EN 62226-2-1:2005

Exposure to electric or magnetic fields in the low and intermediate frequency range - Methods for calculating the current density and internal electric field induced in the human body - Part 2-1: Exposure to magnetic fields - 2D models

This part of EN 62226 introduces the coupling factor K, to enable exposure assessment for complex exposure situations, such as non-uniform magnetic field or perturbed electric field. The coupling factor K has different physical interpretations depending on whether it relates to electric or magnetic field exposure. The aim of this part is to define in more detail this coupling factor K, for the case of simple models of the human body, exposed to non-uniform magnetic fields. It is thus called coupling factor for non-uniform magnetic field.

Sicherheit in elektrischen oder magnetischen Feldern im niedrigen und mittleren Frequenzbereich - Verfahren zur Berechnung der induzierten Körperstromdichte und des im menschlichen Körper induzierten elektrischen Feldes - Teil 2-1: Exposition gegenüber magnetischen Feldern - 2D-Modelle

Exposition aux champs électriques ou magnétiques à basse et moyenne fréquence - Méthodes de calcul des densités de courant induit et des champs électriques induits dans le corps humain - Partie 2-1: Exposition à des champs magnétiques - Modèles 2D

La présente partie de la EN 62226 introduit le facteur de couplage K, pour permettre l'évaluation de l'exposition dans des situations d'expositions complexes, telles que les champs magnétiques non uniformes ou les champs électriques perturbés. Le facteur de couplage K peut avoir différentes interprétations physiques selon qu'il se réfère à l'exposition à un champ électrique ou un champ magnétique. L'objet de cette partie est de définir plus en détail ce facteur de couplage K, pour les cas de modèles simples de corps humain, exposé à des champs magnétiques non uniformes. Dans le cas présent, il est appelé facteur de couplage pour champ magnétique non uniforme.

Izpostavljenost električnim in magnetnim poljem v nizkem in srednjem frekvenčnem obsegu – Metode za izračunavanje trenutne gostote in notranjega induciranega električnega polja v človeškem telesu – 2-1. del: Izpostavljenost magnetnim poljem – 2D model

General Information

• Status: Published
• Publication Date: 13-Jan-2005
• Withdrawal Date: 30-Nov-2007
• ICS: 17.220.20 - Measurement of electrical and magnetic quantities
• Technical Committee: CLC/TC 106X - Electromagnetic fields in the human environment
• Drafting Committee: IEC/TC 106 - IEC_TC_106
• Parallel Committee: IEC/TC 106 - IEC_TC_106
• Current Stage: 6060 - Document made available - Publishing
• Completion Date: 14-Jan-2005
• Ref Project: SIST EN 62226-2-1:2005 - Exposure to electric or magnetic fields in the low and intermediate frequency range - Methods for calculating the current density and internal electric field induced in the human body -- Part 2-1: Exposure to magnetic fields - 2D models

Standards Content (Sample)

SLOVENSKI SIST EN 62226-2-1:2005

STANDARD
junij 2005
Izpostavljenost električnim in magnetnim poljem v nizkem in srednjem
frekvenčnem obsegu – Metode za izračunavanje trenutne gostote in
notranjega induciranega električnega polja v človeškem telesu – 2-1. del:
Izpostavljenost magnetnim poljem – 2D model
Exposure to electric or magnetic fields in the low and intermediate frequency range –
Methods for calculating the current density and internal electric field induced in the
human body – Part 2-1: Exposure to magnetic fields – 2D models
ICS 13.280; 17.220.20 Referenčna številka
©  Standard je založil in izdal Slovenski inštitut za standardizacijo. Razmnoževanje ali kopiranje celote ali delov tega dokumenta ni dovoljeno

EUROPEAN STANDARD EN 62226-2-1
NORME EUROPÉENNE
EUROPÄISCHE NORM January 2005

ICS 17.220.20
English version
Exposure to electric or magnetic fields
in the low and intermediate frequency range –
Methods for calculating the current density
and internal electric field induced in the human body
Part 2-1: Exposure to magnetic fields –
2D models
(IEC 62226-2-1:2004)
Exposition aux champs électriques  Sicherheit in elektrischen oder
ou magnétiques à basse magnetischen Feldern im niedrigen und
et moyenne fréquence – mittleren Frequenzbereich –
Méthodes de calcul des densités Verfahren zur Berechnung der induzierten
de courant induit et des champs Körperstromdichte und des im
électriques induits dans le corps humain menschlichen Körper induzierten
Partie 2-1: Exposition à des champs elektrischen Feldes
magnétiques – Teil 2-1: Exposition gegenüber
Modèles 2D magnetischen Feldern –
(CEI 62226-2-1:2004) 2D-Modelle
(IEC 62226-2-1:2004)
This European Standard was approved by CENELEC on 2004-12-01. CENELEC members are bound to
comply with the CEN/CENELEC Internal Regulations which stipulate the conditions for giving this European
Standard the status of a national standard without any alteration.

Up-to-date lists and bibliographical references concerning such national standards may be obtained on
application to the Central Secretariat or to any CENELEC member.

This European Standard exists in three official versions (English, French, German). A version in any other
language made by translation under the responsibility of a CENELEC member into its own language and
notified to the Central Secretariat has the same status as the official versions.

CENELEC members are the national electrotechnical committees of Austria, Belgium, Cyprus, Czech
Republic, Denmark, Estonia, Finland, France, Germany, Greece, Hungary, Iceland, Ireland, Italy, Latvia,
Lithuania, Luxembourg, Malta, Netherlands, Norway, Poland, Portugal, Slovakia, Slovenia, Spain, Sweden,
Switzerland and United Kingdom.

CENELEC
European Committee for Electrotechnical Standardization
Comité Européen de Normalisation Electrotechnique
Europäisches Komitee für Elektrotechnische Normung

Central Secretariat: rue de Stassart 35, B - 1050 Brussels

© 2005 CENELEC - All rights of exploitation in any form and by any means reserved worldwide for CENELEC members.

Ref. No. EN 62226-2-1:2005 E
Foreword
The text of document 106/79/FDIS, future edition 1 of IEC 62226-2-1, prepared by IEC TC 106,
Methods for the assessment of electric, magnetic and electromagnetic fields associated with human
exposure, was submitted to the IEC-CENELEC parallel vote and was approved by CENELEC as
EN 62226-2-1 on 2004-12-01.
1)
This Part 2-1 is to be used in conjunction with EN 62226-1 .
The following dates were fixed:
– latest date by which the EN has to be implemented
at national level by publication of an identical
national standard or by endorsement (dop) 2005-09-01
– latest date by which the national standards conflicting
with the EN have to be withdrawn (dow) 2007-12-01
__________
Endorsement notice
The text of the International Standard IEC 62226-2-1:2004 was approved by CENELEC as a
European Standard without any modification.
__________
1)
To be published.
NORME CEI
INTERNATIONALE IEC
62226-2-1
INTERNATIONAL
Première édition
First edition
STANDARD
2004-11
Exposition aux champs électriques ou
magnétiques à basse et moyenne fréquence –
Méthodes de calcul des densités de courant
induit et des champs électriques induits
dans le corps humain –
Partie 2-1:
Exposition à des champs magnétiques –
Modèles 2D
Exposure to electric or magnetic fields
in the low and intermediate frequency range –
Methods for calculating the current density
and internal electric field induced
in the human body –
Part 2-1:
Exposure to magnetic fields – 2D models
© IEC 2004 Droits de reproduction réservés ⎯ Copyright - all rights reserved
Aucune partie de cette publication ne peut être reproduite ni No part of this publication may be reproduced or utilized in any
utilisée sous quelque forme que ce soit et par aucun procédé, form or by any means, electronic or mechanical, including
électronique ou mécanique, y compris la photocopie et les photocopying and microfilm, without permission in writing from
microfilms, sans l'accord écrit de l'éditeur. the publisher.
International Electrotechnical Commission, 3, rue de Varembé, PO Box 131, CH-1211 Geneva 20, Switzerland
Telephone: [phone] Telefax: [phone] E-mail: [e-mail] Web: www.iec.ch
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62226-2-1 ” IEC:2004 – 3 –
CONTENTS
FOREWORD.9
INTRODUCTION.13
1 Scope .15
2 Analytical models .15
2.1 General .15
2.2 Basic analytical models for uniform fields .17
3 Numerical models.19
3.1 General information about numerical models .19
3.2 2D models – General approach.21
3.3 Conductivity of living tissues .23
3.4 2D Models – Computation conditions .25
3.5 Coupling factor for non-uniform magnetic field.25
3.6 2D Models – Computation results.27
4 Validation of models .31
Annex A (normative) Disk in a uniform field .33
Annex B (normative) Disk in a field created by an infinitely long wire.39
Annex C (normative) Disk in a field created by 2 parallel wires with balanced currents .55
Annex D (normative) Disk in a magnetic field created by a circular coil .77
Annex E (informative) Simplified approach of electromagnetic phenomena.101
Annex F (informative) Analytical calculation of magnetic field created by simple
induction systems: 1 wire, 2 parallel wires with balanced currents and 1 circular coil.105
Annex G (informative) Equation and numerical modelling of electromagnetic
phenomena for a typical structure: conductive disk in electromagnetic field.109
Bibliography .113
Figure 1 – Conducting disk in a uniform magnetic flux density.17
nd
Figure 2 – Finite elements meshing (2 order triangles) of a disk, and detail .21
Figure 3 – Conducting disk in a non-uniform magnetic flux density.23
Figure 4 – Variation with distance to the source of the coupling factor for non-uniform
magnetic field, K, for the three magnetic field sources (disk radius R = 100 mm) .29
Figure A.1 – Current density lines J and distribution of J in the disk .33
Figure A.2 – J = f [r]: Spot distribution of induced current density calculated along a
diameter of a homogeneous disk in a uniform magnetic field.35
Figure A.3 – J = f [r]: Distribution of integrated induced current density calculated
i
along a diameter of a homogeneous disk in a uniform magnetic field.37
Figure B.1 – Disk in the magnetic field created by an infinitely straight wire .39
Figure B.2 – Current density lines J and distribution of J in the disk (source: 1 wire,
located at d = 10 mm from the edge of the disk).41

62226-2-1 ” IEC:2004 – 5 –
Figure B.3 – Spot distribution of induced current density along the diameter AA of the
disk (source: 1 wire, located at d = 10 mm from the edge of the disk).41
Figure B.4 – Distribution of integrated induced current density along the diameter AA
of the disk (source: 1 wire, located at d = 10 mm from the edge of the disk) .43
Figure B.5 – Current density lines J and distribution of J in the disk (source: 1 wire,
located at d = 100 mm from the edge of the disk).43
Figure B.6 – Distribution of integrated induced current density along the diameter AA
of the disk (source: 1 wire, located at d = 100 mm from the edge of the disk) .45
Figure B.7 – Parametric curve of factor K for distances up to 300 mm to a source
consisting of an infinitely long wire (disk: R = 100 mm) .47
Figure B.8 – Parametric curve of factor K for distances up to 1 900 mm to a source
consisting of an infinitely long wire (disk: R = 100 mm) .49
Figure B.9 – Parametric curve of factor K for distances up to 300 mm to a source
consisting of an infinitely long wire (disk: R = 200 mm) .51
Figure B.10 – Parametric curve of factor K for distances up to 1 900 mm to a source
consisting of an infinitely long wire (disk: R = 200 mm) .53
Figure C.1 – Conductive disk in the magnetic field generated by 2 parallel wires with
balanced currents .55
Figure C.2 – Current density lines J and distribution of J in the disk (source: 2 parallel
wires with balanced currents, separated by 5 mm, located at d = 7,5 mm from the
edge of the disk).57
Figure C.3 – J = f [r]: Distribution of integrated induced current density calculated
i
along the diameter AA of the disk (source: 2 parallel wires with balanced currents,
separated by 5 mm, located at d = 7,5 mm from the edge of the disk) .57
Figure C.4– Current density lines J and distribution of J in the disk (source: 2 parallel
wires with balanced currents separated by 5 mm, located at d = 97,5 mm from the
edge of the disk).59
Figure C.5 – J f [r]: Distribution of integrated induced current density calculated
i =
along the diameter AA of the disk (source: 2 parallel wires with balanced currents
separated by 5 mm, located at d = 97,5 mm from the edge of the disk).59
Figure C.6 – Parametric curves of factor K for distances up to 300 mm to a source
consisting of 2 parallel wires with balanced currents and for different distances e
between the 2 wires (homogeneous disk R = 100 mm) .61
Figure C.7 – Parametric curves of factor K for distances up to 1 900 mm to a source
consisting of 2 parallel wires with balanced currents and for different distances e
between the 2 wires (homogeneous disk R = 100 mm) .65
Figure C.8 – Parametric curves of factor K for distances up to 300 mm to a source
consisting of 2 parallel wires with balanced currents and for different distances e
between the 2 wires (homogeneous disk R = 200 mm) .69
Figure C.9 – Parametric curves of factor K for distances up to 1 900 mm to a source
consisting of 2 parallel wires with balanced currents and for different distances e
between the 2 wires (homogeneous disk R = 200 mm) .73
Figure D.1 – Conductive disk in a magnetic field created by a coil.77
Figure D.2 –Current density lines J and distribution of J in the disk (source: coil of
radius r = 50 mm, conductive disk R = 100 mm, d = 5 mm).79
Figure D.3 – J = f [r]: Distribution of integrated induced current density calculated
i
along the diameter AA of the disk (source: coil of radius r = 50 mm, conductive disk
R = 100 mm, d = 5 mm) .79
Figure D.4 – Current density lines J and distribution of J in the disk (source: coil of
radius r = 200 mm, conductive disk R = 100 mm, d = 5 mm).
...