units of measurement are included in this standard.
1.6 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use.
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Designation: E983 − 10
Standard Guide for
Minimizing Unwanted Electron Beam Effects in Auger
1
Electron Spectroscopy
This standard is issued under the fixed designation E983; the number immediately following the designation indicates the year of
original adoption or, in the case of revision, the year of last revision. A number in parentheses indicates the year of last reapproval. A
superscript epsilon (´) indicates an editorial change since the last revision or reapproval.
1. Scope 3. Terminology
1.1 This guide outlines the origins and manifestations of 3.1 See Terminology E673 for terms used inAuger electron
unwantedelectronbeam effects inAuger electron spectroscopy spectroscopy.
(AES).
NOTE 1—Electron beam effects and their consequences are widely
referred to in the literature using any one or more of the following terms:
1.2 Some general guidelines are provided concerning the
electron beam damage, sample damage, specimen damage, beam effects,
electron beam parameters which are most likely to produce
electron beam induced processes, and electron irradiation effects.
these effects and suggestions are offered on how to minimize
them.
4. Significance and Use
1.3 General classes of materials are identified which are
4.1 When electron beam excitation is used in AES, the
most likely to exhibit unwanted electron beam effects. In
incident electron beam can interact with the specimen material
addition, a tabulation of some specific materials which have
causing physical and chemical changes. In general, these
been observed to undergo electron damage effects is provided.
effects are a hindrance to AES analysis because they cause
4
localized specimen modification (1-4).
1.4 A simple method is outlined for establishing the exis-
tence and extent of these effects during routine AES analysis.
4.2 With specimens that have poor electrical conductivity
the electron beam can stimulate the development of localized
1.5 The values stated in SI units are to be regarded as
charge on the specimen surface. This effect is a hindrance to
standard. No other units of measurement are included in this
AES analysis because the potentials associated with the charge
standard.
can either adversely affect the integrity of Auger data or make
1.6 This standard does not purport to address all of the
Auger data collection difficult (5, 6).
safety concerns, if any, associated with its use. It is the
responsibility of the user of this standard to establish appro-
5. Origins of Electron Beam Effects
priate safety and health practices and determine the applica-
5.1 Electron beam effects inAES may originate from one or
bility of regulatory limitations prior to use.
more distinct processes.
5.1.1 Charge accumulation (7) (see Chapter 9) in materials
2. Referenced Documents
with poor electrical conductivity leading to potentials that
2
2.1 ASTM Standards:
cause distortion of Auger data or make AES data collection
E673 Terminology Relating to SurfaceAnalysis (Withdrawn
difficult by virtue of:
3
2012)
5.1.1.1 Auger peak shift on energy scale,
E996 Practice for Reporting Data in Auger Electron Spec-
5.1.1.2 Auger peak shape and size distortion, and
troscopy and X-ray Photoelectron Spectroscopy
5.1.1.3 Auger signal strength instability.
5.1.2 Electronic excitation of surface, subsurface, and bulk
atoms and molecules leading to specimen changes (8-10)
1
This guide is under the jurisdiction of ASTM Committee E42 on Surface
which include:
Analysisand is the direct responsibility of Subcommittee E42.03 on Auger Electron
5.1.2.1 Dissociation,
Spectroscopy and X-Ray Photoelectron Spectroscopy.
Current edition approved Nov. 1, 2010. Published December 2010. Originally 5.1.2.2 Electron stimulated desorption (ESD) (11),
approved in 1984. Last previous edition approved in 2005 as E983 – 05. DOI:
5.1.2.3 Electron stimulated adsorption (ESA) (12),
10.1520/E0983-10.
5.1.2.4 Polymerization (13, 14),
2
For referenced ASTM standards, visit the ASTM website, www.astm.org, or
5.1.2.5 Carburization (15-17),
contact ASTM Customer Service at service@astm.org. For Annual Book of ASTM
Standards volume information, refer to the standard’s Document Summary page on
the ASTM website.
3 4
The last approved version of this historical standard is referenced on The boldface numbers in parentheses refer to the references listed at the end of
www.astm.org. this standard.
Copyright © ASTM International, 100 Barr Harbor Drive, PO Box C700, West Conshohocken, PA 19428-2959. United States
1
---------------------- Page: 1 ----------------------
E983 − 10
A
TABLE 1 Electron Beam Damage in AES
5.1.2.6 Oxidation (18, 19),
Incident
5.1.2.7 Reduction (20),
Beam Dc,
5.1.2.8 Decomposition (21, 22), Material T Refs
4 2
Energy, 10 C/m
5.1.2.9 Erosion, and
keV
5.1.2.10 Diffusion.
Si N 2 stable . (26)
3 4
Al O 5103h (2)
2 3
5.1.3 Charge accumul
...
This document is not anASTM standard and is intended only to provide the user of anASTM standard an indication of what changes have been made to the previous version. Because
it may not be technically possible to adequately depict all changes accurately, ASTM recommends that users consult prior editions as appropriate. In all cases only the current version
of the standard as published by ASTM is to be considered the official document.
Designation:E983–05 Designation:E983–10
Standard Guide for
Minimizing Unwanted Electron Beam Effects in Auger
1
Electron Spectroscopy
This standard is issued under the fixed designation E983; the number immediately following the designation indicates the year of
original adoption or, in the case of revision, the year of last revision. A number in parentheses indicates the year of last reapproval. A
superscript epsilon (´) indicates an editorial change since the last revision or reapproval.
Note— Changes were made throughout and the year date changed on July 25, 2005.
1. Scope
1.1 This guide outlines the origins and manifestations of unwanted electron beam effects inAuger electron spectroscopy (AES).
1.2 Some general guidelines are provided concerning the electron beam parameters which are most likely to produce these
effects and suggestions are offered on how to minimize them.
1.3 General classes of materials are identified which are most likely to exhibit unwanted electron beam effects. In addition, a
tabulation of some specific materials which have been observed to undergo electron damage effects is provided.
1.4 A simple method is outlined for establishing the existence and extent of these effects during routine AES analysis.
1.5
1.5 The values stated in SI units are to be regarded as standard. No other units of measurement are included in this standard.
1.6 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility
of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory
limitations prior to use.
2. Referenced Documents
2
2.1 ASTM Standards:
E673 Terminology Relating to Surface Analysis
E996 Practice for Reporting Data in Auger Electron Spectroscopy and X-ray Photoelectron Spectroscopy
3. Terminology
3.1 See Terminology E673 for terms used in Auger electron spectroscopy.
NOTE 1—Electron beam effects and their consequences are widely referred to in the literature using any one or more of the following terms: electron
beam damage, sample damage, specimen damage, beam effects, electron beam induced processes, and electron irradiation effects.
4. Significance and Use
4.1 When electron beam excitation is used inAES, the incident electron beam can interact with the specimen material causing
physical and chemical changes. In general, these effects are a hindrance to AES analysis because they cause localized specimen
3
modification (1, 2, 3, 41-4).
4.2 With specimens that have poor electrical conductivity the electron beam can stimulate the development of localized charge
on the specimen surface. This effect is a hindrance to AES analysis because the potentials associated with the charge can either
adversely affect the integrity of Auger data or make Auger data collection difficult (5, 6).
5. Origins of Electron Beam Effects
5.1 Electron beam effects in AES may originate from one or more distinct processes.
5.1.1 Charge accumulation (57) (see Chapter 9) in materials with poor electrical conductivity leading to potentials that cause
distortion of Auger data or make AES data collection difficult by virtue of:
1
This guide is under the jurisdiction of ASTM Committee E42 on Surface Analysis and is the direct responsibility of Subcommittee E42.03 on Auger Electron
Spectroscopy and XPS.
CurrenteditionapprovedJuly25,2005.PublishedJuly2005.Originallyapprovedin1984.Lastpreviouseditionapprovedin2004asE983–04.DOI:10.1520/E0983-05.on
Auger Electron Spectroscopy and X-Ray Photoelectron Spectroscopy.
Current edition approved Nov. 1, 2010. Published December 2010. Originally approved in 1984. Last previous edition approved in 2005 as E983 – 05. DOI:
10.1520/E0983-10.
2
For referencedASTM standards, visit theASTM website, www.astm.org, or contactASTM Customer Service at service@astm.org. For Annual Book of ASTM Standards
volume information, refer to the standard’s Document Summary page on the ASTM website.
3
The boldface numbers in parentheses refer to the references listed at the end of this standard.
Copyright © ASTM International, 100 Barr Harbor Drive, PO Box C700, West Conshohocken, PA 19428-2959, United States.
1
---------------------- Page: 1 ----------------------
E983–10
5.1.1.1 Auger peak shift on energy scale.scale,
5.1.1.2 Auger peak shape and size distortion., and
5.1.1.3 Auger signal strength instability.
5.1.2 Electronic excitation of surface, subsurface, and bulk atoms and molecules leading to specimen changes (6-88-10) which
include:
5.1.2.1D
...
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