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ASTM D5127-13

(Guide)

Standard Guide for Ultra-Pure Water Used in the Electronics and Semiconductor Industries

Standard Guide for Ultra-Pure Water Used in the Electronics and Semiconductor Industries

SIGNIFICANCE AND USE
4.1 This guide recommends the water quality required for the electronics and microelectronics industries. High-purity water is required to prevent contamination of products during manufacture, since contamination can lead to an unacceptable, low yield of electronic devices.  
4.2 The range of water purity is defined in accordance with the manufacturing process. The types of ultra-pure water are defined with respect to device line width. In all cases, the water-quality recommendations apply at the point of distribution.  
4.3 The limits on the impurities are related to current contamination specifications and to available analytical methods (either performed in a suitable clean laboratory or by on-line instrumentation). On-line and off-line methods are used in accordance with current industry practice. Concentration of the sample may be required to measure the impurities at the levels indicated in Table 1.TABLE 1 Requirements for Water at the Point of Distribution in the Electronics and Semiconductor IndustriesA    
Parameter  
Type E-1  
Type E-1.1  
Type E-1.2B  
Type E-1.3B  
Type E-2  
Type E-3  
Type E-4  
Linewidth (microns)  
1.0–0.5  
0.35–0.25  
0.18–0.09  
0.065–0.032  
5.0–1.0  
>5.0  
—  
Resistivity, 25°C (On-line)  
18.1  
18.2  
18.2  
18.2  
16.5  
12  
0.5  
TOC (μg/L) (on-line for  
5  
2  
1  
1  
50  
300  
1000  
On-line dissolved oxygen (μg/L)  
25  
10  
3  
10  
—  
—  
—  
On-Line Residue after evaporation (μg/L)  
1  
0.5  
0.1  
—  
—  
—  
On-line particles/L (micron range)  
>0.05 μm  
500  
0.05–0.1  
1000  
200  
N/A  
—  
—  
—  
0.1–0.2  
1000  
350  
N/A  
—  
—  
—  
0.2–0.5  
500  
N/A  
—  
—  
—  
0.5-1.0  
200  
N/A  
—  
—  
—  
1.0  
N/A  
—  
—  
—  
SEM particles/L (micron range)  
...
SCOPE
1.1 This guide provides recommendations for water quality related to electronics and semiconductor-industry manufacturing. Seven classifications of water are described, including water for line widths as low as 0.032 micron. In all cases, the recommendations are for water at the point of distribution (POD).  
1.2 Water is used for washing and rinsing of semiconductor components during manufacture. Water is also used for cleaning and etching operations, making steam for oxidation of silicon surfaces, preparing photomasks, and depositing luminescent materials. Other applications are in the development and fabrication of solid-state devices, thin-film devices, communication lasers, light-emitting diodes, photo-detectors, printed circuits, memory devices, vacuum-tube devices, or electrolytic devices.  
1.3 Users needing water qualities different from those described here should consult other water standards, such as Specification D1193 and Guide D5196.  
1.4 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use.

General Information

Status
Historical
Publication Date
31-Dec-2012
ICS
13.060.25 - Water for industrial use
71.100.99 - Other products of the chemical industry
Technical Committee
D19 - Water
Drafting Committee
D19.02 - Quality Systems, Specification, and Statistics
Current Stage
Ref Project

Relations

Replaced By
ASTM D5127-13(2018) - Standard Guide for Ultra-Pure Water Used in the Electronics and Semiconductor Industries
Effective Date
15-Oct-2018

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Standards Content (Sample)

NOTICE: This standard has either been superseded and replaced by a new version or withdrawn.
Contact ASTM International (www.astm.org) for the latest information
Designation: D5127 − 13
Standard Guide for
Ultra-Pure Water Used in the Electronics and
1
Semiconductor Industries
This standard is issued under the fixed designation D5127; the number immediately following the designation indicates the year of
original adoption or, in the case of revision, the year of last revision.Anumber in parentheses indicates the year of last reapproval.A
superscript epsilon (´) indicates an editorial change since the last revision or reapproval.
1. Scope D2791TestMethodforOn-lineDeterminationofSodiumin
Water
1.1 This guide provides recommendations for water quality
D3919Practice for Measuring Trace Elements in Water by
related to electronics and semiconductor-industry manufactur-
Graphite Furnace Atomic Absorption Spectrophotometry
ing. Seven classifications of water are described, including
D4191TestMethodforSodiuminWaterbyAtomicAbsorp-
water for line widths as low as 0.032 micron. In all cases, the
tion Spectrophotometry
recommendations are for water at the point of distribution
D4192Test Method for Potassium in Water by Atomic
(POD).
Absorption Spectrophotometry
1.2 Water is used for washing and rinsing of semiconductor
D4327Test Method forAnions in Water by Suppressed Ion
components during manufacture. Water is also used for clean-
Chromatography
ing and etching operations, making steam for oxidation of
D4453Practice for Handling of High Purity Water Samples
silicon surfaces, preparing photomasks, and depositing lumi-
D4517Test Method for Low-Level Total Silica in High-
nescent materials. Other applications are in the development
Purity Water by Flameless Atomic Absorption Spectros-
and fabrication of solid-state devices, thin-film devices, com-
copy
munication lasers, light-emitting diodes, photo-detectors,
D5173Guide for On-Line Monitoring of Total Organic
printed circuits, memory devices, vacuum-tube devices, or
Carbon in Water by Oxidation and Detection of Resulting
electrolytic devices.
Carbon Dioxide
1.3 Users needing water qualities different from those de-
D5196Guide for Bio-Applications Grade Water
scribed here should consult other water standards, such as
D5391Test Method for Electrical Conductivity and Resis-
Specification D1193 and Guide D5196.
tivity of a Flowing High Purity Water Sample
D5462Test Method for On-Line Measurement of Low-
1.4 This standard does not purport to address all of the
Level Dissolved Oxygen in Water
safety concerns, if any, associated with its use. It is the
D5542Test Methods for TraceAnions in High Purity Water
responsibility of the user of this standard to establish appro-
by Ion Chromatography
priate safety and health practices and determine the applica-
D5544Test Method for On-Line Measurement of Residue
bility of regulatory limitations prior to use.
After Evaporation of High-Purity Water
2. Referenced Documents
D5673Test Method for Elements in Water by Inductively
2
Coupled Plasma—Mass Spectrometry
2.1 ASTM Standards:
D5996Test Method for MeasuringAnionic Contaminants in
D1129Terminology Relating to Water
High-Purity Water by On-Line Ion Chromatography
D1193Specification for Reagent Water
D5997 Test Method for On-Line Monitoring of Total
D1976Test Method for Elements in Water by Inductively-
Carbon,InorganicCarboninWaterbyUltraviolet,Persul-
Coupled Argon Plasma Atomic Emission Spectroscopy
fate Oxidation, and Membrane Conductivity Detection
F1094Test Methods for Microbiological Monitoring of
1
This guide is under the jurisdiction ofASTM Committee D19 on Water and is
Water Used for Processing Electron and Microelectronic
thedirectresponsibilityofSubcommitteeD19.02onQualitySystems,Specification,
Devices by Direct Pressure Tap Sampling Valve and by
and Statistics.
Current edition approved Jan. 1, 2013. Published February 2013. Originally
the Presterilized Plastic Bag Method
approved in 1990. Last previous edition approved in 2012 as D5127–12. DOI:
10.1520/D5127-13.
2 3. Terminology
For referenced ASTM standards, visit the ASTM website, www.astm.org, or
contact ASTM Customer Service at service@astm.org. For Annual Book of ASTM
3.1 Definitions—For definitions of terms used in this guide
Standards volume information, refer to the standard’s Document Summary page on
the ASTM website. refer to Terminology D1129.
Copyright © ASTM International, 100 Barr Harbor Drive, PO Box C700, West Conshohocken, PA 19428-2959. United States
1

---------------------- Page: 1 ----------------------
D5127 − 13
3.2 Definitions of Terms Specific to This Standard: 5.1.7 Type E-4—This grade may be classified as water used
3.2.1 total bacterial counts, n—total number of cultureable in preparation of plating solutions and for other applications
microorganisms present in the named sample, excluding obli- where the water being used can be of lesser quality.
gate anaerobic organisms, determined in accordance with Test
5
...

This document is not an ASTM standard and is intended only to provide the user of an ASTM standard an indication of what changes have been made to the previous version. Because
it may not be technically possible to adequately depict all changes accurately, ASTM recommends that users consult prior editions as appropriate. In all cases only the current version
of the standard as published by ASTM is to be considered the official document.
Designation: D5127 − 12 D5127 − 13
Standard Guide for
Ultra-Pure Water Used in the Electronics and
1
Semiconductor Industries
This standard is issued under the fixed designation D5127; the number immediately following the designation indicates the year of
original adoption or, in the case of revision, the year of last revision. A number in parentheses indicates the year of last reapproval. A
superscript epsilon (´) indicates an editorial change since the last revision or reapproval.
1. Scope
1.1 This guide provides recommendations for water quality related to electronics and semiconductor-industry manufacturing.
Seven classifications of water are described, including water for line widths as low as 0.032 micron. In all cases, the
recommendations are for water at the point of distribution (POD).
1.2 Water is used for washing and rinsing of semiconductor components during manufacture. Water is also used for cleaning
and etching operations, making steam for oxidation of silicon surfaces, preparing photomasks, and depositing luminescent
materials. Other applications are in the development and fabrication of solid-state devices, thin-film devices, communication lasers,
light-emitting diodes, photo-detectors, printed circuits, memory devices, vacuum-tube devices, or electrolytic devices.
1.3 Users needing water qualities different from those described here should consult other water standards, such as Specification
D1193 and Guide D5196.
1.4 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility
of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory
limitations prior to use.
2. Referenced Documents
2
2.1 ASTM Standards:
D1129 Terminology Relating to Water
D1193 Specification for Reagent Water
D1976 Test Method for Elements in Water by Inductively-Coupled Argon Plasma Atomic Emission Spectroscopy
D2791 Test Method for On-line Determination of Sodium in Water
D3919 Practice for Measuring Trace Elements in Water by Graphite Furnace Atomic Absorption Spectrophotometry
D4191 Test Method for Sodium in Water by Atomic Absorption Spectrophotometry
D4192 Test Method for Potassium in Water by Atomic Absorption Spectrophotometry
D4327 Test Method for Anions in Water by Suppressed Ion Chromatography
D4453 Practice for Handling of High Purity Water Samples
D4517 Test Method for Low-Level Total Silica in High-Purity Water by Flameless Atomic Absorption Spectroscopy
D5173 Test Method for On-Line Monitoring of Carbon Compounds in Water by Chemical Oxidation, by UV Light Oxidation,
by Both, or by High Temperature Combustion Followed by Gas Phase NDIR or by Electrolytic Conductivity
D5196 Guide for Bio-Applications Grade Water
D5391 Test Method for Electrical Conductivity and Resistivity of a Flowing High Purity Water Sample
D5462 Test Method for On-Line Measurement of Low-Level Dissolved Oxygen in Water
D5542 Test Methods for Trace Anions in High Purity Water by Ion Chromatography
D5544 Test Method for On-Line Measurement of Residue After Evaporation of High-Purity Water
D5673 Test Method for Elements in Water by Inductively Coupled Plasma—Mass Spectrometry
D5996 Test Method for Measuring Anionic Contaminants in High-Purity Water by On-Line Ion Chromatography
1
This guide is under the jurisdiction of ASTM Committee D19 on Water and is the direct responsibility of Subcommittee D19.02 on Quality Systems, Specification, and
Statistics.
Current edition approved June 15, 2012Jan. 1, 2013. Published July 2012February 2013. Originally approved in 1990. Last previous edition approved in 20072012 as
D5127 – 07.D5127 – 12. DOI: 10.1520/D5127-12.10.1520/D5127-13.
2
For referenced ASTM standards, visit the ASTM website, www.astm.org, or contact ASTM Customer Service at service@astm.org. For Annual Book of ASTM Standards
volume information, refer to the standard’s Document Summary page on the ASTM website.
Copyright © ASTM International, 100 Barr Harbor Drive, PO Box C700, West Conshohocken, PA 19428-2959. United States
1

---------------------- Page: 1 ----------------------
D5127 − 13
D5997 Test Method for On-Line Monitoring of Total Carbon, Inorganic Carbon in Water by Ultraviolet, Persulfate Oxidation,
and Membrane Conductivity Detection
F1094 Test Methods for Microbiological Monitoring of Water Used for Processing Electron and Microelectronic Devices by
Direct Pressure Tap Sampling Valve and by the Presterilized Plastic Bag Method
3. Terminology
3.1 Definitions—For
...

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ASTM D5127-13(2018)(Guide)
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4.1 This guide recommends the water quality required for the electronics and microelectronics industries. High-purity water is required to prevent contamination of products during manufacture, since contamination can lead to an unacceptable, low yield of electronic devices.  
4.2 The range of water purity is defined in accordance with the manufacturing process. The types of ultra-pure water are defined with respect to device line width. In all cases, the water-quality recommendations apply at the point of distribution.  
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1.1 This guide provides recommendations for water quality related to electronics and semiconductor-industry manufacturing. Seven classifications of water are described, including water for line widths as low as 0.032 μm. In all cases, the recommendations are for water at the point of distribution (POD).  
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SIGNIFICANCE AND USE
5.1 This test method can be used to determine whether the amount of draindown measured for a given asphalt mixture is within specified acceptable levels. The test provides an evaluation of the draindown potential of an asphalt mixture during mixture design and/or during field production. This test is primarily used for mixtures with high coarse aggregate content such as porous asphalt (open-graded friction course) and stone matrix asphalt (SMA).
Note 1: The quality of the results produced by this standard are dependent on the competence of the personnel performing the procedure and the capability, calibration, and maintenance of the equipment used. Agencies that meet the criteria of Specification D3666 are generally considered capable of competent and objective testing, sampling, inspection, etc. Users of this standard are cautioned that compliance with Specification D3666 alone does not completely ensure reliable results. Reliable results depend on many factors; following the suggestions of Specification D3666 or some similar acceptable guideline provides a means of evaluating and controlling some of those factors.
SCOPE
1.1 This test method covers the determination of the amount of draindown in an uncompacted asphalt mixture sample when the sample is held at elevated temperatures comparable to those encountered during the production, storage, transport, and placement of the mixture. The test is particularly applicable to mixtures such as porous asphalt (open-graded friction course) and stone matrix asphalt (SMA).  
1.2 The values stated in SI units are to be regarded as standard. No other units of measurement are included in this standard.  
1.3 The text of this standard references notes and footnotes which provide explanatory material. These notes and footnotes (excluding those in tables and figures) shall not be considered as requirements of the standard.  
1.4 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety, health, and environmental practices and determine the applicability of regulatory limitations prior to use.  
1.5 This international standard was developed in accordance with internationally recognized principles on standardization established in the Decision on Principles for the Development of International Standards, Guides and Recommendations issued by the World Trade Organization Technical Barriers to Trade (TBT) Committee.

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ASTM
ASTM D545-23(Test Method)
Standard Test Methods for Preformed Expansion Joint Fillers for Concrete Construction (Nonextruding and Resilient Types)

SIGNIFICANCE AND USE
3.1 The compression resistance perpendicular to the faces, the resistance to the extrusion during compression, and the ability to recover after release of the load are indicative of a joint filler's ability to continuously fill a concrete expansion joint and thereby prevent damage that might otherwise occur during thermal expansion. The asphalt content is a measure of the fiber-type joint filler's durability and life expectancy. In the case of cork-type fillers, the resistance to water absorption and resistance to boiling hydrochloric acid are relative measures of durability and life expectancy.
Note 2: The quality of the results produced by this standard are dependent on the competence of the personnel performing the procedure and the capability, calibration, and maintenance of the equipment used. Agencies that meet the criteria of Specification D3666 are generally considered capable of competent and objective testing, sampling, inspection, etc. Users of this standard are cautioned that compliance with Specification D3666 alone does not completely ensure reliable results. Reliable results depend on many factors; following the suggestions of Specification D3666 or some similar acceptable guideline provides a means of evaluating and controlling some of those factors.
SCOPE
1.1 These test methods cover the physical properties associated with preformed expansion joint fillers. The test methods include:    
Property  
Section  
Expansion in Boiling Water  
7.1  
Recovery and Compression  
7.2  
Extrusion  
7.3  
Boiling in Hydrochloric Acid  
7.4  
Asphalt Content  
7.5  
Water Absorption  
7.6  
Density  
7.7
Note 1: Specific test methods are applicable only to certain types of joint fillers, as stated herein.  
1.2 The values stated in inch-pound units are to be regarded as standard. The values given in parentheses are mathematical conversions to SI units that are provided for information only and are not considered standard.  
1.3 The text of this standard references notes and footnotes which provide explanatory material. These notes and footnotes (excluding those in tables and figures) shall not be considered as requirements of the standard.  
1.4 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety, health, and environmental practices and determine the applicability of regulatory limitations prior to use.  
1.5 This international standard was developed in accordance with internationally recognized principles on standardization established in the Decision on Principles for the Development of International Standards, Guides and Recommendations issued by the World Trade Organization Technical Barriers to Trade (TBT) Committee.

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ASTM
ASTM D517-23(Specification)
Standard Specification for Asphalt Plank

ABSTRACT
This specification covers asphalt plank used for bridge decks as well as for industrial floors. Asphalt planks shall be classified according to usage: Type Ia; Type Ib; and Type II. Asphalt plank shall be formed from a mixture of asphalt, fibers, modifiers, or a combination thereof, and mineral filler in such a manner as to produce a uniformly dense mass. The following test methods shall be intended to measure those attributes necessary to measure the ability of asphalt plank to provide a reasonably long and satisfactory service: absorption; brittleness; dimensions; and hardness.
SCOPE
1.1 This specification covers asphalt plank used for bridge decks as well as for industrial floors.  
1.2 The values stated in SI units are to be regarded as the standard. The values given in parentheses are for information only.  
1.3 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety, health, and environmental practices and determine the applicability of regulatory limitations prior to use.  
1.4 This international standard was developed in accordance with internationally recognized principles on standardization established in the Decision on Principles for the Development of International Standards, Guides and Recommendations issued by the World Trade Organization Technical Barriers to Trade (TBT) Committee.

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