ASTM E673-01

Standard Terminology Relating to Surface Analysis

SCOPE
1.1 This terminology is related to the various disciplines involved in surface analysis.  
1.2 The definitions listed apply to (a) Auger electron spectroscopy (AES), (b) X-ray photoelectron spectroscopy (XPS), (c) ion-scattering spectroscopy (ISS), (d) secondary ion mass spectrometry (SIMS), and (e) energetic ion analysis (EIA).

General Information

• Status: Historical
• Publication Date: 09-Nov-2001
• ICS: 01.040.17 - Metrology and measurement. Physical phenomena (Vocabularies)
• ICS: 17.040.20 - Properties of surfaces
• Technical Committee: E42 - Surface Analysis
• Drafting Committee: E42.02 - Terminology

Relations

• Replaces: ASTM E673-98E1 - Standard Terminology Relating to Surface Analysis
• Effective Date: 10-Nov-2001
• Referred By: ASTM E1127-08(2015) - Standard Guide for Depth Profiling in Auger Electron Spectroscopy
• Effective Date: 10-Nov-2001
• Referred By: ASTM E1635-06(2019) - Standard Practice for Reporting Imaging Data in Secondary Ion Mass Spectrometry (SIMS)
• Effective Date: 10-Nov-2001
• Referred By: ASTM E983-19 - Standard Guide for Minimizing Unwanted Electron Beam Effects in Auger Electron Spectroscopy
• Effective Date: 10-Nov-2001
• Referred By: ASTM E2734/E2734M-10(2018) - Standard Specification for Dimensions of Knife-Edge Flanges
• Effective Date: 10-Nov-2001
• Referred By: ASTM E1880-12(2020) - Standard Practice for Tissue Cryosection Analysis with SIMS
• Effective Date: 10-Nov-2001
• Referred By: ASTM E1217-11(2019) - Standard Practice for Determination of the Specimen Area Contributing to the Detected Signal in Auger Electron Spectrometers and Some X-Ray Photoelectron Spectrometers
• Effective Date: 10-Nov-2001
• Referred By: ASTM E1438-11(2019) - Standard Guide for Measuring Widths of Interfaces in Sputter Depth Profiling Using SIMS
• Effective Date: 10-Nov-2001
• Referred By: ASTM E1523-15 - Standard Guide to Charge Control and Charge Referencing Techniques in X-Ray Photoelectron Spectroscopy
• Effective Date: 10-Nov-2001
• Referred By: ASTM E995-16 - Standard Guide for Background Subtraction Techniques in Auger Electron Spectroscopy and X-Ray Photoelectron Spectroscopy
• Effective Date: 10-Nov-2001
• Referred By: ASTM E1508-12a(2019) - Standard Guide for Quantitative Analysis by Energy-Dispersive Spectroscopy
• Effective Date: 10-Nov-2001
• Referred By: ASTM E1881-12(2020) - Standard Guide for Cell Culture Analysis with SIMS
• Effective Date: 10-Nov-2001
• Referred By: ASTM E1634-11(2019) - Standard Guide for Performing Sputter Crater Depth Measurements
• Effective Date: 10-Nov-2001
• Referred By: ASTM E1504-11(2019) - Standard Practice for Reporting Mass Spectral Data in Secondary Ion Mass Spectrometry (SIMS)
• Effective Date: 10-Nov-2001
• Referred By: ASTM E2108-16 - Standard Practice for Calibration of the Electron Binding-Energy Scale of an X-Ray Photoelectron Spectrometer
• Effective Date: 10-Nov-2001

Standards Content (Sample)

NOTICE: This standard has either been superseded and replaced by a new version or discontinued.
Contact ASTM International (www.astm.org) for the latest information.
Designation: E 673 – 01
Standard Terminology Relating to
1
Surface Analysis
This standard is issued under the fixed designation E 673; the number immediately following the designation indicates the year of
original adoption or, in the case of revision, the year of last revision. A number in parentheses indicates the year of last reapproval. A
superscript epsilon (e) indicates an editorial change since the last revision or reapproval.
1. Scope analyzer transmission— see spectrometer transmission.
angle:
1.1 This terminology is related to the various disciplines
collection—SIMS, the angle between the normal to the
involved in surface analysis.
original specimen surface and the axis of the secondary ion
1.2 The definitions listed apply to ( a) Auger electron
collection optics.
spectroscopy (AES), (b) X-ray photoelectron spectroscopy
of detector—EIA, SIMS, the angle between the incident
(XPS), (c) ion-scattering spectroscopy (ISS), (d) secondary ion
beam direction and the direction pointing from the beam spot
mass spectrometry (SIMS), and (e) energetic ion analysis
to the center of the detector.
(EIA).
of emission—AES, XPS, the angle of emission or ejection of
2. Abbreviations
electrons from a solid measured relative to the normal to the
surface.
2.1 Abbreviations commonly used in surface analysis are as
of incidence— the angle between the incident beam and the
follows:
normal to the surface.
AES Auger electron spectroscopy
BS backscattering spectroscopy of scattering—EIA, the angle between the incident beam
CHA concentric hemispherical analyzer
direction and the direction in which a particle is traveling
CMA cylindrical mirror analyzer
after it is scattered. If the particle is incident on the detector,
EIA energetic ion analysis
eV electron-volts this angle will be the same as angle of detector.
ESCA electron spectroscopy for chemical analysis
solid, of detector—EIA, the solid angle intercepted by the
FABMS fast atom bombardment mass spectrometry
detector, with the radius originating at the beam spot.
FWHM full width at half maximum peak height
takeoff—AES, XPS the angle at which particles leave a
ISS ion scattering spectroscopy
pp peak-to-peak
specimen measured relative to the plane of the specimen
RBS Rutherford backscattering spectroscopy
surface. (see angle of emission).
RFA retarding field analyzer
SAM scanning Auger microprobe angle lapping—a method of specimen preparation in which a
SIMS secondary ion mass spectrometry
specimen is mechanically polished at an angle so that
SNMS sputtered neutral mass spectrometry
changes in composition as a function of position, usually
XPS X-ray photoelectron spectroscopy
depth, can be more easily determined.
3. Terminology Definitions
angle resolved AES—the recording of Auger electron spectra
as a function of angle emission.
adventitious carbon referencing— XPS, a method of deter-
angular distribution of secondary ions—see secondary ions.
mining the charging potential of a particular specimen by
attenuation coefficient—for a parallel beam of specified
comparing the experimentally determined binding energy of
particles or radiation, the quantity μ in the expression μDx
the C 1s peak maximum from contaminating hydrocarbon or
for the fraction removed in passing through a thin layer Dx
hydrocarbon groups on the specimen to a standard binding
of a substance in the limit as D x approaches zero, where Dx
energy value.
is measured in the direction of the beam.
analysis:
Auger:
area—a two-dimensional region of a specimen surface,
analysis volume—see volume under analysis.
usually measured in the plane of the specimen surface, from
chemical effects—AES, see chemical.
which a specified percentage of the signal is detected.
chemical shift—AES, see chemical.
volume—a three dimensional region of a specimen from
current—the electron current due to the emission of Auger
which a specified percentage of the measured signal is
electrons.
generated. Also see information depth.
electron—an electron emitted as the result of an Auger
process.
1
This terminology is under the jurisdiction of ASTM Committee E42 on Surface
electron yield— the probability that an atom with a vacancy
Analysis and is the direct responsibility of Subcommittee E42.02 on Terminology.
in a particular inner shell will relax by an Auger process.
Current edition approved November 10, 2001. Published January 2002. Origi-
nally published as E 673 – 79a. Last previous edition E 673 – 98[epsiv ]1.
Copyright © ASTM International, 100 Barr Harbor Drive, PO Box C700, West Conshohocken, PA 19428-2959, United States.
1

---------------------- Page: 1 ----------------------
NOTICE: This standard has either been superseded and replaced by a new version or discontinued.
Contact ASTM International (www.astm.org) for the latest information.
E 673
line scan—a plot of Auger s
...