IEC TS 62607-6-8:2023

Nanomanufacturing - Key control characteristics - Part 6-8: Graphene - Sheet resistance: In-line four-point probe

IEC TS 62607-6-8:2023 establishes a method to determine the key control characteristic sheet resistance RS [measured in ohm per square (Ω/sq)], by the in-line four-point probe method, 4PP.
The sheet resistance RS is derived by measurements of four-terminal electrical resistance performed on four electrodes placed on the surface of the planar sample.
The measurement range for RS of the graphene samples with the method described in this document goes from 10−2 Ω/sq to 104 Ω/sq.
The method is applicable for CVD graphene provided it is transferred to quartz substrates or other insulating materials (quartz, SiO2 on Si, as well as graphene grown from silicon carbide.
The method is complementary to the van der Pauw method (IEC 62607-6-7) for what concerns the measurement of the sheet resistance and can be useful when it is not possible to reliably place contacts on the sample boundary.

General Information

• Status: Published
• Publication Date: 06-Jun-2023
• ICS: 07.120 - Nanotechnologies
• Technical Committee: TC 113 - Nanotechnology for electrotechnical products and systems
• Drafting Committee: WG 8 - TC 113/WG 8
• Current Stage: PPUB - Publication issued
• Start Date: 12-Jul-2023
• Completion Date: 07-Jun-2023

Standards Content (Sample)

IEC TS 62607-6-8 ®
Edition 1.0 2023-06
TECHNICAL
SPECIFICATION
colour
inside
Nanomanufacturing – Key control characteristics –
Part 6-8: Graphene – Sheet resistance: In-line four-point probe

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IEC TS 62607-6-8 ®
Edition 1.0 2023-06
TECHNICAL
SPECIFICATION
colour
inside
Nanomanufacturing – Key control characteristics –

Part 6-8: Graphene – Sheet resistance: In-line four-point probe

INTERNATIONAL
ELECTROTECHNICAL
COMMISSION
ICS  07.120 ISBN 978-2-8322-7113-1

– 2 – IEC TS 62607-6-8:2023  IEC 2023
CONTENTS
FOREWORD . 4
INTRODUCTION . 6
1 Scope . 7
2 Normative references . 7
3 Terms and definitions . 7
3.1 General terms . 8
3.5 Key control characteristics measured in accordance with this standard . 9
3.6 Terms related to the measurement method . 9
4 General . 10
4.1 Measurement principle . 10
4.2 Sample preparation method . 11
4.3 Description of measurement apparatus . 11
4.4 Ambient conditions during measurement . 11
4.5 Related standards . 12
5 Measurement procedure . 12
5.1 Calibration of measurement equipment . 12
5.2 Detailed protocol of the measurement procedure . 12
5.3 Measurement accuracy . 13
6 Data analysis and interpretation of results . 13
7 Results to be reported . 14
7.1 Cover sheet . 14
7.2 Product and sample identification . 14
7.3 Measurement conditions . 14
7.4 Measurement results . 14
Annex A (informative) Effects of ambient conditions on graphene resistance
measurements . 17
A.1 General . 17
A.2 Temperature (T) . 17
A.3 Relative humidity (RH) . 17
Annex B (normative) More specific cases . 18
B.1 Non-equidistant probes . 18
B.2 Proximity to the edge . 18
B.3 Non-equidistant probes and proximity to the edge . 18
Annex C (informative) Experimental example . 19
C.1 Sample . 19
C.2 Ambient conditions. 19
C.3 Instrumentation . 19
C.4 Sampling plan . 19
C.5 Measurement procedure . 20
C.6 Results . 20
Annex D (informative) Other standards related to the measurement of sheet
resistance . 21
Bibliography . 22

Figure 1 – Schematic representation of the four-point probe method (left) and detail of
the structure of a spring-mounted probe (right) . 11

Figure 2 – Schematic representation of a possible measurement location . 12
Figure 3 – Schematic view of possible sample plans for a) circular and b) square
substrates . 15
Figure C.1 – Sampling plan used for the present example. 20

Table 1 – Example of measurable values for R , and the corresponding measurement
S
settings and type-B uncertainty, when using a current source Keithley 2602B System
SourceMeter® and a Nano Volt / Micro Ohm Meter (1y calibration specifications) . 13
Table 2 – Sampling plan for circular substrates . 15
Table 3 – Results of R measured in accordance with this document . 16
S
Table C.1 – Measured values for V and R (p) using the described procedure and
S
equipment . 20

– 4 – IEC TS 62607-6-8:2023  IEC 2023
INTERNATIONAL ELECTROTECHNICAL COMMISSION
____________
NANOMANUFACTURING –
KEY CONTROL CHARACTERISTICS –
Part 6-8: Graphene – Sheet resistance: In-line four-point probe

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IEC TS 62607-6-8 has been prepared by IEC technical committee 113: Nanotechnology for
electrotechnical products and systems. It is a Technical Specification.
The text of this Technical Specification is based on the following documents:
Draft Report on voting
113/678/DTS 113/745/RVDTS
Full information on the voting for its approval can be found in the report on voting indicated in
the above table.
The language used for the development of this Technical Specification is English.

This document was drafted in accordance with ISO/IEC Directives, Part 2, and developed in
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