ISO/TS 21383:2021

Microbeam analysis — Scanning electron microscopy — Qualification of the scanning electron microscope for quantitative measurements

This document describes methods to qualify the scanning electron microscope with the digital imaging system for quantitative and qualitative SEM measurements by evaluating essential scanning electron microscope performance parameters to maintain the performance after installation of the instruments. The items and evaluating methods of the performance parameters are selected by users for their own purposes.

Analyse par microfaisceaux - Microscopie électronique à balayage - Qualification du microscope électronique à balayage pour des mesures quantitatives

General Information

• Status: Published
• Publication Date: 11-Mar-2021
• ICS: 37.020 - Optical equipment
• Technical Committee: ISO/TC 202/SC 4 - Scanning electron microscopy
• Drafting Committee: ISO/TC 202/SC 4 - Scanning electron microscopy
• Current Stage: 9060 - Close of review
• Start Date: 02-Sep-2027

Standards Content (Sample)

TECHNICAL ISO/TS
SPECIFICATION 21383
First edition
2021-03
Microbeam analysis — Scanning
electron microscopy — Qualification
of the scanning electron microscope
for quantitative measurements
Reference number
ISO/TS 21383:2021(E)
©
ISO 2021

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ISO/TS 21383:2021(E)

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ii © ISO 2021 – All rights reserved

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ISO/TS 21383:2021(E)

Contents Page
Foreword .v
Introduction .vi
1 Scope . 1
2 Normative references . 1
3 Terms and definitions . 1
4 Symbols and abbreviated terms . 3
5 General principles . 5
5.1 Condition setting . 5
5.2 Contrast/brightness setting . 5
5.3 Sample preparation . 6
6 Measurement of image sharpness . 7
7 Measurement of drift and drift-related distortions (imaging repeatability) .8
7.1 Measurement of image drifts within specified time intervals. . 9
7.1.1 One-minute drift measurement .10
7.1.2 Ten-minute drift measurement .10
7.1.3 One-hour drift measurement .10
7.1.4 Long-term larger than one-hour drift measurement .10
7.2 Evaluation of the drift and the drift-related distortions by using image overlay .11
7.3 Evaluation of the drift and the drift-related distortions by using cross-correlation
function (CCF) .13
7.3.1 Measurement of the drifts by using the CCF .13
7.3.2 Measurement of the distortions by using the CCF .15
8 Measurement of electron-beam-induce
...