Standard Test Method for Sheet Resistance of Thin Metallic Films With a Collinear Four-Probe Array

ABSTRACT
This test method covers the measurement of the sheet resistance of metallic thin films with a collinear four-probe array. It is intended for use with rectangular metallic films formed by deposition of a material or by a thinning process and supported by an insulating substrate. This test method is suitable for referee measurement purposes as well as for routine acceptance measurements. A collinear four-probe array is used to determine the sheet resistance by passing a measured direct current through the specimen between the outer probes and measuring the resulting potential difference between the inner probes. The sheet resistance is calculated from the measured current and potential values using correction factors associated with the geometry of the specimen and the probe spacing. The accuracy of the electrical measuring equipment is tested by means of an analog circuit containing a known standard resistor together with other resistors which simulate the resistance at the contacts between the probe tips and the film surface.
SCOPE
1.1 This test method covers the measurement of the sheet resistance of metallic thin films with a collinear four-probe array. It is intended for use with rectangular metallic films between 0.01 and 100 [mu]m thick, formed by deposition of a material or by a thinning process and supported by an insulating substrate, in the sheet resistance range from 10   to 10  [omega]/[open-box] (see 3.1.3).  
1.2 This test method is suitable for referee measurement purposes as well as for routine acceptance measurements.  
1.3 The values stated in Si units are to be regarded as the standard. The values given in parentheses are for information only.  
1.4 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use.

General Information

Status
Historical
Publication Date
09-May-1998
Technical Committee
Current Stage
Ref Project

Relations

Buy Standard

Standard
ASTM F390-98(2003) - Standard Test Method for Sheet Resistance of Thin Metallic Films With a Collinear Four-Probe Array
English language
4 pages
sale 15% off
Preview
sale 15% off
Preview

Standards Content (Sample)

NOTICE: This standard has either been superseded and replaced by a new version or withdrawn.
Contact ASTM International (www.astm.org) for the latest information
Designation:F390–98 (Reapproved2003)
Standard Test Method for
Sheet Resistance of Thin Metallic Films With a Collinear
1
Four-Probe Array
ThisstandardisissuedunderthefixeddesignationF390;thenumberimmediatelyfollowingthedesignationindicatestheyearoforiginal
adoptionor,inthecaseofrevision,theyearoflastrevision.Anumberinparenthesesindicatestheyearoflastreapproval.Asuperscript
epsilon (´) indicates an editorial change since the last revision or reapproval.
1. Scope 3.1.2 thin metallic film—a thin film composed of a material
−8
or materials with resistivity in the range from 10 to
1.1 This test method covers the measurement of the sheet
−3
10 V·cm.
resistance of metallic thin films with a collinear four-probe
3.1.3 sheet resistance, R [V/h]—in a thin film, the ratio of
array. It is intended for use with rectangular metallic films s
the potential gradient parallel to the current to the product of
between 0.01 and 100 µm thick, formed by deposition of a
the current density and the film thickness; in a rectangular thin
material or by a thinning process and supported by an
−2
film, the quotient of the resistance, measured along the length
insulating substrate, in the sheet resistance range from 10 to
4
ofthefilm,dividedbythelength, l,towidth, w,ratio.Theratio
10 V/h (see 3.1.3).
l/w is the number of squares.
1.2 This test method is suitable for referee measurement
purposes as well as for routine acceptance measurements.
4. Summary of Test Method
1.3 The values stated in Si units are to be regarded as the
4.1 A collinear four-probe array is used to determine the
standard. The values given in parentheses are for information
sheet resistance by passing a measured direct current through
only.
the specimen between the outer probes and measuring the
1.4 This standard does not purport to address the safety
resulting potential difference between the inner probes. The
concerns, if any, associated with its use. It is the responsibility
sheet resistance is calculated from the measured current and
of whoever uses this standard to consult and establish appro-
potential values using correction factors associated with the
priate safety and health practices and determine the applica-
geometry of the specimen and the probe spacing.
bility of regulatory limitations prior to use.
4.2 This test method includes procedures for checking both
2. Referenced Documents the probe assembly and the electrical measuring apparatus.
2
4.2.1 The spacings between the four probe tips are deter-
2.1 ASTM Standards:
mined from measurements of indentations made by the tips in
E1 Specification for ASTM Liquid-in-Glass Thermometers
a suitable surface. This test also is used to determine the
F388 Method for Measurement of Oxide Thickness on
condition of the tips.
Silicon Wafers and Metallization Thickness by Multiple-
3
4.2.2 The accuracy of the electrical measuring equipment is
Beam Interference (Tolansky Method)
tested by means of an analog circuit containing a known
3. Terminology
standard resistor together with other resistors which simulate
the resistance at the contacts between the probe tips and the
3.1 Definitions:
film surface.
3.1.1 thin film—afilmhavingathicknessmuchsmallerthan
anylateraldimension,formedbydepositionofamaterialorby
5. Apparatus
a thinning process.
5.1 Probe Assembly:
5.1.1 Probes—The probe shaft and tip shall be constructed
1
This test method is under the jurisdiction of ASTM Committee F01 on
oftungstencarbide,Monel,hardenedtoolsteel,orhardcopper
Electronics and is the direct responsibility of Subcommittee F01.17 on Sputter
and have a conical tip with included angle of 45 to 90°.
Metallization.
Alternatively, the tip may be formed from a platinum-
Current edition approved Dec. 1, 2003. Published December 2003. Originally
approved in 1973 as F390–73T. Last previous edition F390–98. DOI: 10.1520/
palladiumalloyandresistanceweldedtotheshaft.Thetipshall
F0390-98R03.
have a nominal initial radius of 25 to 50 µm. In all cases all of
2
For referenced ASTM standards, visit the ASTM website, www.astm.org, or
the four paths from the electrical measurement equipment
contact ASTM Customer Service at service@astm.org. For Annual Book of ASTM
Standards volume information, refer to the standard’s Document Summary page on inputs to the film surface must be identical.
the ASTM website.
3
Withdrawn. The last approved version of this historical standard is referenced
on www.astm.org.
Copyright © ASTM International, 100 Barr Harbor Drive, PO Box C700, West Conshohocken, PA 19428-2959, United States.
1

---------------------- Page: 1 ----------------------
F390–98 (2003)
5.1.2 Probe Force—The probes shall be uniformly loaded 6.2 Geometry—Measure the length, l, and width, w,ofthe
to exert a force sufficient to deform the metal film but specimen with vernier calipers. Record the values.
insufficient to pun
...

Questions, Comments and Discussion

Ask us and Technical Secretary will try to provide an answer. You can facilitate discussion about the standard in here.