Nanotechnologies — Vocabulary — Part 8: Nanomanufacturing processes

ISO/TS 80004-8:2013 gives terms and definitions related to nanomanufacturing processes in the field of nanotechnologies. It forms one part of multi-part terminology and definitions documentation covering the different aspects of nanotechnologies.

Nanotechnologies — Vocabulaire — Partie 8: Processus de nanofabrication

L'ISO/TS 80004-8:2013 donne les termes et définitions concernant les processus de nanofabrication dans le domaine des nanotechnologies. Elle ne constitue qu'une partie d'une documentation de terminologie et de définitions, en plusieurs parties, couvrant les différents aspects des nanotechnologies.

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Publication Date
09-Dec-2013
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09-Dec-2013
Current Stage
9599 - Withdrawal of International Standard
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19-Nov-2020
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TECHNICAL ISO/TS
SPECIFICATION 80004-8
First edition
2013-12-15
Nanotechnologies — Vocabulary —
Part 8:
Nanomanufacturing processes
Nanotechnologies — Vocabulaire —
Partie 8: Processus de nanofabrication
Reference number
ISO/TS 80004-8:2013(E)
©
ISO 2013

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ISO/TS 80004-8:2013(E)

COPYRIGHT PROTECTED DOCUMENT
© ISO 2013
All rights reserved. Unless otherwise specified, no part of this publication may be reproduced or utilized otherwise in any form
or by any means, electronic or mechanical, including photocopying, or posting on the internet or an intranet, without prior
written permission. Permission can be requested from either ISO at the address below or ISO’s member body in the country of
the requester.
ISO copyright office
Case postale 56 • CH-1211 Geneva 20
Tel. + 41 22 749 01 11
Fax + 41 22 749 09 47
E-mail copyright@iso.org
Web www.iso.org
Published in Switzerland
ii © ISO 2013 – All rights reserved

---------------------- Page: 2 ----------------------
ISO/TS 80004-8:2013(E)

Contents Page
Foreword .iv
Introduction .vi
1 Scope . 1
2 Terms and definitions from other parts of ISO/TS 80004 . 1
3 General terms . 3
4 Directed assembly . 4
5 Self-assembly processes . 4
6 Synthesis . 5
6.1 Gas process phase — Physical methods . 5
6.2 Gas process phase — Chemical methods . 6
6.3 Liquid process phase — Physical methods . 7
6.4 Liquid process phase — Chemical methods . 8
6.5 Solid process phase — Physical methods . 8
6.6 Solid process phase — Chemical methods .10
7 Fabrication .11
7.1 Nanopatterning lithography .11
7.2 Deposition processes .14
7.3 Etching processes .16
7.4 Printing and coating .18
Annex A (informative) Identification of output resulting from defined synthesis processes .19
Annex B (informative) Index .21
Bibliography .27
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ISO/TS 80004-8:2013(E)

Foreword
ISO (the International Organization for Standardization) is a worldwide federation of national standards
bodies (ISO member bodies). The work of preparing International Standards is normally carried out
through ISO technical committees. Each member body interested in a subject for which a technical
committee has been established has the right to be represented on that committee. International
organizations, governmental and non-governmental, in liaison with ISO, also take part in the work.
ISO collaborates closely with the International Electrotechnical Commission (IEC) on all matters of
electrotechnical standardization.
The procedures used to develop this document and those intended for its further maintenance are
described in the ISO/IEC Directives, Part 1. In particular the different approval criteria needed for the
different types of ISO documents should be noted. This document was drafted in accordance with the
editorial rules of the ISO/IEC Directives, Part 2. www.iso.org/directives
Attention is drawn to the possibility that some of the elements of this document may be the subject of
patent rights. ISO shall not be held responsible for identifying any or all such patent rights. Details of any
patent rights identified during the development of the document will be in the Introduction and/or on
the ISO list of patent declarations received. www.iso.org/patents
Any trade name used in this document is information given for the convenience of users and does not
constitute an endorsement.
For an explanation on the meaning of ISO specific terms and expressions related to conformity
assessment, as well as information about ISO’s adherence to the WTO principles in the Technical
Barriers to Trade (TBT) see the following URL: Foreword - Supplementary information
ISO/TS 80004-8 was prepared jointly by Technical Committee ISO/TC 229, Nanotechnologies, and Technical
Committee IEC/TC 113, Nanotechnology standardization for electrical and electronic products and systems.
Documents in the 80000 to 89999 range of reference numbers are developed by collaboration
between ISO and IEC.
ISO/TS 80004 consists of the following parts, under the general title Nanotechnologies — Vocabulary:
— Part 1: Core terms
— Part 3: Carbon nano-objects
— Part 4: Nanostructured materials
— Part 5: Nano/bio interface
— Part 6: Nano-object characterization
— Part 7: Diagnostics and therapeutics for healthcare
— Part 8: Nanomanufacturing processes
The following parts are under preparation:
1)
— Part 2: Nano-objects: Nanoparticle, nanofibre and nanoplate
— Part 9: Nano-enabled electrotechnical products and systems
— Part 10: Nano-enabled photonic components and systems
— Part 11: Nanolayer, nanocoating, nanofilm, and related terms
— Part 12: Quantum phenomena in nanotechnology
[5]
1) Revises and replaces ISO/TS 27687 .
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Graphene and other two-dimensional materials is to form the subject of a future part 13.
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ISO/TS 80004-8:2013(E)

Introduction
Nanomanufacturing is the essential bridge between the discoveries of the nanosciences and real-world
nanotechnology products.
Advancing nanotechnology from the laboratory into volume production ultimately requires careful
study of manufacturing process issues including product design, reliability and quality, process design
and control, shop floor operations, supply chain management, workplace safety and health practices
during the production, use, and handling of nanomaterials. Nanomanufacturing encompasses directed
self assembly and assembly techniques, synthetic methodologies, and fabrication processes such as
lithography and biological processes. Nanomanufacturing also includes bottom-up directed assembly,
top-down high resolution processing, molecular systems engineering, and hierarchical integration with
larger scale systems. As dimensional scales of materials and molecular systems approach the nanoscale,
the conventional rules governing their behaviour may change significantly. As such, the behaviour of a
final product is enabled by the collective performance of its nanoscale building blocks.
Biological process terms are not included in this first edition of the nanomanufacturing vocabulary, but
considering the rapid development of the field, it is expected that terms in this important area will be
added in a future update to this Technical Specification or in companion documents in the 80004 series.
This could include both the processing of biological nanomaterials and the use of biological processes to
manufacture materials at the nanoscale.
Similarly, additional terms from other developing areas of nanomanufacturing, including composite
manufacturing, roll-to-roll manufacturing, and others, will be included in future documents.
There is a distinction between the terms nanomanufacturing and nanofabrication. Nanomanufacturing
encompasses a broader range of processes than does nanofabrication. Nanomanufacturing
encompasses all nanofabrication techniques and also techniques associated with materials processing
and chemical synthesis.
This document provides an introduction to processes used in the early stages of the nanomanufacturing
value chain, namely the intentional synthesis, generation or control of nanomaterials, including
fabrication steps in the nanoscale. The nanomaterials that result from these manufacturing processes
are distributed in commerce where, for example, they may be further purified, be compatabilized to
be dispersed in mixtures or composite matrices, or serve as integrated components of systems and
devices. The nanomanufacturing value chain is, in actuality, a large and diverse group of commercial
value chains that stretch across these sectors:
— the semiconductor industry (where the push to create smaller, faster, and more efficient
microprocessors heralded the creation of circuitry less than 100 nm in size);
— electronics and telecommunications;
— aerospace, defence, and national security;
— energy and automotive;
— plastics and ceramics;
— forest and paper products;
— food and food packaging;
— pharmaceuticals, biomedicine, and biotechnology;
— environmental remediation;
— clothing and personal care.
There are thousands of tonnes of nanomaterials on the market with end use applications in several of
these sectors, such as carbon black and fumed silica. Nanomaterials which are rationally designed with
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ISO/TS 80004-8:2013(E)

specific purpose are expected to radically change the landscape in areas such as biotechnology, water
purification, and energy development.
The majority of sections in this document are organized by process type. In the case of section 6, the logic
of placement is as follows: in the step before the particle is made, the material itself is in a gas/liquid/
solid phase. The phase of the substrate or carrier in the process does not drive the categorization of
the process. As an example, consider iron particles that are catalysts in a process by which you seed oil
with iron particles, the oil vaporizes and condenses forming carbon particles on the iron particles. What
vaporizes is the oil, and therefore it is a gas phase process. Nanotubes grown from the gas phase, starting
with catalyst particles that react with the gas phase to grow the nanotubes, thus this is characterized
as a gas process. Indication of whether synthesis processes are used to manufacture nano-objects,
nanoparticles, or both, is provided in Annex A.
A common understanding of the terminology used in practical applications will enable communities of
practice in nanomanufacturing and will advance nanomanufacturing strength worldwide. Extending
the understanding of terms across the existing manufacturing infrastructure will serve to bridge
the transition between the innovations of the research laboratory and the economic viability of
nanotechnologies.
For informational terms supportive of nanomanufacturing terminology, see Reference [1].
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TECHNICAL SPECIFICATION ISO/TS 80004-8:2013(E)
Nanotechnologies — Vocabulary —
Part 8:
Nanomanufacturing processes
1 Scope
This Technical Specification gives terms and definitions related to nanomanufacturing processes in the
field of nanotechnologies. It forms one part of multi-part terminology and definitions documentation
covering the different aspects of nanotechnologies.
All the process terms in this document are relevant to nanomanufacturing. Many of the listed processes
are not exclusively relevant to the nanoscale. Depending on controllable conditions, such processes may
result in material features at the nanoscale or, alternatively, larger scales.
There are many other terms that name tools, components, materials, systems control methods or
metrology methods associated with nanomanufacturing that are beyond the scope of this document.
2 Terms and definitions from other parts of ISO/TS 80004
The terms and definitions in this clause are given in other parts of ISO/TS 80004. They are reproduced
here for context and better understanding.
2.1
carbon nanotube
CNT
nanotube (2.9) composed of carbon
Note 1 to entry: carbon nanotubes usually consist of curved graphene layers, including single-wall carbon
nanotubes and multiwall carbon nanotubes.
[SOURCE: ISO/TS 80004-3:2010, 4.3.]
2.2
nanocomposite
solid comprising a mixture of two or more phase-separated materials, one or more being nanophase
Note 1 to entry: Gaseous nanophases are excluded (they are covered by nanoporous material).
Note 2 to entry: Materials with nanoscale (2.7) phases formed by precipitation alone are not considered to be
nanocomposite materials.
[SOURCE: ISO/TS 80004-4:2011, 3.2.]
2.3
nanofibre
nano-object with two similar external dimensions in the nanoscale (2.7) and the third dimension
significantly larger
Note 1 to entry: A nanofibre can be flexible or rigid.
Note 2 to entry: The two similar external dimensions are considered to differ in size by less than three times and
the significantly larger external dimension is considered to differ from the other two by more than three times.
Note 3 to entry: The largest external dimension is not necessarily in the nanoscale (2.7).
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ISO/TS 80004-8:2013(E)

[SOURCE: ISO/TS 27687:2008, 4.3.]
2.4
nanomaterial
material with any external dimension in the nanoscale (2.7) or having internal structure or surface
structure in the nanoscale
Note 1 to entry: This generic term is inclusive of nano-object (2.5) and nanostructured material (2.9).
Note 2 to entry: See also engineered nanomaterial, manufactured nanomaterial and incidental nanomaterial
[SOURCE: ISO/TS 80004-1:2010, 2.4.]
2.5
nano-object
material with one, two or three external dimensions in the nanoscale (2.7)
Note 1 to entry: Generic term for all discrete nano-objects.
[SOURCE: ISO/TS 80004-1:2010, 2.5.]
2.6
nanoparticle
nano-object (2.5) with all three external dimensions in the nanoscale (2.7)
Note 1 to entry: if the lengths of the longest to the shortest axes of the nano-object (2.5) differ significantly
(typically by more than three times), the terms nanofibre (2.3) or nanoplate are intended to be used instead of the
term nanoparticle.
[SOURCE: ISO/TS 27687:2008, 4.1.]
2.7
nanoscale
size range from approximately 1 nm to 100 nm
Note 1 to entry: Properties that are not extrapolations from a larger size will typically, but not exclusively, be
exhibited in this size range. For such properties the size limits are considered approximate.
Note 2 to entry: The lower limit in this definition (approximately 1 nm) is introduced to avoid single and small
groups of atoms from being designated as nano-objects (2.5) or elements of nanostructures, which might be
implied by the absence of a lower limit.
[SOURCE: ISO/TS 80004-1:2010, 2.1.]
2.8
nanostructured material
material having internal or surface structure in the nanoscale (2.7)
Note 1 to entry: If external dimensions are in the nanoscale, the term nano-object (2.4) is recommended.
Note 2 to entry: Adapted from ISO/TS 80004-1:2010, definition 2.7.
[SOURCE: ISO/TS 80004-4, 2.11.]
2.9
nanotube
hollow nanofibre (2.3)
[SOURCE: ISO/TS 27687:2008, 4.4]
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ISO/TS 80004-8:2013(E)

3 General terms
3.1
bottom up nanomanufacturing
processes that use small fundamental units in the nanoscale (2.7) to create larger functionally rich
structures or assemblies
3.2
co-deposition
simultaneous deposition of two or more source materials
Note 1 to entry: Common methods include vacuum, thermal spray, electrodeposition and liquid suspension
deposition techniques.
3.3
communition
crushing or grinding for particle size reduction
3.4
directed assembly
formation of a structure guided by external intervention using components at the
nanoscale (2.7) that can, in principle, have any defined pattern
3.5
directed self-assembly
self-assembly (3.11) influenced by external intervention to produce a preferred structure, orientation or
pattern
Note 1 to entry: Examples of external intervention include an applied field, a chemical or structural template,
chemical gradient, and fluidic flow.
3.6
lithography
reproducible creation of a pattern
Note 1 to entry: The pattern can be formed in a radiation sensitive material or by transfer of material onto a
substrate either by transfer, by printing or by direct writing.
3.7
multilayer deposition
alternating deposition of two or more source materials to produce a composite layer structure
3.8
nanofabrication
ensemble of activities, to intentionally manufacture devices in the nanoscale (2.7), for commercial purpose
3.9
nanomanufacturing
intentional synthesis, generation or control of nanomaterials, or fabrication steps in the nanoscale (2.7),
for commercial purpose
[SOURCE: ISO/TS 80004-1:2010, definition 2.11.]
3.10
nanomanufacturing process
ensemble of activities to intentionally synthesize, generate or control nanomaterials (2.4), or fabrication
steps in the nanoscale (2.7), for commercial purpose
[SOURCE: ISO/TS 80004-1:2010, 2.12.]
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ISO/TS 80004-8:2013(E)

3.11
self-assembly
autonomous action by which components organize themselves into patterns or structures
3.12
surface functionalization
chemical process that acts upon a surface to impart a selected chemical or physical functionality
3.13
top-down nanomanufacturing
processes that create structures at the nanoscale (2.7) from macroscopic objects
4 Directed assembly
4.1
electrostatic driven assembly
use of electrostatic force to orient or place nanoscale (2.7) elements in a device or
material
4.2
fluidic alignment
use of fluid flow to orient nanoscale (2.7) elements in a device or material
4.3
hierarchical assembly
use of more than one type of nanomanufacturing (3.9) process to control structure
at multiple length scales
4.4
magnetic driven assembly
use of magnetic force to assemble at the nanoscale (2.7) in a desired pattern or
configuration
4.5
shape-based assembly
use of geometric shapes of nanoparticles (2.6) to achieve a desired pattern or
configuration
4.6
supramolecular assembly
use of non-covalent chemical bonding to assemble molecules or nanoparticles (2.6) with surface ligands
4.7
surface-to-surface transfer
transfer of nanoparticles (2.6) or structures from the surface of one substrate, on
which they have been deposited, grown or assembled, onto another substrate
5 Self-assembly processes
5.1
colloidal crystallization
sedimentation of nanoparticles (2.6) from a solution to form a solid which consists
of a close-packed, ordered array of repeating units
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ISO/TS 80004-8:2013(E)

5.2
graphioepitaxy
directed self-assembly (3.5) using nanoscale (2.7) topographical features
Note 1 to entry: Includes the growth of a thin layer on the surface and growth of an additional layer on top of a
substrate which has the same or different structure as the underlying crystal.
5.3
ion beam surface reconstruction
use of an accelerated ion beam to cause surface modification which may be at the
nanoscale (2.7)
5.4
Langmuir-Blodgett film formation
creation of a molecular monolayer at an air-liquid interface using a Langmuir-Blodgett trough
5.5
Langmuir-Blodgett film transfer
transfer of a Langmuir-Blodgett molecular monolayer formed at an air-liquid interface onto a solid
surface by dipping a solid substrate into the supporting liquid
5.6
layer-by-layer deposition
LbL deposition
electrostatic process of depositing polyelectrolytes with opposite charges laid over or under another
5.7
modulated elemental reactant method
use of vapour deposited precursors with regions of controlled composition as a template for the
formation of interleaved layers of two or more structures
5.8
self-assembled monolayer formation
SAM formation
spontaneous formation of an organized molecular layer on a solid surface from solution or the vapour
phase, driven by molecule-to-surface bonding and weak intermolecular interaction
5.9
Stranski-Krastanow growth
mode of thin film growth in which both layer and island formation mechanisms are present
6 Synthesis
6.1 Gas process phase — Physical methods
6.1.1
cold gas dynamic spraying
to fluidize either nanoscale (2.7) crystalline powders or conventional powders that are then consolidated
onto a surface coating in a high velocity inert gas
6.1.2
electron-beam evaporation
process in which a material is vaporized by incidence of high energy electrons in high or ultra-high
vacuum conditions for subsequent deposition onto a substrate
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6.1.3 Electro-spark deposition processes
6.1.3.1
electro-spark deposition
pulsed-arc micro-welding process using short-duration, high-current electrical pulses to deposit an
electrode material on a substrate
6.1.4 Spray drying processes
6.1.4.1
freeze drying
dehydration or solvent removal by rapid cooling immediately followed by vacuum sublimation
6.1.4.2
spray drying
producing a dry powder from a liquid or slurry by rapid removal of liquid droplets via contact with a hot gas
6.1.5
supercritical expansion
precipitation of nano-objects (2.5) resulting from an expansion of a solution above its critical temperature
(T ) and critical pressure (P ) through a spray device
C C
6.1.6
suspension combustion thermal spray
thermal spray (7.2.16) in which the precursor is introduced to a plasma jet in the form of a liquid suspension
6.1.7
wire electric explosion
formation of nanoparticles (2.6) by applying an electrical pulse of high current density through a wire
causing it to volatilize with subsequent recondensation
6.1.8
vaporization
process of assisted change of phase from solid or liquid to gas or plasma phases
Note 1 to entry: Vaporization process is often used to consequently deposit the vaporized material on a target
[7]
substrate. The whole process is known as PVD (ISO 2080:2008, 2.12) .
−6 −9
Note 2 to entry: High Vacuum PVD is usually performed at pressures in the range of 10 to 10 Torr. Ultra-High
−9
Vacuum (UHV PVD) is the deposition performed at pressures below 10 Torr.
6.2 Gas process phase — Chemical methods
6.2.1 Flame synthesis processes
6.2.1.1
liquid precursor combustion
creation of solid product, typically a nanomaterial (2.4) in aggregate form, via exothermic reaction of a
feedstock solution with an oxidizer
[SOURCE: ISO 19353, 3.3, modified.]
6.2.1.2
plasma spray
creation of a jet of solid product, typically a nanomaterial (2.4) in aggregate form from an ionized
gaseous source
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6.2.1.3
pyrogenesis
using combustion or other heat source to produce solid product, typically a nanomaterial (2.4) in
aggregate form facilitated by an aerosolized spray
6.2.1.4
solution precursor plasma spray
gas phase process in which a thermal (equilibrium) plasma is formed into which a solution containing
precursors is introduced resulting in gaseous species that during cooling form a solid product, typically
a nanomaterial (2.4) in aggregate form
6.2.1.5
thermal spray pyrolysis
creation of solid product, typically a nanomaterial (2.4) in aggregate form from liquid precursors through
liquid atomization and reaction using a thermal source
6.2.2
hot wall tubular reaction
chemical vapour deposition (7.2.3) performed in a tubular furnace in which the reaction surface is
maintained at a controlled elevated temperature
6.2.3
photothermal synthesis
gas phase process where a precursor or other gaseous species is heated by absorption of infrared
radiation resulting in heating of the gas and thermal decomposition of the precursor producing a solid
product, typically a nanoparticle (2.6)
6.2.4
vapour-liquid-solid nanofibre synthesis
VLS
growth of nanofibres (2.3) onto a substrate with feed material in gaseous form in the presence of a
liquid catalyst
Note 1 to entry: The VLS method for fibres exploits a liquid phase on the end of a fibre which can rapidly adsorb a
vapour to supersaturation levels, and from which crystal growth subsequently occurs.
6.3 Liquid process phase — Physical methods
6.3.1
electrospinning
use of electrical potential to induce drawing of fine fibres from a liquid phase
6.3.2
in-situ intercalative polymerization
insertion of monomers into layered inorganic materials followed by polymerization which result in
nanocomposites (2.2)
6.3.3
nanoparticle dispersion
creating a suspension of nanoparticles (2.6) in a liquid through molecular ligands, surface charges or
other interactions to prevent or slow sedimentation
6.3.5
tape casting
deposition of macroscopic layer by spreading slurry of ceramic paste onto a flat surface
Note 1 to entry: Nanoparticles (2.6) may be part of the composition of the layer.
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6.3.6
wet ball milling
grinding (6.5.5) process in liquid via rolling feedstock material with crushing balls of greater hardness
to create a force of impact in order to reduce the size of target components
Note 1 to entry: The product of the process is known as slurry.
6.4 Liquid process phase — Chemical methods
6.4.1
acid hydrolysis of cellulose
use of an acid to release nanocrystalline cellulose from cellulose
6.4.2
nanoparticle precipitation
formation of nanoparticles (2.6) from solution reactions where particle size may be controlled by
kinetic factors
6.4.3
prompt inorganic condensation
formation of atomically smooth and dense films by spin-coating (7.2.17) and low-temperature curing of
organic free aqueous solutions based on organometallic molecular precursors
6.4.4
reverse micelle process
synthesis of nanoparticles (2.6) in solution using reagents in the presence of reaction stopping ligands
that attach to the nanoparticle surface and inhibit further growth
6.4.5
sol-gel processing
conversion of a chemical solution or colloidal suspension (sol) to an integrated network (gel), which can
then be further densified
6.4.6
surfactant templating
use of surfactants to self-assemble molecular species such that they can be subsequently solidified in a
structured configuration at the nanoscale (2.7)
EXAMPLE MCM 41.
6.4.7
Stober process
generation of particles of silicate by using a tetra-alkyl orthosilicate and a combination of low molecular
weight alcohol and ammonia, used with or without water
Note 1 to entry: This is a sol-gel processing (6.4.5) method for synthesizing silica.
6.5 Solid process phase — Physical methods
6.5.1 Block copolymer processes
6.5.1.1
block copolymer phase segregation
fo
...

TECHNICAL ISO/TS
SPECIFICATION 80004-8
First edition
Nanotechnologies — Vocabulary —
Part 8:
Nanomanufacturing processes
Nanotechnologies — Vocabulaire —
Partie 8: Processus de nanofabrication
PROOF/ÉPREUVE
Reference number
ISO/TS 80004-8:2013(E)
©
ISO 2013

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ISO/TS 80004-8:2013(E)

COPYRIGHT PROTECTED DOCUMENT
© ISO 2013
All rights reserved. Unless otherwise specified, no part of this publication may be reproduced or utilized otherwise in any form
or by any means, electronic or mechanical, including photocopying, or posting on the internet or an intranet, without prior
written permission. Permission can be requested from either ISO at the address below or ISO’s member body in the country of
the requester.
ISO copyright office
Case postale 56 • CH-1211 Geneva 20
Tel. + 41 22 749 01 11
Fax + 41 22 749 09 47
E-mail copyright@iso.org
Web www.iso.org
Published in Switzerland
ii PROOF/ÉPREUVE © ISO 2013 – All rights reserved

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ISO/TS 80004-8:2013(E)

Contents Page
Foreword .iv
Introduction .vi
1 Scope . 1
2 Terms and definitions from other parts of ISO/TS 80004 . 1
3 General terms . 3
4 Directed assembly . 4
5 Self-assembly processes . 4
6 Synthesis . 5
6.1 Gas process phase — Physical methods . 5
6.2 Gas process phase — Chemical methods . 6
6.3 Liquid process phase — Physical methods . 7
6.4 Liquid process phase — Chemical methods . 8
6.5 Solid process phase — Physical methods . 8
6.6 Solid process phase — Chemical methods .10
7 Fabrication .11
7.1 Nanopatterning lithography .11
7.2 Deposition processes .14
7.3 Etching processes .16
7.4 Printing and coating .18
Annex A (informative) Identification of output resulting from defined synthesis processes .19
Annex B (informative) Index .21
Bibliography .27
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ISO/TS 80004-8:2013(E)

Foreword
ISO (the International Organization for Standardization) is a worldwide federation of national standards
bodies (ISO member bodies). The work of preparing International Standards is normally carried out
through ISO technical committees. Each member body interested in a subject for which a technical
committee has been established has the right to be represented on that committee. International
organizations, governmental and non-governmental, in liaison with ISO, also take part in the work.
ISO collaborates closely with the International Electrotechnical Commission (IEC) on all matters of
electrotechnical standardization.
The procedures used to develop this document and those intended for its further maintenance are
described in the ISO/IEC Directives, Part 1. In particular the different approval criteria needed for the
different types of ISO documents should be noted. This document was drafted in accordance with the
editorial rules of the ISO/IEC Directives, Part 2. www.iso.org/directives
Attention is drawn to the possibility that some of the elements of this document may be the subject of
patent rights. ISO shall not be held responsible for identifying any or all such patent rights. Details of any
patent rights identified during the development of the document will be in the Introduction and/or on
the ISO list of patent declarations received. www.iso.org/patents
Any trade name used in this document is information given for the convenience of users and does not
constitute an endorsement.
For an explanation on the meaning of ISO specific terms and expressions related to conformity
assessment, as well as information about ISO’s adherence to the WTO principles in the Technical
Barriers to Trade (TBT) see the following URL: Foreword - Supplementary information
ISO/TS 80004-8 was prepared jointly by Technical Committee ISO/TC 229, Nanotechnologies, and Technical
Committee IEC/TC 113, Nanotechnology standardization for electrical and electronic products and systems.
Documents in the 80000 to 89999 range of reference numbers are developed by collaboration
between ISO and IEC.
ISO/TS 80004 consists of the following parts, under the general title Nanotechnologies — Vocabulary:
— Part 1: Core terms
— Part 3: Carbon nano-objects
— Part 4: Nanostructured materials
— Part 5: Nano/bio interface
— Part 6: Nano-object characterization
— Part 7: Diagnostics and therapeutics for healthcare
— Part 8: Nanomanufacturing processes
The following parts are under preparation:
1)
— Part 2: Nano-objects: Nanoparticle, nanofibre and nanoplate
— Part 9: Nano-enabled electrotechnical products and systems
— Part 10: Nano-enabled photonic components and systems
— Part 11: Nanolayer, nanocoating, nanofilm, and related terms
— Part 12: Quantum phenomena in nanotechnology
[5]
1) Revises and replaces ISO/TS 27687 .
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Graphene and other two-dimensional materials is to form the subject of a future part 13.
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Introduction
Nanomanufacturing is the essential bridge between the discoveries of the nanosciences and real-world
nanotechnology products.
Advancing nanotechnology from the laboratory into volume production ultimately requires careful
study of manufacturing process issues including product design, reliability and quality, process design
and control, shop floor operations, supply chain management, workplace safety and health practices
during the production, use, and handling of nanomaterials. Nanomanufacturing encompasses directed
self assembly and assembly techniques, synthetic methodologies, and fabrication processes such as
lithography and biological processes. Nanomanufacturing also includes bottom-up directed assembly,
top-down high resolution processing, molecular systems engineering, and hierarchical integration with
larger scale systems. As dimensional scales of materials and molecular systems approach the nanoscale,
the conventional rules governing their behaviour may change significantly. As such, the behaviour of a
final product is enabled by the collective performance of its nanoscale building blocks.
Biological process terms are not included in this first edition of the nanomanufacturing vocabulary, but
considering the rapid development of the field, it is expected that terms in this important area will be
added in a future update to this Technical Specification or in companion documents in the 80004 series.
This could include both the processing of biological nanomaterials and the use of biological processes to
manufacture materials at the nanoscale.
Similarly, additional terms from other developing areas of nanomanufacturing, including composite
manufacturing, roll-to-roll manufacturing, and others, will be included in future documents.
There is a distinction between the terms nanomanufacturing and nanofabrication. Nanomanufacturing
encompasses a broader range of processes than does nanofabrication. Nanomanufacturing
encompasses all nanofabrication techniques and also techniques associated with materials processing
and chemical synthesis.
This document provides an introduction to processes used in the early stages of the nanomanufacturing
value chain, namely the intentional synthesis, generation or control of nanomaterials, including
fabrication steps in the nanoscale. The nanomaterials that result from these manufacturing processes
are distributed in commerce where, for example, they may be further purified, be compatabilized to
be dispersed in mixtures or composite matrices, or serve as integrated components of systems and
devices. The nanomanufacturing value chain is, in actuality, a large and diverse group of commercial
value chains that stretch across these sectors:
— the semiconductor industry (where the push to create smaller, faster, and more efficient
microprocessors heralded the creation of circuitry less than 100 nm in size);
— electronics and telecommunications;
— aerospace, defence, and national security;
— energy and automotive;
— plastics and ceramics;
— forest and paper products;
— food and food packaging;
— pharmaceuticals, biomedicine, and biotechnology;
— environmental remediation;
— clothing and personal care.
There are thousands of tonnes of nanomaterials on the market with end use applications in several of
these sectors, such as carbon black and fumed silica. Nanomaterials which are rationally designed with
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specific purpose are expected to radically change the landscape in areas such as biotechnology, water
purification, and energy development.
The majority of sections in this document are organized by process type. In the case of section 6, the logic
of placement is as follows: in the step before the particle is made, the material itself is in a gas/liquid/
solid phase. The phase of the substrate or carrier in the process does not drive the categorization of
the process. As an example, consider iron particles that are catalysts in a process by which you seed oil
with iron particles, the oil vaporizes and condenses forming carbon particles on the iron particles. What
vaporizes is the oil, and therefore it is a gas phase process. Nanotubes grown from the gas phase, starting
with catalyst particles that react with the gas phase to grow the nanotubes, thus this is characterized
as a gas process. Indication of whether synthesis processes are used to manufacture nano-objects,
nanoparticles, or both, is provided in Annex A.
A common understanding of the terminology used in practical applications will enable communities of
practice in nanomanufacturing and will advance nanomanufacturing strength worldwide. Extending
the understanding of terms across the existing manufacturing infrastructure will serve to bridge
the transition between the innovations of the research laboratory and the economic viability of
nanotechnologies.
For informational terms supportive of nanomanufacturing terminology, see Reference [1].
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TECHNICAL SPECIFICATION ISO/TS 80004-8:2013(E)
Nanotechnologies — Vocabulary —
Part 8:
Nanomanufacturing processes
1 Scope
This Technical Specification gives terms and definitions related to nanomanufacturing processes in the
field of nanotechnologies. It forms one part of multi-part terminology and definitions documentation
covering the different aspects of nanotechnologies.
All the process terms in this document are relevant to nanomanufacturing. Many of the listed processes
are not exclusively relevant to the nanoscale. Depending on controllable conditions, such processes may
result in material features at the nanoscale or, alternatively, larger scales.
There are many other terms that name tools, components, materials, systems control methods or
metrology methods associated with nanomanufacturing that are beyond the scope of this document.
2 Terms and definitions from other parts of ISO/TS 80004
The terms and definitions in this clause are given in other parts of ISO/TS 80004. They are reproduced
here for context and better understanding.
2.1
carbon nanotube
CNT
nanotube (2.9) composed of carbon
Note 1 to entry: carbon nanotubes usually consist of curved graphene layers, including single-wall carbon
nanotubes and multiwall carbon nanotubes.
[SOURCE: ISO/TS 80004-3:2010, 4.3.]
2.2
nanocomposite
solid comprising a mixture of two or more phase-separated materials, one or more being nanophase
Note 1 to entry: Gaseous nanophases are excluded (they are covered by nanoporous material).
Note 2 to entry: Materials with nanoscale (2.7) phases formed by precipitation alone are not considered to be
nanocomposite materials.
[SOURCE: ISO/TS 80004-4:2011, 3.2.]
2.3
nanofibre
nano-object with two similar external dimensions in the nanoscale (2.7) and the third dimension
significantly larger
Note 1 to entry: A nanofibre can be flexible or rigid.
Note 2 to entry: The two similar external dimensions are considered to differ in size by less than three times and
the significantly larger external dimension is considered to differ from the other two by more than three times.
Note 3 to entry: The largest external dimension is not necessarily in the nanoscale (2.7).
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[SOURCE: ISO/TS 27687:2008, 4.3.]
2.4
nanomaterial
material with any external dimension in the nanoscale (2.7) or having internal structure or surface
structure in the nanoscale
Note 1 to entry: This generic term is inclusive of nano-object (2.5) and nanostructured material (2.9).
Note 2 to entry: See also engineered nanomaterial, manufactured nanomaterial and incidental nanomaterial
[SOURCE: ISO/TS 80004-1:2010, 2.4.]
2.5
nano-object
material with one, two or three external dimensions in the nanoscale (2.7)
Note 1 to entry: Generic term for all discrete nano-objects.
[SOURCE: ISO/TS 80004-1:2010, 2.5.]
2.6
nanoparticle
nano-object (2.5) with all three external dimensions in the nanoscale (2.7)
Note 1 to entry: if the lengths of the longest to the shortest axes of the nano-object (2.5) differ significantly
(typically by more than three times), the terms nanofibre (2.3) or nanoplate are intended to be used instead of the
term nanoparticle.
[SOURCE: ISO/TS 27687:2008, 4.1.]
2.7
nanoscale
size range from approximately 1 nm to 100 nm
Note 1 to entry: Properties that are not extrapolations from a larger size will typically, but not exclusively, be
exhibited in this size range. For such properties the size limits are considered approximate.
Note 2 to entry: The lower limit in this definition (approximately 1 nm) is introduced to avoid single and small
groups of atoms from being designated as nano-objects (2.5) or elements of nanostructures, which might be
implied by the absence of a lower limit.
[SOURCE: ISO/TS 80004-1:2010, 2.1.]
2.8
nanostructured material
material having internal or surface structure in the nanoscale (2.7)
Note 1 to entry: If external dimensions are in the nanoscale, the term nano-object (2.4) is recommended.
Note 2 to entry: Adapted from ISO/TS 80004-1:2010, definition 2.7.
[SOURCE: ISO/TS 80004-4, 2.11.]
2.9
nanotube
hollow nanofibre (2.3)
[SOURCE: ISO/TS 27687:2008, 4.4]
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3 General terms
3.1
bottom up nanomanufacturing
processes that use small fundamental units in the nanoscale (2.7) to create larger functionally rich
structures or assemblies
3.2
co-deposition
simultaneous deposition of two or more source materials
Note 1 to entry: Common methods include vacuum, thermal spray, electrodeposition and liquid suspension
deposition techniques.
3.3
communition
crushing or grinding for particle size reduction
3.4
directed assembly
formation of a structure guided by external intervention using components at the
nanoscale (2.7) that can, in principle, have any defined pattern
3.5
directed self-assembly
self-assembly (3.11) influenced by external intervention to produce a preferred structure, orientation or
pattern
Note 1 to entry: Examples of external intervention include an applied field, a chemical or structural template,
chemical gradient, and fluidic flow.
3.6
lithography
reproducible creation of a pattern
Note 1 to entry: The pattern can be formed in a radiation sensitive material or by transfer of material onto a
substrate either by transfer, by printing or by direct writing.
3.7
multilayer deposition
alternating deposition of two or more source materials to produce a composite layer structure
3.8
nanofabrication
ensemble of activities, to intentionally manufacture devices in the nanoscale (2.7), for commercial purpose
3.9
nanomanufacturing
intentional synthesis, generation or control of nanomaterials, or fabrication steps in the nanoscale (2.7)
for commercial purpose
[SOURCE: ISO/TS 80004-1:2010, definition 2.11.]
3.10
nanomanufacturing process
ensemble of activities to intentionally synthesize, generate or control nanomaterials (2.4), or fabrication
steps in the nanoscale (2.7), for commercial purpose
[SOURCE: ISO/TS 80004-1:2010, 2.12.]
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3.11
self-assembly
autonomous action by which components organize themselves into patterns or structures
3.12
surface functionalization
chemical process that acts upon a surface to impart a selected chemical or physical functionality
3.13
top-down nanomanufacturing
processes that create structures at the nanoscale (2.7) from macroscopic objects
4 Directed assembly
4.1
electrostatic driven assembly
use of electrostatic force to orient or place nanoscale (2.7) elements in a device or
material
4.2
fluidic alignment
use of fluid flow to orient nanoscale (2.7) elements in a device or material
4.3
hierarchical assembly
use of more than one type of nanomanufacturing (3.9) process to control structure
at multiple length scales
4.4
magnetic driven assembly
use of magnetic force to assemble at the nanoscale (2.7) in a desired pattern or
configuration
4.5
shape-based assembly
use of geometric shapes of nanoparticles (2.6) to achieve a desired pattern or
configuration
4.6
supramolecular assembly
use of non-covalent chemical bonding to assemble molecules or nanoparticles (2.6) with surface ligands
4.7
surface-to-surface transfer
transfer of nanoparticles (2.6) or structures from the surface of one substrate, on
which they have been deposited, grown or assembled, onto another substrate
5 Self-assembly processes
5.1
colloidal crystallization
sedimentation of nanoparticles (2.6) from a solution to form a solid which consists
of a close-packed, ordered array of repeating units
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5.2
graphioepitaxy
directed self-assembly (3.5) using nanoscale (2.7) topographical features
Note 1 to entry: Includes the growth of a thin layer on the surface and growth of an additional layer on top of a
substrate which has the same or different structure as the underlying crystal.
5.3
ion beam surface reconstruction
use of an accelerated ion beam to cause surface modification which may be at the
nanoscale (2.7)
5.4
Langmuir-Blodgett film formation
creation of a molecular monolayer at an air-liquid interface using a Langmuir-Blodgett trough
5.5
Langmuir-Blodgett film transfer
transfer of a Langmuir-Blodgett molecular monolayer formed at an air-liquid interface onto a solid
surface by dipping a solid substrate into the supporting liquid
5.6
layer-by-layer deposition
LbL deposition
electrostatic process of depositing polyelectrolytes with opposite charges laid over or under another
5.7
modulated elemental reactant method
use of vapour deposited precursors with regions of controlled composition as a template for the
formation of interleaved layers of two or more structures
5.8
self-assembled monolayer formation
SAM formation
spontaneous formation of an organized molecular layer on a solid surface from solution or the vapour
phase, driven by molecule-to-surface bonding and weak intermolecular interaction
5.9
Stranski-Krastanow growth
mode of thin film growth in which both layer and island formation mechanisms are present
6 Synthesis
6.1 Gas process phase — Physical methods
6.1.1
cold gas dynamic spraying
to fluidize either nanoscale (2.7) crystalline powders or conventional powders that are then consolidated
onto a surface coating in a high velocity inert gas
6.1.2
electron-beam evaporation
process in which a material is vaporized by incidence of high energy electrons in high or ultra-high
vacuum conditions for subsequent deposition onto a substrate
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6.1.3 Electro-spark deposition processes
6.1.3.1
electro-spark deposition
pulsed-arc micro-welding process using short-duration, high-current electrical pulses to deposit an
electrode material on a substrate
6.1.4 Spray drying processes
6.1.4.1
freeze drying
dehydration or solvent removal by rapid cooling immediately followed by vacuum sublimation
6.1.4.2
spray drying
producing a dry powder from a liquid or slurry by rapid removal of liquid droplets via contact with a hot gas
6.1.5
supercritical expansion
precipitation of nano-objects (2.5) resulting from an expansion of a solution above its critical temperature
(T ) and critical pressure (P ) through a spray device
C C
6.1.6
suspension combustion thermal spray
thermal spray (7.2.16) in which the precursor is introduced to a plasma jet in the form of a liquid suspension
6.1.7
wire electric explosion
formation of nanoparticles (2.6) by applying an electrical pulse of high current density through a wire
causing it to volatilize with subsequent recondensation
6.1.8
vaporization
process of assisted change of phase from solid or liquid to gas or plasma phases
Note 1 to entry: Vaporization process is often used to consequently deposit the vaporized material on a target
[7]
substrate. The whole process is known as PVD (ISO 2080:2008, 2.12) .
−6 −9
Note 2 to entry: High Vacuum PVD is usually performed at pressures in the range of 10 to 10 Torr. Ultra-High
−9
Vacuum (UHV PVD) is the deposition performed at pressures below 10 Torr.
6.2 Gas process phase — Chemical methods
6.2.1 Flame synthesis processes
6.2.1.1
liquid precursor combustion
creation of solid product, typically a nanomaterial (2.4) in aggregate form, via exothermic reaction of a
feedstock solution with an oxidizer
[SOURCE: ISO 19353, 3.3, modified.]
6.2.1.2
plasma spray
creation of a jet of solid product, typically a nanomaterial (2.4) in aggregate form from an ionized
gaseous source
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6.2.1.3
pyrogenesis
using combustion or other heat source to produce solid product, typically a nanomaterial (2.4) in
aggregate form facilitated by an aerosolized spray
6.2.1.4
solution precursor plasma spray
gas phase process in which a thermal (equilibrium) plasma is formed into which a solution containing
precursors is introduced resulting in gaseous species that during cooling form a solid product, typically
a nanomaterial (2.4) in aggregate form
6.2.1.5
thermal spray pyrolysis
creation of solid product, typically a nanomaterial (2.4) in aggregate form from liquid precursors through
liquid atomization and reaction using a thermal source
6.2.2
hot wall tubular reaction
chemical vapour deposition (7.2.3) performed in a tubular furnace in which the reaction surface is
maintained at a controlled elevated temperature
6.2.3
photothermal synthesis
gas phase process where a precursor or other gaseous species is heated by absorption of infrared
radiation resulting in heating of the gas and thermal decomposition of the precursor producing a solid
product, typically a nanoparticle (2.6)
6.2.4
vapour-liquid-solid nanofibre synthesis
VLS
growth of nanofibres (2.3) onto a substrate with feed material in gaseous form in the presence of a
liquid catalyst
Note 1 to entry: The VLS method for fibres exploits a liquid phase on the end of a fibre which can rapidly adsorb a
vapour to supersaturation levels, and from which crystal growth subsequently occurs.
6.3 Liquid process phase — Physical methods
6.3.1
electrospinning
use of electrical potential to induce drawing of fine fibres from a liquid phase
6.3.2
in-situ intercalative polymerization
insertion of monomers into layered inorganic materials followed by polymerization which result in
nanocomposites (2.2)
6.3.3
nanoparticle dispersion
creating a suspension of nanoparticles (2.6) in a liquid through molecular ligands, surface charges or
other interactions to prevent or slow sedimentation
6.3.5
tape casting
deposition of macroscopic layer by spreading slurry of ceramic paste onto a flat surface
Note 1 to entry: Nanoparticles (2.6) may be part of the composition of the layer.
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6.3.6
wet ball milling
grinding (6.5.5) process in liquid via rolling feedstock material with crushing balls of greater hardness
to create a force of impact in order to reduce the size of target components
Note 1 to entry: The product of the process is known as slurry.
6.4 Liquid process phase — Chemical methods
6.4.1
acid hydrolysis of cellulose
use of an acid to release nanocrystalline cellulose from cellulose
6.4.2
nanoparticle precipitation
formation of nanoparticles (2.6) from solution reactions where particle size may be controlled by
kinetic factors
6.4.3
prompt inorganic condensation
formation of atomically smooth and dense films by spin-coating (7.2.17) and low-temperature curing of
organic free aqueous solutions based on organometallic molecular precursors
6.4.4
reverse micelle process
synthesis of nanoparticles (2.6) in solution using reagents in the presence of reaction stopping ligands
that attach to the nanoparticle surface and inhibit further growth
6.4.5
sol-gel processing
conversion of a chemical solution or colloidal suspension (sol) to an integrated network (gel), which can
then be further densified
6.4.6
surfactant templating
use of surfactants to self-assemble molecular species such that they can be subsequently solidified in a
structured configuration at the nanoscale (2.7)
EXAMPLE MCM 41.
6.4.7
Stober process
generation of particles of silicate by using a tetra-alkyl orthosilicate and a combination of low molecular
weight alcohol and ammonia, used with or without water
Note 1 to entry: This is a sol-gel
...

SPÉCIFICATION ISO/TS
TECHNIQUE 80004-8
Première édition
2013-12-15
Nanotechnologies — Vocabulaire —
Partie 8:
Processus de nanofabrication
Nanotechnologies — Vocabulary —
Part 8: Nanomanufacturing processes
Numéro de référence
ISO/TS 80004-8:2013(F)
©
ISO 2013

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ISO/TS 80004-8:2013(F)

DOCUMENT PROTÉGÉ PAR COPYRIGHT
© ISO 2013
Droits de reproduction réservés. Sauf indication contraire, aucune partie de cette publication ne peut être reproduite ni utilisée
sous quelque forme que ce soit et par aucun procédé, électronique ou mécanique, y compris la photocopie, l’affichage sur
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Version française parue en 2014
Publié en Suisse
ii © ISO 2013 – Tous droits réservés

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Sommaire Page
Avant-propos .iv
Introduction .vi
1 Domaine d’application . 1
2 Termes et définitions provenant d’autres parties de l’ISO/TS 80004 .1
3 Termes généraux . 3
4 Assemblage dirigé . 4
5 Processus d’auto-assemblage . 5
6 Synthèse . 6
6.1 Processus en phase gazeuse — Méthodes physiques . 6
6.2 Processus en phase gazeuse — Méthodes chimiques . 7
6.3 Processus en phase liquide — Méthodes physiques . 7
6.4 Processus en phase liquide — Méthodes chimiques . 8
6.5 Processus en phase solide — Méthodes physiques . 9
6.6 Processus en phase solide — Méthodes chimiques .11
7 Fabrication .11
7.1 Lithographie de formation de nanomotifs .11
7.2 Processus de dépôt .14
7.3 Processus de gravure .17
7.4 Impression et revêtement .19
Annexe A (informative) Identification des résultats obtenus à partir de processus de
synthèse définis .21
Annexe B (informative) Index .25
Bibliographie .31
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Avant-propos
L’ISO (Organisation internationale de normalisation) est une fédération mondiale d’organismes
nationaux de normalisation (comités membres de l’ISO). L’élaboration des Normes internationales est
en général confiée aux comités techniques de l’ISO. Chaque comité membre intéressé par une étude
a le droit de faire partie du comité technique créé à cet effet. Les organisations internationales,
gouvernementales et non gouvernementales, en liaison avec l’ISO participent également aux travaux.
L’ISO collabore étroitement avec la Commission électrotechnique internationale (CEI) en ce qui concerne
la normalisation électrotechnique.
Les procédures utilisées pour élaborer le présent document et celles destinées à sa mise à jour sont
décrites dans les Directives ISO/CEI, Partie 1. Il convient en particulier de prendre note des différents
critères d’approbation requis pour les différents types de documents ISO. Le présent document a été
rédigé conformément aux règles de rédaction données dans les Directives ISO/CEI, Partie 2. www.iso.
org/directives
L’attention est appelée sur le fait que certains des éléments du présent document peuvent faire l’objet de
droits de propriété intellectuelle ou de droits analogues. L’ISO ne saurait être tenue pour responsable
de ne pas avoir identifié de tels droits de propriété et averti de leur existence. Les détails concernant les
références aux droits de propriété intellectuelle ou autres droits analogues identifiés lors de l’élaboration
du document sont indiqués dans l’Introduction et/ou sur la liste ISO des déclarations de brevets reçues.
www.iso.org/patents
Les éventuelles appellations commerciales utilisées dans le présent document sont données pour
information à l’intention des utilisateurs et ne constituent pas une approbation ou une recommandation.
Pour plus d’explications sur la signification des termes et expressions spécifiques employés par l’ISO
pour l’évaluation de la conformité, et pour plus d’informations au sujet de l’adhésion de l’ISO aux principes
de l’OMC relatifs aux obstacles techniques au commerce (OTC), voir l’URL suivante: Avant-propos —
Informations supplémentaires
L’ISO/TS 80004-8 a été élaborée conjointement par le comité technique ISO/TC 229, Nanotechnologies,
et le comité technique CEI/TC 113, Normalisation dans le domaine des nanotechnologies relatives aux
appareils et systèmes électriques et électroniques.
Les documents dont les numéros de référence sont compris entre 80000 et 89999 sont développés en
collaboration par l’ISO et la CEI.
L’ISO/TS 80004 comprend les parties suivantes, présentées sous le titre général Nanotechnologies —
Vocabulaire:
— Partie 1: Termes «cœur»
— Partie 3: Nano-objets en carbone
— Partie 4: Matériaux nanostructurés
— Partie 5: Interface nano/bio
— Partie 6: Caractérisation des nano-objets
— Partie 7: Diagnostics et thérapies pour les soins de santé
— Partie 8: Processus de nanofabrication
Les parties suivantes sont en cours d’élaboration:
1)
— Partie 2: Nano-objets: Nanoparticule, nanofibre et nanoplaque
— Partie 9: Produits et systèmes électrotechniques permis par les nanotechnologies
[5]
1) Révise et remplace l’ISO/TS 27687 .
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— Partie 10: Produits et systèmes photoniques permis par les nanotechnologies
— Partie 11: Nanocouche, nanorevêtement, nanofilm et termes associés
— Partie 12: Effets quantiques dans les nanotechnologies
Le graphène et d’autres matériaux bidimensionnels formeront l’objet d’une future partie 13.
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Introduction
La nanofabrication constitue le pont essentiel entre les découvertes du domaine des nanosciences et les
produits du monde réel issus des nanotechnologies.
Le passage des nanotechnologies du laboratoire à la production de masse exige, à terme, une étude
approfondie des questions liées aux procédés de fabrication, y compris la conception, la fiabilité et
la qualité des produits, la conception et la maîtrise des procédés, les opérations en atelier, la gestion
de la chaîne d’approvisionnement, les pratiques de sécurité et de santé sur le lieu de travail durant
la production, l’utilisation et la manipulation de nanomatériaux. La nanofabrication englobe des
techniques d’assemblage et d’auto-assemblage dirigé, des méthodologies de synthèse et des procédés de
fabrication tels que la lithographie et des processus biologiques. La nanofabrication comprend également
l’assemblage dirigé par approche ascendante («bottom-up»), le traitement à haute résolution par approche
descendante («top-down»), l’ingénierie des systèmes moléculaires et l’intégration hiérarchique avec des
systèmes à plus grande échelle. Au fur et à mesure que les échelles dimensionnelles des matériaux et des
systèmes moléculaires se rapprochent de l’échelle nanométrique, les règles conventionnelles régissant
leur comportement peuvent varier considérablement. À ce titre, le comportement d’un produit final est
directement lié à la performance collective de ses constituants de base à l’échelle nanométrique.
Les termes propres aux procédés biologiques ne sont pas inclus dans cette première édition du
vocabulaire de la nanofabrication mais, compte tenu de l’évolution rapide dans ce domaine, il est prévu
que les termes propres à cet important domaine soient ajoutés lors d’une mise à jour ultérieure de la
présente Spécification technique ou dans des documents accompagnant la série de normes 80004. Ces
documents pourraient inclure à la fois le traitement des nanomatériaux biologiques et l’utilisation de
procédés biologiques pour la fabrication de matériaux à l’échelle nanométrique.
De la même manière, des termes supplémentaires issus d’autres domaines de nanofabrication en
développement, y compris la fabrication de composites, la fabrication «roll-to-roll» et autres techniques,
seront inclus dans de futurs documents.
Une distinction doit être faite entre les termes «nanofabrication» et «nanoconstruction». Le
«nanofabrication» englobe un éventail de procédés plus vaste que celui de la «nanoconstruction». Le
«nanofabrication» englobe toutes les techniques de «nanofabrication», ainsi que les techniques associées
au traitement des matériaux et à la synthèse chimique.
Le présent document se veut une introduction aux processus utilisés pour les premières étapes de la
chaîne de valeur de la nanofabrication, c’est-à-dire la synthèse, la production ou le contrôle intentionnels
de nanomatériaux, y compris les étapes de fabrication à l’échelle nanométrique. Les nanomatériaux issus
de ces processus de fabrication sont commercialisés lorsqu’ils peuvent, par exemple, faire l’objet d’une
purification supplémentaire, être rendus compatibles pour une dispersion dans des mélanges ou des
matrices composites, ou servir de composants intégrés dans des systèmes et des appareils. En réalité,
la chaîne de valeur de la nanofabrication est un ensemble important et diversifié de chaînes de valeur
commerciales qui couvrent les secteurs suivants:
— l’industrie des semi-conducteurs (où la pression exercée pour créer des microprocesseurs plus
petits, plus rapides et plus performants a conduit à la création de circuits inférieurs à 100 nm);
— l’électronique et les télécommunications;
— l’aérospatiale, la défense et la sécurité nationale;
— l’énergie et l’industrie automobile;
— l’industrie plastique et l’industrie céramique;
— les produits forestiers et papiers;
— l’alimentation et l’emballage alimentaire;
— l’industrie pharmaceutique, la biomédecine et les biotechnologies;
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ISO/TS 80004-8:2013(F)

— la dépollution de l’environnement;
— l’habillement et les soins de santé.
Sur le marché, des milliers de tonnes de nanomatériaux font l’objet d’applications finales dans plusieurs
des secteurs en question, tels que le noir de carbone et la fumée de silice. Les nanomatériaux qui sont
conçus de manière rationnelle dans un but spécifique sont censés bouleverser le paysage de secteurs
tels que les biotechnologies, l’assainissement de l’eau et le développement énergétique.
La plupart des parties du présent document sont organisées par type de processus. Dans le cas de
l’Article 6, la logique de classement est la suivante: avant la fabrication de la particule, le matériau
lui-même est en phase gazeuse/liquide/solide. La phase du substrat ou porteur dans le processus ne
détermine pas la catégorisation du processus. Par exemple, des particules de fer sont des catalyseurs
pour un processus dans lequel de l’huile est ensemencée par des particules de fer, l’huile se vaporise
puis se condense, formant des particules de carbone sur les particules de fer. Dans la mesure où l’huile
est l’élément qui se vaporise, il s’agit d’un processus en phase gazeuse. Du fait que les nanotubes sont
synthétisés en phase gazeuse, en présence de particules de catalyseur réagissant avec la phase gazeuse
pour produire les nanotubes, ce processus est caractérisé comme étant un processus en phase gazeuse.
L’Annexe A fournit des indications permettant d’établir si des processus de synthèse sont utilisés ou non
pour fabriquer des nano-objets, des nanoparticules ou les deux.
Une compréhension commune de la terminologie utilisée dans des applications pratiques permettra aux
entités concernées d’employer des méthodes communes dans la nanofabrication et permettra de renforcer
le développement de la nanofabrication à travers le monde. Une généralisation de la compréhension des
termes au sein de l’infrastructure de fabrication existante assurera la transition entre les innovations
dans les laboratoires de recherche et la viabilité économique des nanotechnologies.
En ce qui concerne les termes informatifs venant à l’appui de la terminologie relative à la nanofabrication,
[1]
voir la Référence.
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SPÉCIFICATION TECHNIQUE ISO/TS 80004-8:2013(F)
Nanotechnologies — Vocabulaire —
Partie 8:
Processus de nanofabrication
1 Domaine d’application
La présente Spécification technique donne les termes et définitions concernant les processus
de nanofabrication dans le domaine des nanotechnologies. Elle ne constitue qu’une partie d’une
documentation de terminologie et de définitions, en plusieurs parties, couvrant les différents aspects
des nanotechnologies.
Dans le présent document, tous les termes liés aux processus se rapportent à la nanofabrication. Parmi
les processus mentionnés, bon nombre d’entre eux ne se rapportent pas exclusivement à l’échelle
nanométrique. Selon que les conditions sont maîtrisables ou non, de tels processus peuvent donner lieu
à des matériaux à l’échelle nanométrique ou à de plus grandes échelles.
Il existe de nombreux autres termes qui désignent des outils, des composants, des matériaux, des
méthodes de contrôle de systèmes ou des méthodes métrologiques associées à la nanofabrication mais
qui ne relèvent pas du domaine d’application du présent document.
2 Termes et définitions provenant d’autres parties de l’ISO/TS 80004
Les termes et définitions dans le présent article sont donnés dans d’autres parties de l’ISO/TS 80004.
Ces termes et définitions sont repris ici pour fournir un contexte et pour faciliter la compréhension.
2.1
nanotube de carbone
CNT
nanotube (2.9) composé de carbone
Note 1 à l’article: Les nanotubes de carbone sont, en général, constitués de couches de graphène enroulées sur
elles-mêmes, et comprennent des nanotubes de carbone simple paroi et des nanotubes de carbone multi-parois.
[SOURCE: ISO/TS 80004-3:2010, 4.3.]
2.2
nanocomposite
solide composé d’un mélange de deux ou plusieurs matériaux de phases distinctes, dont une ou plusieurs
sont des nanophases
Note 1 à l’article: Les nanophases gazeuses sont exclues (elles sont traitées dans la catégorie des matériaux
nanoporeux).
Note 2 à l’article: Les matériaux composés de phases à l’échelle nanométrique (2.7) formées uniquement par
précipitation ne sont pas considérés comme des nanocomposites.
[SOURCE: ISO/TS 80004-4:2011, 3.2.]
2.3
nanofibre
nano-objet dont deux dimensions externes similaires sont à l’échelle nanométrique (2.7) et dont la
troisième dimension est significativement plus grande
Note 1 à l’article: Une nanofibre peut être flexible ou rigide.
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ISO/TS 80004-8:2013(F)

Note 2 à l’article: On considère que les deux dimensions externes similaires ont une différence de taille plus petite
qu’un facteur trois et on considère que la dimension externe significativement plus grande diffère des deux autres
d’un facteur supérieur à trois.
Note 3 à l’article: La dimension externe la plus grande n’est pas nécessairement à l’échelle nanométrique (2.7).
[SOURCE: ISO/TS 27687:2008, 4.3, modifiée.]
2.4
nanomatériau
matériau ayant une dimension extérieure à l’échelle nanométrique (2.7) ou ayant une structure interne
ou une structure de surface à l’échelle nanométrique
Note 1 à l’article: Ce terme générique englobe les nano-objets (2.5) et les matériaux nanostructurés (2.8).
Note 2 à l’article: Voir également nanomatériau d’ingénierie, nanomatériau manufacturé et nanomatériau
«incidentel».
[SOURCE: ISO/TS 80004-1:2010, 2.4, modifiée.]
2.5
nano-objet
matériau dont une, deux ou les trois dimensions externes sont à l’échelle nanométrique (2.7)
Note 1 à l’article: Terme générique pour tous les objets discrets à l’échelle nanométrique.
[SOURCE: ISO/TS 80004-1:2010, 2.5, modifiée.]
2.6
nanoparticule
nano-objet (2.5) dont les trois dimensions externes sont à l’échelle nanométrique (2.7)
Note 1 à l’article: Si les longueurs du plus grand et du plus petit axe du nano-objet (2.5) diffèrent de manière
significative (typiquement d’un facteur supérieur à trois), les termes nanofibre (2.3) ou nanofeuillet seront utilisés
à la place du terme nanoparticule.
[SOURCE: ISO/TS 27687:2008, 4.1, modifiée.]
2.7
échelle nanométrique
échelle de longueur s’étendant approximativement de 1 nm à 100 nm
Note 1 à l’article: Les propriétés qui ne constituent pas des extrapolations par rapport à des dimensions plus
grandes seront typiquement, mais pas exclusivement, présentes dans cette échelle de longueur. Pour ces
propriétés, les limites dimensionnelles sont approximatives.
Note 2 à l’article: Dans cette définition, une limite inférieure (approximativement 1 nm) a été introduite pour
éviter que des atomes individuels ou de petits groupes d’atomes soient considérés comme des nano-objets (2.5) ou
des éléments de nanostructures, ce qui aurait pu être le cas en l’absence d’une telle limite.
[SOURCE: ISO/TS 80004-1:2010, 2.1, modifiée.]
2.8
matériau nanostructuré
matériau ayant une structure interne ou de surface à l’échelle nanométrique (2.7)
Note 1 à l’article: Si une ou plusieurs dimensions externes sont à l’échelle nanométrique, il est recommandé
d’utiliser le terme nano-objet (2.5).
Note 2 à l’article: Adapté de l’ISO/TS 80004-1:2010, définition 2.7.
[SOURCE: ISO/TS 80004-4, 2.11.]
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ISO/TS 80004-8:2013(F)

2.9
nanotube
nanofibre (2.3) creuse
[SOURCE: ISO/TS 27687:2008, 4.4]
3 Termes généraux
3.1
nanofabrication par voie ascendante
nanofabrication «bottom-up»
processus qui utilisent de petites unités fondamentales à l’échelle nanométrique (2.7) afin de créer des
structures ou assemblages de plus grande taille riches en fonctionnalités
3.2
codépôt
dépôt simultané de deux matériaux sources ou plus
Note 1 à l’article: Les méthodes courantes incluent le dépôt sous vide, le dépôt par projection thermique, le dépôt
électrolytique et le dépôt par sédimentation.
3.3
comminution
concassage ou broyage afin de réduire la taille des particules
3.4
assemblage dirigé
formation d’une structure guidée par une intervention extérieure à l’aide de
composants à l’échelle nanométrique (2.7) qui peuvent, en principe, avoir n’importe quel motif défini
3.5
auto-assemblage dirigé
auto-assemblage (3.11) influencé par une intervention extérieure afin de produire une structure, une
orientation ou un motif préférentiel(le)
Note 1 à l’article: Une intervention extérieure peut être, par exemple, un champ appliqué, une matrice chimique ou
structurelle, un gradient chimique ou un débit fluidique.
3.6
lithographie
reproduction d’un motif
Note 1 à l’article: Le motif peut être formé dans un matériau radiosensible ou par le déplacement de matériau sur
un substrat par transfert, par impression ou par écriture directe.
3.7
dépôt multicouches
dépôt alterné de deux matériaux sources ou plus afin de produire une structure composite en couches
3.8
nanoconstruction
ensemble des activités visant à fabriquer intentionnellement des dispositifs à l’échelle nanométrique
(2.7) à des fins commerciales
3.9
nanofabrication
synthèse, production ou contrôle intentionnel(le) de nanomatériaux, ou étapes de fabrication à l’échelle
nanométrique (2.7), à des fins commerciales
[SOURCE: ISO/TS 80004-1:2010, définition 2.11, modifiée.]
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ISO/TS 80004-8:2013(F)

3.10
processus de nanofabrication
ensemble des activités visant à synthétiser, générer ou contrôler intentionnellement des nanomatériaux
(2.4), ou étapes de fabrication à l’échelle nanométrique (2.7), à des fins commerciales
[SOURCE: ISO/TS 80004-1:2010, 2.12, modifiée.]
3.11
auto-assemblage
action autonome par laquelle des composants s’organisent eux-mêmes sous forme de motifs ou de
structures
3.12
fonctionnalisation de surface
processus chimique qui agit sur une surface afin de lui attribuer une fonctionnalité chimique ou physique
choisie
3.13
nanofabrication par voie descendante
nanofabrication «top-down»
processus qui permettent de créer des structures à l’échelle nanométrique (2.7) à partir d’objets
macroscopiques
4 Assemblage dirigé
4.1
assemblage par guidage électrostatique
utilisation d’une force électrostatique afin d’orienter ou introduire des éléments à
l’échelle nanométrique (2.7) dans un dispositif ou un matériau
4.2
alignement fluidique
utilisation de l’écoulement d’un fluide afin d’orienter des éléments à l’échelle
nanométrique (2.7) dans un dispositif ou un matériau
4.3
assemblage hiérarchique
utilisation de plusieurs types de processus de nanofabrication (3.9) afin de contrôler
la structure à différentes échelles de longueur
4.4
assemblage par guidage magnétique
utilisation d’une force magnétique pour créer un assemblage à l’échelle nanométrique
(2.7) selon un motif ou une configuration souhaité(e)
4.5
assemblage par forme
utilisation des formes géométriques de nanoparticules (2.6) afin d’obtenir un motif
ou une configuration souhaité(e)
4.6
assemblage supramoléculaire
utilisation d’une liaison chimique non covalente afin d’assembler des molécules ou des nanoparticules
(2.6) avec des ligands de surface
4.7
transfert entre surfaces
transfert de nanoparticules (2.6) ou de structures depuis la surface d’un substrat,
sur lequel elles ont été déposées, synthétisées ou assemblées, vers un autre substrat
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ISO/TS 80004-8:2013(F)

5 Processus d’auto-assemblage
5.1
cristallisation colloïdale
sédimentation de nanoparticules (2.6) à partir d’une solution pour former un solide
constitué d’un réseau compact et ordonné de motifs répétés
5.2
grapho-épitaxie
auto-assemblage dirigé (3.5) utilisant des caractéristiques topographiques à l’échelle
nanométrique (2.7)
Note 1 à l’article: Ce processus inclut la croissance d’une couche mince sur la surface et la croissance d’une couche
supplémentaire au-dessus d’un substrat qui possède une structure identique à ou différente de celle du cristal
sous-jacent.
5.3
reconstruction de surface par faisceau d’ions
utilisation d’un faisceau d’ions accélérés afin de provoquer une modification de
surface qui peut être à l’échelle nanométrique (2.7)
5.4
formation d’un film de Langmuir-Blodgett
création d’une monocouche moléculaire au niveau d’une interface air-liquide en utilisant une cuve de
Langmuir-Blodgett
5.5
transfert d’un film de Langmuir-Blodgett
transfert d’une monocouche moléculaire de Langmuir-Blodgett formée au niveau d’une interface air-
liquide vers une surface solide en plongeant un substrat solide dans le liquide support
5.6
dépôt couche par couche
dépôt LBL
processus électrostatique qui consiste à déposer, l’un au-dessus de l’autre, des polyélectrolytes de
charges opposées
5.7
méthode impliquant des réactifs élémentaires modulés
utilisation de précurseurs déposés en phase vapeur avec des régions de composition contrôlée, en tant
que matrice pour former des couches imbriquées de deux structures ou plus
5.8
formation d’une monocouche auto-assemblée
formation d’une SAM
formation spontanée d’une couche moléculaire organisée sur une surface solide à partir d’une solution
ou de la phase vapeur, guidée par une liaison molécule-surface et une interaction intermoléculaire faible
5.9
croissance de Stranski-Krastanov
mode de croissance de film mince dans lequel interviennent des mécanismes de formation de couches
et d’îlots
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ISO/TS 80004-8:2013(F)

6 Synthèse
6.1 Processus en phase gazeuse — Méthodes physiques
6.1.1
projection dynamique par gaz froid
processus pour fluidiser des poudres cristallines à l’échelle nanométrique (2.7) ou des poudres
conventionnelles qui sont ensuite consolidées sur un revêtement de surface dans un gaz inerte à grande
vitesse
6.1.2
évaporation par faisceau d’électrons
processus dans lequel un matériau est vaporisé par irradiation d’électrons à haute énergie dans des
conditions de vide poussé ou d’ultravide en vue d’un dépôt ultérieur sur un substrat
6.1.3 Processus de dépôt par étincelage
6.1.3.1
dépôt par étincelage
processus de microsoudage à l’arc pulsé utilisant des impulsions électriques de haute intensité et de
courte durée pour déposer un matériau d’électrode sur un substrat
6.1.4 Processus de séchage par pulvérisation
6.1.4.1
lyophilisation
déshydratation ou élimination de solvant par un refroidissement rapide immédiatement suivi d’une
sublimation sous vide
6.1.4.2
séchage par pulvérisation
production d’une poudre sèche à partir d’un liquide ou d’une suspension par évaporation rapide de
gouttelettes de liquide par contact avec un gaz chaud
6.1.5
détente supercritique
précipitation de nano-objets (2.5) résultant de la détente d’une solution au-dessus de sa température
critique (T ) et de sa pression critique (P ) au moyen d’un dispositif de projection (ou de pulvérisation)
C C
6.1.6
projection thermique de suspensions
projection thermique (7.2.16) dans laquelle le précurseur est introduit dans un jet de plasma sous la
forme d’une suspension liquide
6.1.7
explosion électrique d’un fil
formation de nanoparticules (2.6) par application d’une impulsion électrique de densité de courant
élevée à un fil, entraînant la volatilisation de celui-ci puis une recondensation
6.1.8
vaporisation
processus permettant de passer des phases solide ou liquide aux phases gazeuse ou plasma
Note 1 à l’article: Le processus de vaporisation est souvent utilisé pour déposer le matériau vaporisé sur un
substrat cible. L’ensemble du processus est connu sous le nom de «déposition en phase gazeuse par procédé
[7]
physique» (ISO 2080:2008, 2.12).
Note 2 à l’article: Le dépôt en phase gazeuse sous vide poussé est généralement réalisé à des pressions comprises
−6 −9 −9
entre 10 et 10 Torr. Le dépôt en phase gazeuse sous ultravide est réalisé à des pressions inférieures à 10 Torr.
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ISO/TS 80004-8:2013(F)

6.2 Processus en phase gazeuse — Méthodes chimiques
6.2.1 Processus de synthèse par flamme
6.2.1.1
...

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