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ISO 19694-7:2024

(Main)

Stationary source emissions — Determination of greenhouse gas emissions in energy-intensive industries — Part 7: Semiconductor and display industries

Stationary source emissions — Determination of greenhouse gas emissions in energy-intensive industries — Part 7: Semiconductor and display industries

This document provides a methodology for calculating greenhouse gas (GHG) emissions from the semiconductor and display industry. This document includes the manufacture of semiconductor devices, microelectromechanical systems (MEMS), photovoltaic (PV) devices and displays. This document allows to report GHG emissions for various purposes and on different bases, such as a per-plant basis, per-company basis (by country or by region) or an international group basis. This document addresses all of the following direct and indirect sources of GHG: — direct GHG emissions [as defined in ISO 14064-1:2018, 5.2.4 a)] from sources that are owned or controlled by the company, such as emissions resulting from the following sources: — process: fluorinated compound (FC) gases and nitrous oxide (N2O) used in etching and wafer cleaning (EWC), remote plasma cleaning (RPC), in situ plasma cleansing (IPC), in situ thermal cleaning (ITC), N2O thin film deposition (TFD), and other N2O using process; — fuel combustion related to equipment and on-site vehicles, room heating/cooling; — fuel combustion of fuels for on-site power generation; — indirect GHG emissions [as defined in ISO 14064-1:2018, 5.2.4 b)] from the generation of imported electricity, heat or steam consumed by the organization. Other indirect GHG emissions [as defined in ISO 14064-1:2018, 5.2.4 c) to f)], which are the consequence of an organization’s activities, but arise from GHG sources that are owned or controlled by other organizations, are excluded from this document.

Émissions de sources fixes — Détermination des émissions de gaz à effet de serre dans les industries énergo-intensives — Partie 7: Industries des semi-conducteurs et des écrans

General Information

Status
Published
Publication Date
08-Feb-2024
ICS
13.020.40 - Pollution, pollution control and conservation
13.040.40 - Stationary source emissions
Technical Committee
ISO/TC 146/SC 1 - Stationary source emissions
Drafting Committee
ISO/TC 146/SC 1/WG 30 - GHG energy-intensive industries – Specific sectors
Current Stage
6060 - International Standard published
Start Date
09-Feb-2024
Due Date
31-Jul-2023
Completion Date
09-Feb-2024
Ref Project

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ISO/FDIS 19694-7 - Stationary source emissions — Determination of greenhouse gas emissions in energy-intensive industries — Part 7: Semiconductor and display industries Released:30. 10. 2023ISO/FDIS 19694-7 - Stationary source emissions — Determination of greenhouse gas emissions in energy-intensive industries — Part 7: Semiconductor and display industries Released:30. 10. 2023
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REDLINE ISO/FDIS 19694-7 - Stationary source emissions — Determination of greenhouse gas emissions in energy-intensive industries — Part 7: Semiconductor and display industries Released:30. 10. 2023REDLINE ISO/FDIS 19694-7 - Stationary source emissions — Determination of greenhouse gas emissions in energy-intensive industries — Part 7: Semiconductor and display industries Released:30. 10. 2023
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REDLINE ISO/FDIS 19694-7 - Stationary source emissions — Determination of greenhouse gas emissions in energy-intensive industries — Part 7: Semiconductor and display industries Released:30. 10. 2023
English language
41 pages
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Standards Content (Sample)

FINAL
INTERNATIONAL ISO/FDIS
DRAFT
STANDARD 19694-7
ISO/TC 146/SC 1
Stationary source emissions —
Secretariat: BIS
Determination of greenhouse gas
Voting begins on:
2023-11-13 emissions in energy-intensive
industries —
Voting terminates on:
2024-01-08
Part 7:
Semiconductor and display industries
RECIPIENTS OF THIS DRAFT ARE INVITED TO
SUBMIT, WITH THEIR COMMENTS, NOTIFICATION
OF ANY RELEVANT PATENT RIGHTS OF WHICH
THEY ARE AWARE AND TO PROVIDE SUPPOR TING
DOCUMENTATION.
IN ADDITION TO THEIR EVALUATION AS
Reference number
BEING ACCEPTABLE FOR INDUSTRIAL, TECHNO-
ISO/FDIS 19694-7:2023(E)
LOGICAL, COMMERCIAL AND USER PURPOSES,
DRAFT INTERNATIONAL STANDARDS MAY ON
OCCASION HAVE TO BE CONSIDERED IN THE
LIGHT OF THEIR POTENTIAL TO BECOME STAN-
DARDS TO WHICH REFERENCE MAY BE MADE IN
NATIONAL REGULATIONS. © ISO 2023

---------------------- Page: 1 ----------------------
ISO/FDIS 19694-7:2023(E)
FINAL
INTERNATIONAL ISO/FDIS
DRAFT
STANDARD 19694-7
ISO/TC 146/SC 1
Stationary source emissions —
Secretariat: BIS
Determination of greenhouse gas
Voting begins on:
emissions in energy-intensive
industries —
Voting terminates on:
Part 7:
Semiconductor and display industries
COPYRIGHT PROTECTED DOCUMENT
© ISO 2023
All rights reserved. Unless otherwise specified, or required in the context of its implementation, no part of this publication may
be reproduced or utilized otherwise in any form or by any means, electronic or mechanical, including photocopying, or posting on
the internet or an intranet, without prior written permission. Permission can be requested from either ISO at the address below
or ISO’s member body in the country of the requester.
RECIPIENTS OF THIS DRAFT ARE INVITED TO
ISO copyright office
SUBMIT, WITH THEIR COMMENTS, NOTIFICATION
OF ANY RELEVANT PATENT RIGHTS OF WHICH
CP 401 • Ch. de Blandonnet 8
THEY ARE AWARE AND TO PROVIDE SUPPOR TING
CH-1214 Vernier, Geneva
DOCUMENTATION.
Phone: +41 22 749 01 11
IN ADDITION TO THEIR EVALUATION AS
Reference number
Email: copyright@iso.org
BEING ACCEPTABLE FOR INDUSTRIAL, TECHNO-
ISO/FDIS 19694-7:2023(E)
Website: www.iso.org
LOGICAL, COMMERCIAL AND USER PURPOSES,
DRAFT INTERNATIONAL STANDARDS MAY ON
Published in Switzerland
OCCASION HAVE TO BE CONSIDERED IN THE
LIGHT OF THEIR POTENTIAL TO BECOME STAN-
DARDS TO WHICH REFERENCE MAY BE MADE IN
ii
  © ISO 2023 – All rights reserved
NATIONAL REGULATIONS. © ISO 2023

---------------------- Page: 2 ----------------------
ISO/FDIS 19694-7:2023(E)
Contents Page
Foreword .v
Introduction . vi
1 Scope . 1
2 Normative references . 1
3 Terms and definitions . 2
4 Abbreviated terms . 7
5 Determination of GHG emissions principles . 7
5.1 General . 7
5.2 Major GHG emissions in semiconductor and display . 8
5.3 Determination based on mass balance . 8
5.4 Determination based on stack emission measurements . 8
6 Inventory boundaries . 8
6.1 General .
...

ISO/FDIS 19694--7:2023(E)
ISO TC 146/SC 1
Secretariat: BIS
Stationary source emissions — Determination of greenhouse gas emissions in energy-intensive
industries — Part 7: Semiconductor and display industries
First edition
Date: 2023-05-0310-27

---------------------- Page: 1 ----------------------
ISO/FDIS 19694-7:2023(E)
© ISO 2023
All rights reserved. Unless otherwise specified, or required in the context of its implementation, no
part of this publication may be reproduced or utilized otherwise in any form or by any means,
electronic or mechanical, including photocopying, or posting on the internet or an intranet, without
prior written permission. Permission can be requested from either ISO at the address below or
ISO's member body in the country of the requester.
ISO Copyright Office
CP 401 • CH-1214 Vernier, Geneva
Phone: + 41 22 749 01 11
Email: copyright@iso.org
Website: www.iso.org
Published in Switzerland.
ii © ISO 2023 – All rights reserved

---------------------- Page: 2 ----------------------
ISO/FDIS 19694-7:2023(E)
Contents
Foreword . 5
Introduction. 6
1 Scope . 9
2 Normative references . 9
3 Terms and definitions . 10
4 Abbreviated terms . 17
5 Determination of GHG emissions principles . 18
5.1 General . 18
5.2 Major GHG emissions in semiconductor and display . 18
5.3 Determination based on mass balance . 18
5.4 Determination based on stack emission measurements . 18
6 Inventory boundaries . 19
6.1 General . 19
6.2 Organizational boundaries . 19
6.3 Reporting boundaries (operational boundaries) . 19
7 Direct GHG emissions and their determination . 26
7.1 General . 26
7.2 Direct GHG emissions from combustion and transportation . 26
7.3 Direct GHG emissions from process emissions . 27
7.3.1 General . 27
7.3.2 Tier 1 . 31
7.3.3 Tier 2a . 32
7.3.4 Tier 2b . 34
7.3.5 Tier 2c . 34
7.3.6 Tier 3a — Measured process-specific parameters .
...

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