ASTM E673-02a

Standard Terminology Relating to Surface Analysis

SCOPE
1.1 This terminology is related to the various disciplines involved in surface analysis.
1.2 The definitions listed apply to (a) Auger electron spectroscopy (AES), (b) X-ray photoelectron spectroscopy (XPS), (c) ion-scattering spectroscopy (ISS), (d) secondary ion mass spectrometry (SIMS), and (e) energetic ion analysis (EIA).

General Information

• Status: Historical
• Publication Date: 09-Dec-2002
• ICS: 01.040.17 - Metrology and measurement. Physical phenomena (Vocabularies)
• ICS: 17.040.20 - Properties of surfaces
• Technical Committee: E42 - Surface Analysis
• Drafting Committee: E42.02 - Terminology

Relations

• Replaces: ASTM E673-02 - Standard Terminology Relating to Surface Analysis
• Effective Date: 10-Dec-2002
• Referred By: ASTM E1881-12(2020) - Standard Guide for Cell Culture Analysis with SIMS
• Effective Date: 10-Dec-2002
• Referred By: ASTM E1634-11(2019) - Standard Guide for Performing Sputter Crater Depth Measurements
• Effective Date: 10-Dec-2002
• Referred By: ASTM E1635-06(2019) - Standard Practice for Reporting Imaging Data in Secondary Ion Mass Spectrometry (SIMS)
• Effective Date: 10-Dec-2002
• Referred By: ASTM E1016-07(2020) - Standard Guide for Literature Describing Properties of Electrostatic Electron Spectrometers
• Effective Date: 10-Dec-2002
• Referred By: ASTM E1508-12a(2019) - Standard Guide for Quantitative Analysis by Energy-Dispersive Spectroscopy
• Effective Date: 10-Dec-2002
• Referred By: ASTM E2108-16 - Standard Practice for Calibration of the Electron Binding-Energy Scale of an X-Ray Photoelectron Spectrometer
• Effective Date: 10-Dec-2002
• Referred By: ASTM E984-12(2020) - Standard Guide for Identifying Chemical Effects and Matrix Effects in Auger Electron Spectroscopy
• Effective Date: 10-Dec-2002
• Referred By: ASTM E1523-15 - Standard Guide to Charge Control and Charge Referencing Techniques in X-Ray Photoelectron Spectroscopy
• Effective Date: 10-Dec-2002
• Referred By: ASTM E983-19 - Standard Guide for Minimizing Unwanted Electron Beam Effects in Auger Electron Spectroscopy
• Effective Date: 10-Dec-2002
• Referred By: ASTM E1162-11(2019) - Standard Practice for Reporting Sputter Depth Profile Data in Secondary Ion Mass Spectrometry (SIMS)
• Effective Date: 10-Dec-2002
• Referred By: ASTM E995-16 - Standard Guide for Background Subtraction Techniques in Auger Electron Spectroscopy and X-Ray Photoelectron Spectroscopy
• Effective Date: 10-Dec-2002
• Referred By: ASTM E1127-08(2015) - Standard Guide for Depth Profiling in Auger Electron Spectroscopy
• Effective Date: 10-Dec-2002
• Referred By: ASTM E2426-10(2019) - Standard Practice for Pulse Counting System Dead Time Determination by Measuring Isotopic Ratios with SIMS
• Effective Date: 10-Dec-2002
• Referred By: ASTM E2734/E2734M-10(2018) - Standard Specification for Dimensions of Knife-Edge Flanges
• Effective Date: 10-Dec-2002

Standards Content (Sample)

NOTICE: This standard has either been superceded and replaced by a new version or discontinued.
Contact ASTM International (www.astm.org) for the latest information.
Designation: E 673 – 02a
Standard Terminology Relating to
1
Surface Analysis
This standard is issued under the fixed designation E 673; the number immediately following the designation indicates the year of
original adoption or, in the case of revision, the year of last revision. A number in parentheses indicates the year of last reapproval. A
superscript epsilon (e) indicates an editorial change since the last revision or reapproval.
1. Scope collection—SIMS, the angle between the normal to the
original specimen surface and the axis of the secondary ion
1.1 This terminology is related to the various disciplines
collection optics.
involved in surface analysis.
of detector—EIA, SIMS, the angle between the incident
1.2 The definitions listed apply to ( a) Auger electron
beam direction and the direction pointing from the beam spot
spectroscopy (AES), (b) X-ray photoelectron spectroscopy
to the center of the detector.
(XPS), (c) ion-scattering spectroscopy (ISS), (d) secondary ion
of emission—AES, XPS, the angle of emission or ejection of
mass spectrometry (SIMS), and (e) energetic ion analysis
electrons from a solid measured relative to the normal to the
(EIA).
surface.
2. Abbreviations
of incidence— the angle between the incident beam and the
normal to the surface.
2.1 Abbreviations commonly used in surface analysis are as
of scattering—EIA, the angle between the incident beam
follows:
direction and the direction in which a particle is traveling
AES Auger electron spectroscopy
BS backscattering spectroscopy after it is scattered. If the particle is incident on the detector,
CHA concentric hemispherical analyzer
this angle will be the same as angle of detector.
CMA cylindrical mirror analyzer
solid, of detector—EIA, the solid angle intercepted by the
EIA energetic ion analysis
detector, with the radius originating at the beam spot.
eV electron-volts
ESCA electron spectroscopy for chemical analysis
takeoff—AES, XPS the angle at which particles leave a
FABMS fast atom bombardment mass spectrometry
specimen measured relative to the plane of the specimen
FWHM full width at half maximum peak height
ISS ion scattering spectroscopy surface. (see angle of emission).
pp peak-to-peak
angle lapping—a method of specimen preparation in which a
RBS Rutherford backscattering spectroscopy
specimen is mechanically polished at an angle so that
RFA retarding field analyzer
SAM scanning Auger microprobe changes in composition as a function of position, usually
SIMS secondary ion mass spectrometry
depth, can be more easily determined.
SNMS sputtered neutral mass spectrometry
angle resolved AES—the recording of Auger electron spectra
XPS X-ray photoelectron spectroscopy
as a function of angle emission.
3. Terminology Definitions
angular distribution of secondary ions—see secondary ions.
attenuation coefficient—for a parallel beam of specified
adventitious carbon referencing— XPS, determining the
particles or radiation, the quantity μ in the expression μDx
charging potential of a particular specimen by comparing the
for the fraction removed in passing through a thin layer Dx
experimentally determined binding energy of the C 1s
of a substance in the limit as D x approaches zero, where Dx
binding energy from adsorbed hydrocarbons on the speci-
is measured in the direction of the beam.
men with a standard binding energy value.
Auger:
analysis area (spectrometer)—two-dimensional region of a
analysis volume—see volume under analysis.
specimen surface at the analytical point but set in the plane
chemical effects—AES, see chemical.
at right angles to the spectrometer axis from which the entire
chemical shift—AES, see chemical.
analytical signal or a specified percentage of that signal is
current—the electron current due to the emission of Auger
detected.
electrons.
angle:
electron—an electron emitted as the result of an Auger
process.
1
This terminology is under the jurisdiction of ASTM Committee E42 on Surface electron yield— the probability that an atom with a vacancy
Analysis and is the direct responsibility of Subcommittee E42.02 on Terminology.
in a particular inner shell will relax by an Auger process.
Current edition approved December 10, 2002. Published June 2003. Originally
approved in 1979. Last previous edition approved in 2002 as E 673 – 02.
Copyright © ASTM International, 100 Barr Harbor Drive, PO Box C700, West Conshohocken, PA 19428-2959, United States.
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NOTICE: This standard has either been superceded and replaced by a new version or discontinued.
Contact ASTM International (www.astm.org) for the latest information.
E 673 – 02a
line scan—a plot of Auger signal strength as a function of transition. If both electrons are from the same principal shell
displacement along a designated line on the specimen as
...