Standard Test Method for Sheet Resistance of Thin Metallic Films With a Collinear Four-Probe Array (Withdrawn 2020)

ABSTRACT
This test method covers the measurement of the sheet resistance of metallic thin films with a collinear four-probe array. It is intended for use with rectangular metallic films formed by deposition of a material or by a thinning process and supported by an insulating substrate. This test method is suitable for referee measurement purposes as well as for routine acceptance measurements. A collinear four-probe array is used to determine the sheet resistance by passing a measured direct current through the specimen between the outer probes and measuring the resulting potential difference between the inner probes. The sheet resistance is calculated from the measured current and potential values using correction factors associated with the geometry of the specimen and the probe spacing. The accuracy of the electrical measuring equipment is tested by means of an analog circuit containing a known standard resistor together with other resistors which simulate the resistance at the contacts between the probe tips and the film surface.
SCOPE
1.1 This test method covers the measurement of the sheet resistance of metallic thin films with a collinear four-probe array. It is intended for use with rectangular metallic films between 0.01 and 100 [mu]m thick, formed by deposition of a material or by a thinning process and supported by an insulating substrate, in the sheet resistance range from 10   to 10  [omega]/[open-box] (see 3.1.3).  
1.2 This test method is suitable for referee measurement purposes as well as for routine acceptance measurements.  
1.3 The values stated in Si units are to be regarded as the standard. The values given in parentheses are for information only.  
1.4 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use.
WITHDRAWN RATIONALE
This test method covers the measurement of the sheet resistance of metallic thin films with a collinear four-probe array.
Formerly under the jurisdiction of Committee F01 on Electronics, this test method was withdrawn in January 2020 in accordance with section 10.6.3 of the Regulations Governing ASTM Technical Committees, which requires that standards shall be updated by the end of the eighth year since the last approval date.

General Information

Status
Withdrawn
Publication Date
31-May-2011
Withdrawal Date
08-Jan-2020
Technical Committee
Current Stage
Ref Project

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ASTM F390-11 - Standard Test Method for Sheet Resistance of Thin Metallic Films With a Collinear Four-Probe Array (Withdrawn 2020)
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NOTICE: This standard has either been superseded and replaced by a new version or withdrawn.
Contact ASTM International (www.astm.org) for the latest information
Designation: F390 − 11
Standard Test Method for
Sheet Resistance of Thin Metallic Films With a Collinear
1
Four-Probe Array
ThisstandardisissuedunderthefixeddesignationF390;thenumberimmediatelyfollowingthedesignationindicatestheyearoforiginal
adoptionor,inthecaseofrevision,theyearoflastrevision.Anumberinparenthesesindicatestheyearoflastreapproval.Asuperscript
epsilon (´) indicates an editorial change since the last revision or reapproval.
1. Scope 3.1.1 thin film—afilmhavingathicknessmuchsmallerthan
anylateraldimension,formedbydepositionofamaterialorby
1.1 This test method covers the measurement of the sheet
a thinning process.
resistance of metallic thin films with a collinear four-probe
array. It is intended for use with rectangular metallic films 3.1.2 thin metallic film—a thin film composed of a material
−8 −3
or materials with resistivity in the range from 10 to 10
between 0.01 and 100 µm thick, formed by deposition of a
material or by a thinning process and supported by an Ω·cm.
−2
insulating substrate, in the sheet resistance range from 10 to
3.1.3 sheet resistance, R [Ω/□]— in a thin film, the ratio of
s
4
10 Ω/□ (see 3.1.3).
the potential gradient parallel to the current to the product of
the current density and the film thickness; in a rectangular thin
1.2 This test method is suitable for referee measurement
purposes as well as for routine acceptance measurements. film, the quotient of the resistance, measured along the length
ofthefilm,dividedbythelength, l,towidth, w,ratio.Theratio
1.3 The values stated in SI units are to be regarded as the
l/w is the number of squares.
standard. The values given in parentheses are for information
only.
4. Summary of Test Method
1.4 This standard does not purport to address the safety
4.1 A collinear four-probe array is used to determine the
concerns, if any, associated with its use. It is the responsibility
sheet resistance by passing a measured direct current through
of whoever uses this standard to consult and establish appro-
the specimen between the outer probes and measuring the
priate safety and health practices and determine the applica-
resulting potential difference between the inner probes. The
bility of regulatory limitations prior to use.
sheet resistance is calculated from the measured current and
potential values using correction factors associated with the
2. Referenced Documents
geometry of the specimen and the probe spacing.
2
2.1 ASTM Standards:
4.2 This test method includes procedures for checking both
E2251Specification for Liquid-in-Glass ASTM Thermom-
the probe assembly and the electrical measuring apparatus.
eters with Low-Hazard Precision Liquids
4.2.1 The spacings between the four probe tips are deter-
F388Method for Measurement of Oxide Thickness on
mined from measurements of indentations made by the tips in
Silicon Wafers and Metallization Thickness by Multiple-
3
a suitable surface. This test also is used to determine the
BeamInterference(TolanskyMethod)(Withdrawn1993)
condition of the tips.
4.2.2 The accuracy of the electrical measuring equipment is
3. Terminology
tested by means of an analog circuit containing a known
3.1 Definitions:
standard resistor together with other resistors which simulate
the resistance at the contacts between the probe tips and the
film surface.
1
This test method is under the jurisdiction of ASTM Committee F01 on
Electronics and is the direct responsibility of Subcommittee F01.17 on Sputter
5. Apparatus
Metallization.
CurrenteditionapprovedJune1,2011.PublishedJuly2011.Originallyapproved
5.1 Probe Assembly:
in1973asF390–73T.Lastpreviouseditionapprovedin2003asF390–98(2003).
5.1.1 Probes—The probe shaft and tip shall be constructed
DOI: 10.1520/F0390-11.
2
oftungstencarbide,Monel,hardenedtoolsteel,orhardcopper
For referenced ASTM standards, visit the ASTM website, www.astm.org, or
contact ASTM Customer Service at service@astm.org. For Annual Book of ASTM
and have a conical tip with included angle of 45 to 90°.
Standards volume information, refer to the standard’s Document Summary page on
Alternatively, the tip may be formed from a platinum-
the ASTM website.
3
palladiumalloyandresistanceweldedtotheshaft.Thetipshall
Withdrawn. THe last approved version of this historical standard is referenced
on www.astm.org. have a nominal initial radius of 25 to 50 µm. In all cases all of
Copyright © ASTM International, 100 Barr Harbor Drive, PO Box C700, West Conshohocken, PA 19428-2959. United States
1

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F390 − 11
the four paths from the electrical measurement equipment process, with no further cleaning or preparation. The test
inputs to the film surface must be identical. specimen shall be supported by a substrate consisting of a
5.1.2 Probe Force—Theprobesshallbeuniformlyloadedto suitable insulating material.
exert a f
...

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