ISO 24173:2024

Microbeam analysis — Guidelines for orientation measurement using electron backscatter diffraction

This document gives guidance on how to generate reliable and reproducible crystallographic orientation measurements using electron backscatter diffraction (EBSD). It addresses the requirements for specimen preparation, instrument configuration, instrument calibration and data acquisition.

Analyse par microfaisceaux — Lignes directrices pour la mesure d'orientation par diffraction d'électrons rétrodiffusés

General Information

• Status: Published
• Publication Date: 08-Feb-2024
• ICS: 71.040.50 - Physicochemical methods of analysis
• Technical Committee: ISO/TC 202 - Microbeam analysis
• Drafting Committee: ISO/TC 202 - Microbeam analysis
• Current Stage: 6060 - International Standard published
• Start Date: 09-Feb-2024
• Due Date: 10-Dec-2024
• Completion Date: 09-Feb-2024

Relations

• Revises: ISO 24173:2009 - Microbeam analysis — Guidelines for orientation measurement using electron backscatter diffraction
• Effective Date: 06-Jun-2022

Standards Content (Sample)

INTERNATIONAL ISO
STANDARD 24173
Second edition
Microbeam analysis — Guidelines
for orientation measurement using
electron backscatter diffraction
Analyse par microfaisceaux — Lignes directrices pour la mesure
d'orientation par diffraction d'électrons rétrodiffusés
PROOF/ÉPREUVE
Reference number
ISO 24173:2023(E)
© ISO 2023

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ISO 24173:2023(E)
COPYRIGHT PROTECTED DOCUMENT
© ISO 2023
All rights reserved. Unless otherwise specified, or required in the context of its implementation, no part of this publication may
be reproduced or utilized otherwise in any form or by any means, electronic or mechanical, including photocopying, or posting on
the internet or an intranet, without prior written permission. Permission can be requested from either ISO at the address below
or ISO’s member body in the country of the requester.
ISO copyright office
CP 401 • Ch. de Blandonnet 8
CH-1214 Vernier, Geneva
Phone: [phone]
Email: [e-mail]
Website: www.iso.org
Published in Switzerland
ii
PROOF/ÉPREUVE © ISO 2023 – All rights reserved

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ISO 24173:2023(E)
Contents Page
Foreword .iv
Introduction .v
1 Scope . 1
2 Normative references . 1
3 Terms and definitions . 1
4 Equipment for EBSD.6
5 Operating conditions . 7
5.1 Specimen preparation . 7
5.2 Specimen alignment. 7
5.3 Common steps in collecting an EBSP . 8
5.3.1 Setting the microscope operating conditions . 8
5.3.2 Detector and working distances . 8
5.3.3 Camera integration/exposure time . 9
5.3.4 Binning . 9
5.3.5 EBSP averaging . 10
5.3.6 EBSP background correction/EBSP signal correction . 10
5.3.7 Band detection . 10
6 Calibrations required for indexing of EBSPs .12
7 Analytical procedure .15
7.1 Operating conditions .
...

ISO 24173:2023(E)
ISO TC 202/WG 6
Date: 2023-07-2411-31
Secretariat: SAC
Microbeam analysis — Guidelines for orientation measurement using electron backscatter
diffraction

---------------------- Page: 1 ----------------------
ISO/DIS 24173:2023(E)
© ISO 2023
All rights reserved. Unless otherwise specified, no part of this publication may be reproduced or
utilized otherwise in any form or by any means, electronic or mechanical, including photocopying, or
posting on the internet or an intranet, without prior written permission. Permission can be requested
from either ISO at the address below or ISO's member body in the country of the requester.
ISO copyright office
Case postale 56 • CH-1211 Geneva 20
Tel. + 41 22 749 01 11
Fax + 41 22 749 09 47
E-mail [e-mail]
Web www.iso.orgwww.iso.org
Published in Switzerland.
ii © ISO 2023 – All rights reserved

---------------------- Page: 2 ----------------------
ISO/DIS 24173:2023(E)
Contents
Foreword . 6
Introduction. 8
1 Scope . 1
2 Normative references . 1
3 Terms and definitions . 1
4 Equipment for EBSD . 9
5 Operating conditions . 11
5.1 Specimen preparation . 11
5.2 Specimen alignment . 11
5.3 Common steps in collecting an EBSP . 11
5.3.1 Setting the microscope operating conditions . 11
5.3.2 Detector and working distances . 12
5.3.3 Camera integration/exposure time . 12
5.3.4 Binning . 13
5.3.5 EBSP averaging . 14
5.3.6 EBSP background correction/EBSP signal correction . 14
5.3.7 Band detection . 14
6 Calibrations required for indexing of EBSPs . 16
7 Analytical procedure . 21
7.1 Operating conditions . 21
7.2 Equipment stability check . 21
7.3 EBSD analysis . 22
8 Measurement uncertainty . 22
8.1 General . 22
8.2 Uncertainty of crystal o
...